S. Biesemans
About
In The Last Decade
S. Biesemans
164 papers receiving 2.4k citations
Peers
Comparison fields: 5 of 46
- Electrical and Electronic Engineering 2.4k
- Atomic and Molecular Physics, and Optics 736
- Biomedical Engineering 326
- Materials Chemistry 278
- Electronic, Optical and Magnetic Materials 69
Countries citing papers authored by S. Biesemans
This map shows the geographic impact of S. Biesemans's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Biesemans with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Biesemans more than expected).
Fields of papers citing papers by S. Biesemans
This network shows the impact of papers produced by S. Biesemans. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Biesemans. The network helps show where S. Biesemans may publish in the future.
Co-authorship network of co-authors of S. Biesemans
This figure shows the co-authorship network connecting the top 25 collaborators of S. Biesemans. A scholar is included among the top collaborators of S. Biesemans based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Biesemans. S. Biesemans is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 2 | |
| 3 | 0 | |
| 4 | 2 | |
| 5 | Simulation of Semiconductor Processes and Devices 1998: SISPAD 98 | 4 |
| 6 | Variability and technology aware SRAM Product yield maximization | 8 |
| 7 | 23 | |
| 8 | 99 | |
| 9 | 26 | |
| 10 | 29 | |
| 11 | 11 | |
| 12 | 13 | |
| 13 | 28 | |
| 14 | Optimized ultra-low thermal budget process flow for advanced High-K / Metal gate first CMOS using laser-annealing technology | 1 |
| 15 | 14 | |
| 16 | 191 | |
| 17 | 2 | |
| 18 | 33 | |
| 19 | Comparison of the freeze-out effect in In and B doped n-MOSFETs in the range 4.2-300 K | 1 |
| 20 | One junction approach to make deep submicron PMOSFETs for low power applications | 2 |
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.