Mircea Dusa

1.0k citations

109 papers · 710 indexed · h-index 14

Impact in

Surfaces, Coatings and Films top 2%
- Optical Coatings and Gratings
- Electron and X-Ray Spectroscopy Techniques
Hardware and Architecture top 10%
- VLSI and Analog Circuit Testing

Papers in

Surfaces, Coatings and Films 44
- Optical Coatings and Gratings 26
- Electron and X-Ray Spectroscopy Techniques 19
Electrical and Electronic Engineering 98
- Advancements in Photolithography Techniques 95
- Integrated Circuits and Semiconductor Failure Analysis 41
- 3D IC and TSV technologies 15

Co-authors: Jo Finders Robert Socha Stephen Hsu Harry Levinson Mireille Maenhoudt Xuelong Shi William H. Arnold T. Vandeweyer
Journals: Japanese Journal of Applied Physics (1 paper)Microelectronic Engineering (1 paper)Journal of Photopolymer Science and Technology (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (91 papers)
Partner nations: Netherlands United States Belgium

In The Last Decade

Mircea Dusa

94 papers receiving 640 citations

Peers

Countries citing papers authored by Mircea Dusa

Since Specialization

Citations

This map shows the geographic impact of Mircea Dusa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mircea Dusa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mircea Dusa more than expected).

Fields of papers citing papers by Mircea Dusa

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mircea Dusa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mircea Dusa. The network helps show where Mircea Dusa may publish in the future.

Co-authors

The 25 scholars most cited alongside Mircea Dusa, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mircea Dusa Line = papers co-authored together Mircea Dusa links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Lithography strategies on overlay control of backside processing in complementary field effect transistor (CFET) device Matthew N. Johnson, J. P. McFadden, 张滨阿, Teresa Rodrigues, Koen D’havé, A. Vandooren, Rosemary O. Esle, K. Reshma Kadhar Basha, J. S. Gold, S. Demuynck, Naoto Horiguchi, S. Biesemans, Francesco Panzera, Mircea Dusa, Sandip Halder	2025	0
2	Pushing the boundaries of random logic metal patterning with low-n EUV single exposure Myoung Yul Oh, Andris Smolovskis, Kazimierz ĆMIELEWSKI, Kannan Perumal, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Jonathan B. Parr, Joost Bekaert, Andrew Cross, Mircea Dusa, Bernard Bok	2024	0
3	The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography Andrew D. L. Humphris, Alain Moussa, Mircea Dusa, Nate Majewski, Elis Newham, J. D. S. Goulden, Xuhao Zhao, Rimsky Wolfs	2020	1
4	EUV pupil optimization for 32nm pitch logic structures David del Rio, Bernard Bok, Joern-Holger Franke, Mircea Dusa, M Derenzini, S. Biesemans, Kathleen Nafus, Werner Gillijns, Eric Hendrickx, Nataliia Holiardyk, Carrie J. Brownhill, U. K. Dhatt	2018	2
5	Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Yuan Wang, Rich Wise, Liesbeth Reijnen, von Overbeck J, Patrick Jaenen, Salina binti Kassim, Guillaume Mernier, Felipe Mainka, David Hellin, 石幡哲也, Sam Long, Y.Ch. Wang, Jan Mulkens, Mircea Dusa, U Wick, C. A. Silva, Philippe Leray	2016	3
6	Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Antoine Ginésy, Josefina Heyermann Vial, K Fuse, Min‐Soo Kim, D. Mocuta, Julien Ryckaert, A. Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa	2015	6
7	Design technology co-optimization for a robust 10nm Metal1 solution for logic design and SRAM Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kohei IMAMIYA, Khotsianova Sa, Antoine Ginésy, Julien Ryckaert, Mircea Dusa	2014	13
8	3D features measurement using YieldStar, an angle resolved polarized scatterometer Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nate Majewski, Philippe Leray, Koen D’havé, N. Bourges, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa	2011	0
9	Solutions for 22-nm node patterning using ArFi technology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jo Finders, Mircea Dusa, Jan Mulkens, Yu Cao, Maryana Escalante	2011	4
10	Metrology challenges of double exposure and double patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William H. Arnold, Mircea Dusa, Graciete Teixeira David	2007	10
11	Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ceplīte Biruta, Bruno La Fontaine, Richard L. Sandberg, 贾晓萍, Harry Levinson, 正雄宅見, Mircea Dusa, Jacyara Abeacy Azevedo de Andrade, Clodagh McAleer, Э. М. Гюльахмедова, Jesper U. Fuchs, Bo Yang, Cemil Cahit Mollaibrahimoğlu	2007	2
12	Utilization of Insitu Metrology Capability of ASML Lithography Scanner to Improve Overall Process Control Dini Pujiani, Mircea Dusa, Jan van Schoot, Syuan-Rong Dai, Maurice H. M. Janssen, Koen van Ingen Schenau, Rupali B Patle	2006	1
13	Intra-wafer CDU characterization to determine process and focus contributions based on scatterometry metrology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Mircea Dusa, 重彦蓮実, Bhanwar Singh, Xin Qi, 弘明本庄, O S Padilha	2004	9
14	Optical lithography in the sub-50-nm regime Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Donis G. Flagello, William A. Arnold, Saad Ahmed Mohamed Youssef, Mircea Dusa, Robert Socha, Jan Mulkens, Reiner Garreis	2004	9
15	Novel diffraction-based spectroscopic method for overlay metrology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Youngji Seo, R. Lowe-Webb, Chinny Nzekwe Excel, Jiangtao Hu, Fortune. Mapurisa, Nuchanat Jamrat, Mircea Dusa, Arie J. den Boef, Andar Alwein Pinilas, م.م ازهار برهان اسماعيل	2003	39
16	Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Molly Kathleen Powers, Jo Finders, Mircea Dusa	2003	0
17	Study of mask aerial images to predict CD proximity and line end shortening of resist patterns Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Mircea Dusa, Ondřej Pacák, Carolina Marin Suarez, Nisa Fazlıoğlu	2001	3
18	<title>Low-k1 imaging: how low can we go?</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jo Finders, Sukanto Sukanto, Koen van Ingen Schenau, Mircea Dusa, Peter Jenkins	2000	5
19	Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, Xuelong Shi, Angira Singhvi, Mircea Dusa, Will Conley, John S. Petersen, Barbaros Yıldırım, 胡乐安, D. Picchio, Y Taniguchi, Hugues Rafaralahy, Najib Boubakri, Javier Martín Urdániz, T. R. Pattinson, Novita Sari Indrianto, Н. В. Гончар, 康平高木, Bo Su	1999	1
20	Overlay target design characterization and optimization for tungsten CMP Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stephen D. H. Hsu, Mircea Dusa, Joost J. Vlassak, Yukako Shiba, Marcelo Amaral Lanfranchi	1998	5

About Mircea Dusa

Mircea Dusa is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering, Biomedical Engineering and Hardware and Architecture, having authored 109 papers that have together received 710 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (95 papers), Integrated Circuits and Semiconductor Failure Analysis (41 papers), Optical Coatings and Gratings (26 papers), Electron and X-Ray Spectroscopy Techniques (19 papers), Advanced Surface Polishing Techniques (16 papers), Nanofabrication and Lithography Techniques (15 papers), 3D IC and TSV technologies (15 papers) and Advanced Measurement and Metrology Techniques (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (221 citations), Hardware and Architecture (77 citations), Electrical and Electronic Engineering (635 citations), Biomedical Engineering (270 citations) and Industrial and Manufacturing Engineering (48 citations). Mircea Dusa has collaborated with scholars based in Netherlands, United States and Belgium. Frequent co-authors include Jo Finders, Robert Socha, Stephen Hsu, Harry Levinson, Mireille Maenhoudt, Xuelong Shi, William H. Arnold, T. Vandeweyer, Michael C. Smayling and Koen van Ingen Schenau. Their work appears in journals such as Japanese Journal of Applied Physics, Microelectronic Engineering, Journal of Photopolymer Science and Technology and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

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