E. Dentoni Litta

1.3k total citations
69 papers, 469 citations indexed

About

E. Dentoni Litta is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, E. Dentoni Litta has authored 69 papers receiving a total of 469 indexed citations (citations by other indexed papers that have themselves been cited), including 68 papers in Electrical and Electronic Engineering, 11 papers in Electronic, Optical and Magnetic Materials and 7 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in E. Dentoni Litta's work include Semiconductor materials and devices (67 papers), Advancements in Semiconductor Devices and Circuit Design (45 papers) and Ferroelectric and Negative Capacitance Devices (26 papers). E. Dentoni Litta is often cited by papers focused on Semiconductor materials and devices (67 papers), Advancements in Semiconductor Devices and Circuit Design (45 papers) and Ferroelectric and Negative Capacitance Devices (26 papers). E. Dentoni Litta collaborates with scholars based in Belgium, Sweden and United States. E. Dentoni Litta's co-authors include Mikael Östling, Per‐Erik Hellström, Naoto Horiguchi, Christoph Henkel, A. Spessot, R. Ritzenthaler, Julien Ryckaert, Yusuke Oniki, Barry O’Sullivan and Pieter Weckx and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Nanoscale.

In The Last Decade

E. Dentoni Litta

66 papers receiving 448 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Dentoni Litta Belgium 12 414 106 53 50 30 69 469
Slimane Oussalah Algeria 11 264 0.6× 124 1.2× 53 1.0× 46 0.9× 27 0.9× 57 327
M. Togo Japan 14 599 1.4× 66 0.6× 62 1.2× 69 1.4× 24 0.8× 68 619
A. Chou United States 11 657 1.6× 114 1.1× 80 1.5× 71 1.4× 24 0.8× 24 684
Yusuke Oniki Belgium 8 257 0.6× 60 0.6× 27 0.5× 46 0.9× 17 0.6× 32 282
Hiroaki Arimura Belgium 15 620 1.5× 95 0.9× 82 1.5× 95 1.9× 20 0.7× 96 651
Jeff J. Peterson United States 16 629 1.5× 145 1.4× 42 0.8× 18 0.4× 34 1.1× 35 660
C. D’Emic United States 11 605 1.5× 197 1.9× 115 2.2× 49 1.0× 39 1.3× 15 630
Mark N. Ruberto United States 11 418 1.0× 77 0.7× 82 1.5× 42 0.8× 11 0.4× 23 458
J.T. Clemens United States 9 426 1.0× 33 0.3× 55 1.0× 54 1.1× 15 0.5× 31 454
G. Ribes France 14 924 2.2× 121 1.1× 54 1.0× 29 0.6× 55 1.8× 49 940

Countries citing papers authored by E. Dentoni Litta

Since Specialization
Citations

This map shows the geographic impact of E. Dentoni Litta's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Dentoni Litta with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Dentoni Litta more than expected).

Fields of papers citing papers by E. Dentoni Litta

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Dentoni Litta. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Dentoni Litta. The network helps show where E. Dentoni Litta may publish in the future.

Co-authorship network of co-authors of E. Dentoni Litta

This figure shows the co-authorship network connecting the top 25 collaborators of E. Dentoni Litta. A scholar is included among the top collaborators of E. Dentoni Litta based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Dentoni Litta. E. Dentoni Litta is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Franco, J., Hiroaki Arimura, S. Brus, et al.. (2024). Impact of work function metal stacks on the performance and reliability of multi-V RMG CMOS technology. Solid-State Electronics. 216. 108929–108929. 1 indexed citations
2.
Franco, J., Hiroaki Arimura, Jean‐François de Marneffe, et al.. (2023). Novel Low Thermal Budget CMOS RMG: Performance and Reliability Benchmark Against Conventional High Thermal Budget Gate Stack Solutions. 1–2. 1 indexed citations
3.
Rosseel, Erik, Clément Porret, Andriy Hikavyy, et al.. (2022). Properties of Selectively Grown Si:P Layers below 500°C for Use in Stacked Nanosheet Devices. ECS Transactions. 109(4). 93–98.
4.
Veloso, A., Geert Eneman, Bjorn Vermeersch, et al.. (2022). Insights into Scaled Logic Devices Connected from Both Wafer Sides. 2022 International Electron Devices Meeting (IEDM). 23.3.1–23.3.4. 4 indexed citations
5.
Eyben, Pierre, Goutham Arutchelvan, T. Chiarella, et al.. (2022). Investigation of access resistance components in Si-channel p-FinFET using cascaded devices.. 1 indexed citations
6.
Bastos, João P. A., Barry O’Sullivan, J. Franco, et al.. (2022). Bias Temperature Instability (BTI) of High-Voltage Devices for Memory Periphery. 1–6. 4 indexed citations
7.
Hellings, Geert, A. Veloso, Anne Jourdain, et al.. (2022). Enabling Active Backside Technology for ESD and LU Reliability in DTCO/STCO. 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits). 431–432.
8.
Spessot, A., R. Ritzenthaler, E. Dentoni Litta, et al.. (2021). 80 nm tall thermally stable cost effective FinFETs for advanced dynamic random access memory periphery devices for artificial intelligence/machine learning and automotive applications. Japanese Journal of Applied Physics. 60(SB). SBBB06–SBBB06. 7 indexed citations
9.
Franco, J., Jean‐François de Marneffe, A. Vandooren, et al.. (2021). Low Temperature Atomic Hydrogen Treatment for Superior NBTI Reliability—Demonstration and Modeling across SiO 2 IL Thicknesses from 1.8 to 0.6 nm for I/O and Core Logic. Symposium on VLSI Technology. 1–2. 3 indexed citations
10.
Vandooren, A., Toshiyuki Tabata, Pierre Eyben, et al.. (2021). Potential benefits of S/D HDD activation by melt laser annealing in 3D-integrated top-tier FDSOI FETs. 2 indexed citations
11.
Wu, Zhicheng, J. Franco, Hiroaki Arimura, et al.. (2021). 3D sequential CMOS top tier devices demonstration using a low temperature Smart Cut™ Si layer transfer. 1 indexed citations
12.
Salahuddin, Shairfe Muhammad, E. Dentoni Litta, Anshul Gupta, et al.. (2020). Thermal Stress-Aware CMOS–SRAM Partitioning in Sequential 3-D Technology. IEEE Transactions on Electron Devices. 67(11). 4631–4635. 2 indexed citations
13.
Vincent, Benjamin, M. Kamon, T. Schram, et al.. (2020). Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle. IEEE Transactions on Electron Devices. 67(12). 5374–5380. 11 indexed citations
14.
O’Sullivan, Barry, D. Linten, Naoto Horiguchi, et al.. (2019). Reliability Engineering Enabling Continued Logic for Memory Device Scaling. 1–11. 5 indexed citations
15.
Litta, E. Dentoni, R. Ritzenthaler, T. Schram, et al.. (2018). CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits. Japanese Journal of Applied Physics. 57(4S). 04FB08–04FB08. 4 indexed citations
16.
Oniki, Yusuke, Guy Vereecke, E. Dentoni Litta, et al.. (2018). RMG Patterning by Digital Wet Etching of Polycrystalline Metal Films. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 282. 132–138.
17.
Ritzenthaler, R., Moonju Cho, T. Schram, et al.. (2017). Treatments for reliability improvement in thick oxides diffusion and gate replacement I/O transistors. International Journal of Materials Engineering Innovation. 8(1). 53–53. 7 indexed citations
18.
Mitrović, Ivona Z., S. Hall, David Hesp, et al.. (2015). Atomic-layer deposited thulium oxide as a passivation layer on germanium. Journal of Applied Physics. 117(21). 6 indexed citations
19.
Vaziri, Sam, E. Dentoni Litta, Anderson D. Smith, et al.. (2015). Bilayer insulator tunnel barriers for graphene-based vertical hot-electron transistors. Nanoscale. 7(30). 13096–13104. 43 indexed citations
20.
Litta, E. Dentoni, Per‐Erik Hellström, Christoph Henkel, & Mikael Östling. (2013). Characterization of thulium silicate interfacial layer for high-k/metal gate MOSFETs. 121–124. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Slimane Oussalah Breakdown of academic impact, for papers by M. Togo Breakdown of academic impact, for papers by A. Chou Breakdown of academic impact, for papers by Yusuke Oniki Breakdown of academic impact, for papers by Hiroaki Arimura Breakdown of academic impact, for papers by Jeff J. Peterson Breakdown of academic impact, for papers by C. D’Emic Breakdown of academic impact, for papers by Mark N. Ruberto Breakdown of academic impact, for papers by J.T. Clemens Breakdown of academic impact, for papers by G. Ribes
Rankless by CCL
2026