Eric Hendrickx

3.8k total citations
177 papers, 3.1k citations indexed

About

Eric Hendrickx is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Eric Hendrickx has authored 177 papers receiving a total of 3.1k indexed citations (citations by other indexed papers that have themselves been cited), including 146 papers in Electrical and Electronic Engineering, 85 papers in Surfaces, Coatings and Films and 36 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Eric Hendrickx's work include Advancements in Photolithography Techniques (121 papers), Electron and X-Ray Spectroscopy Techniques (77 papers) and Integrated Circuits and Semiconductor Failure Analysis (60 papers). Eric Hendrickx is often cited by papers focused on Advancements in Photolithography Techniques (121 papers), Electron and X-Ray Spectroscopy Techniques (77 papers) and Integrated Circuits and Semiconductor Failure Analysis (60 papers). Eric Hendrickx collaborates with scholars based in Belgium, Netherlands and United States. Eric Hendrickx's co-authors include André Persoons, Koen Clays, C. Dehu, Bernard Kippelen, Vicky Philipsen, Seth R. Marder, Peter De Bisschop, David Van Steenwinckel, Jean‐Luc Brédas and N. Peyghambarian and has published in prestigious journals such as Science, Journal of the American Chemical Society and Advanced Materials.

In The Last Decade

Eric Hendrickx

169 papers receiving 2.9k citations

Peers

Countries citing papers authored by Eric Hendrickx

Since Specialization

Citations

This map shows the geographic impact of Eric Hendrickx's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eric Hendrickx with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eric Hendrickx more than expected).

Fields of papers citing papers by Eric Hendrickx

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eric Hendrickx. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eric Hendrickx. The network helps show where Eric Hendrickx may publish in the future.

Co-authorship network of co-authors of Eric Hendrickx

This figure shows the co-authorship network connecting the top 25 collaborators of Eric Hendrickx. A scholar is included among the top collaborators of Eric Hendrickx based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Eric Hendrickx. Eric Hendrickx is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography 2025 ·Lirias (KU Leuven) ·Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, Kurt Ronse, Stefan De Gendt, Eric Hendrickx	1
2	Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation 2025 ·ACS Applied Materials & Interfaces ·Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, Kurt Ronse, Stefan De Gendt, Eric Hendrickx	0
3	Mask innovations on the eve of high NA EUV lithography 2024 ·Japanese Journal of Applied Physics ·Vicky Philipsen, Andreas Frommhold, (unknown), (unknown), Inhwan Lee, Joern-Holger Franke, Joost Bekaert, Lieve Van Look, (unknown), Peter De Bisschop, R. Jonckheere, (unknown), Vincent Wiaux, Eric Hendrickx	2
4	High-NA benefit assessment through Zeiss AIMS EUV for tip-to-tip patterning by EUVL 2024 ·R. Jonckheere, (unknown), (unknown), Vicky Philipsen, Eric Hendrickx, Andreas Verch, (unknown), (unknown)	0
5	Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization 2024 ·(unknown), Vicky Philipsen, Joern-Holger Franke, Kurt Ronse, Eric Hendrickx	3
6	Hydrogen recycling for EUV 2023 ·(unknown), (unknown), (unknown), T. Vandeweyer, Eric Hendrickx	3
7	Two-dimensional feature stochastic printing with mask deficiencies in high-NA EUV 2021 ·Lawrence S. Melvin, R. Jonckheere, Eric Hendrickx	4
8	Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects? 2018 ·Journal of Micro/Nanolithography MEMS and MOEMS ·Andreas Erdmann, Peter Evanschitzky, (unknown), Vicky Philipsen, Eric Hendrickx, M. Bauer	19
9	EUV pupil optimization for 32nm pitch logic structures 2018 ·David del Rio, (unknown), Joern-Holger Franke, Mircea Dusa, (unknown), S. Biesemans, Kathleen Nafus, Werner Gillijns, Eric Hendrickx, (unknown), (unknown), (unknown)	2
10	Attenuated PSM for EUV: Can they mitigate 3D mask effects? 2018 ·Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) ·Andreas Erdmann, Peter Evanschitzky, Vicky Philipsen, M. Bauer, Eric Hendrickx, (unknown)	17
11	Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Weimin Gao, Víctor Blanco, Vicky Philipsen, (unknown), (unknown), Ivan Ciofi, Lawrence S. Melvin, Eric Hendrickx, Vincent Wiaux, (unknown)	5
12	Experimental validation of stochastic modeling for negative-tone develop EUV resists 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Weimin Gao, (unknown), (unknown), (unknown), Kevin Lucas, Danilo De Simone, Eric Hendrickx, Geert Vandenberghe	2
13	Deep ultraviolet out-of-band characterization of EUVL scanners and resists 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gian F. Lorusso, (unknown), Jun Iwashita, (unknown), Eric Hendrickx	6
14	Latest cluster performance for EUV lithography 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Kathleen Nafus, (unknown), (unknown), Jan Hermans, Eric Hendrickx, (unknown), Dieter Van den Heuvel	10
15	Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification 2011 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Gian F. Lorusso, Eric Hendrickx, Natalia Davydova, Yue Peng, (unknown), (unknown), (unknown)	6
16	Lithography options for the 32nm half pitch node and beyond 2008 ·Kurt Ronse, (unknown), Roel Gronheid, Eric Hendrickx, Mireille Maenhoudt, (unknown), Geert Vandenberghe	3
17	Tracking novelty filter at 780 nm based on a photorefractive polymer in a two-beam coupling geometry 2001 ·Applied Optics ·Eric Hendrickx, David Van Steenwinckel, André Persoons	8
18	High photogeneration efficiency of charge-transfer complexes formed between low ionization potential arylamines and C60 2000 ·The Journal of Chemical Physics ·Eric Hendrickx, Bernard Kippelen, S. Thayumanavan, Seth R. Marder, André Persoons, N. Peyghambarian	35
19	Nonlinear Optical Properties of Correlated Chromophores in Organic Mesoscopic Superstructures 1998 ·Advanced Materials ·Koen Clays, Eric Hendrickx, Thierry Verbiest, André Persoons	53
20	Theoretical and experimental investigation of the second-order nonlinear optical properties of retinal and derivatives 1995 ·Synthetic Metals ·C. Dehu, Eric Hendrickx, Koen Clays, A. Persoons, Jean‐Luc Brédas	5

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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