Kathleen Nafus

588 total citations
69 papers, 409 citations indexed

About

Kathleen Nafus is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Kathleen Nafus has authored 69 papers receiving a total of 409 indexed citations (citations by other indexed papers that have themselves been cited), including 61 papers in Electrical and Electronic Engineering, 32 papers in Surfaces, Coatings and Films and 13 papers in Biomedical Engineering. Recurrent topics in Kathleen Nafus's work include Advancements in Photolithography Techniques (59 papers), Integrated Circuits and Semiconductor Failure Analysis (31 papers) and Electron and X-Ray Spectroscopy Techniques (25 papers). Kathleen Nafus is often cited by papers focused on Advancements in Photolithography Techniques (59 papers), Integrated Circuits and Semiconductor Failure Analysis (31 papers) and Electron and X-Ray Spectroscopy Techniques (25 papers). Kathleen Nafus collaborates with scholars based in Belgium, Japan and United States. Kathleen Nafus's co-authors include Roel Gronheid, Mark Somervell, Paul F. Nealey, Guanyang Lin, Yi Cao, Christopher J. Thode, Boon Teik Chan, Todd R. Younkin, Paulina Rincon Delgadillo and Carlos Fonseca and has published in prestigious journals such as ECS Journal of Solid State Science and Technology, ECS Transactions and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Kathleen Nafus

61 papers receiving 371 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Kathleen Nafus Belgium 12 309 176 155 107 45 69 409
Seiji Nagahara Japan 11 429 1.4× 122 0.7× 202 1.3× 184 1.7× 36 0.8× 44 502
Daniel Corliss United States 8 212 0.7× 107 0.6× 72 0.5× 73 0.7× 42 0.9× 23 311
Jeffrey Smith United States 7 296 1.0× 210 1.2× 91 0.6× 35 0.3× 36 0.8× 15 369
S. Barnola France 15 467 1.5× 238 1.4× 149 1.0× 38 0.4× 22 0.5× 49 530
Guanyang Lin United States 11 265 0.9× 374 2.1× 151 1.0× 81 0.8× 138 3.1× 38 457
Paulina Rincon Delgadillo Belgium 12 188 0.6× 270 1.5× 109 0.7× 56 0.5× 79 1.8× 24 335
Abraham Arceo United States 10 150 0.5× 108 0.6× 97 0.6× 85 0.8× 59 1.3× 18 324
Warren Montgomery United States 10 409 1.3× 32 0.2× 186 1.2× 187 1.7× 15 0.3× 34 463
Noel Corcoran United States 8 316 1.0× 100 0.6× 89 0.6× 35 0.3× 8 0.2× 21 386
Elizabeth Buitrago Switzerland 14 458 1.5× 66 0.4× 297 1.9× 124 1.2× 10 0.2× 35 534

Countries citing papers authored by Kathleen Nafus

Since Specialization
Citations

This map shows the geographic impact of Kathleen Nafus's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kathleen Nafus with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kathleen Nafus more than expected).

Fields of papers citing papers by Kathleen Nafus

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kathleen Nafus. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kathleen Nafus. The network helps show where Kathleen Nafus may publish in the future.

Co-authorship network of co-authors of Kathleen Nafus

This figure shows the co-authorship network connecting the top 25 collaborators of Kathleen Nafus. A scholar is included among the top collaborators of Kathleen Nafus based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Kathleen Nafus. Kathleen Nafus is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Fukui, Nobuyuki, Kathleen Nafus, Kenichi Miyaguchi, et al.. (2024). Pushing the boundaries of random logic metal patterning with low-n EUV single exposure. 46–46.
2.
Frommhold, Andreas, et al.. (2021). Pupil optimization for after etch defectivity: what imaging metrics matter?. 11517. 33–33. 2 indexed citations
3.
4.
5.
Rio, David del, Joern-Holger Franke, Mircea Dusa, et al.. (2018). EUV pupil optimization for 32nm pitch logic structures. 10143. 66–66. 2 indexed citations
6.
Enomoto, Masashi, et al.. (2017). Technology for defectivity improvement in resist coating and developing process in EUV lithography process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 1014326–1014326. 2 indexed citations
7.
8.
Simone, Danilo De, Şafak Sayan, Ivan Pollentier, et al.. (2016). Novel metal containing resists for EUV lithography extendibility. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977606–977606. 11 indexed citations
9.
Nafus, Kathleen, et al.. (2016). EUV process establishment through litho and etch for N7 node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97760C–97760C. 1 indexed citations
10.
Gronheid, Roel, et al.. (2015). Study of DSA Interaction Range using Gaussian Convolution. Proc SPIE. 9423. 1–94232.
11.
Chan, Boon Teik, Dieter Van den Heuvel, Lieve Van Look, et al.. (2015). Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 94230M–94230M. 12 indexed citations
12.
Nafus, Kathleen, et al.. (2014). Manufacturability improvements in EUV resist processing toward NXE:3300 processing. Proceedings of SPIE - The International Society for Optical Engineering. 9051. 2 indexed citations
13.
Nafus, Kathleen, et al.. (2012). Latest cluster performance for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83222Y–83222Y. 10 indexed citations
14.
Gronheid, Roel, Christopher J. Thode, Yi Cao, et al.. (2012). All track directed self-assembly of block copolymers: process flow and origin of defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 39 indexed citations
15.
Enomoto, Masashi, et al.. (2011). Investigation of processing performance and requirements for next generation lithography cluster tools. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79722X–79722X. 1 indexed citations
16.
Gronheid, Roel, et al.. (2010). EUV RLS performance tradeoffs for a polymer bound PAG resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76390M–76390M. 9 indexed citations
17.
Nafus, Kathleen, et al.. (2009). Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 727347–727347. 12 indexed citations
18.
Gronheid, Roel, et al.. (2009). Effect of PAG Distribution on ArF and EUV Resist Performance. Journal of Photopolymer Science and Technology. 22(1). 97–104. 7 indexed citations
19.
Nafus, Kathleen, et al.. (2008). Image contrast contributions to immersion lithography defect formation and process yield. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69244W–69244W. 1 indexed citations
20.
Nafus, Kathleen, et al.. (2006). Defectivity reduction by optimization of 193-nm immersion lithography using an interfaced exposure-track system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61533J–61533J. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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