M. Togo
Impact in
-
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
- Low-power high-performance VLSI design
- Silicon Carbide Semiconductor Technologies
Papers in
-
- Semiconductor materials and devices 56
- Advancements in Semiconductor Devices and Circuit Design 51
- Integrated Circuits and Semiconductor Failure Analysis 25
- Ferroelectric and Negative Capacitance Devices 9
- Silicon and Solar Cell Technologies 7
- Photonic and Optical Devices 4
- Co-authors
- T. ChiarellaNaoto HoriguchiG. GroesenekenJ. FrancoL.-Å. RagnarssonTohru MogamiThomas HoffmannP. Absil
- Journals
- IEEE Transactions on Electron Devices (4 papers)Japanese Journal of Applied Physics (3 papers)IEEE Electron Device Letters (3 papers)Applied Physics Letters (2 papers)Microelectronic Engineering (2 papers)
- Partner nations
- JapanBelgiumUnited States
In The Last Decade
M. Togo
64 papers receiving 597 citations
Peers
Comparison fields: 5 of 24
- Electrical and Electronic Engineering 599
- Hardware and Architecture 18
- Atomic and Molecular Physics, and Optics 62
- Biomedical Engineering 69
- Materials Chemistry 66
Countries citing papers authored by M. Togo
This map shows the geographic impact of M. Togo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Togo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Togo more than expected).
Fields of papers citing papers by M. Togo
This network shows the impact of papers produced by M. Togo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Togo. The network helps show where M. Togo may publish in the future.
Co-authorship network
The 25 scholars most cited alongside M. Togo, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2015 | 2 | |
| 2 | Heated implantation with amorphous Carbon CMOS mask for scaled FinFETs | 2013 | 6 |
| 3 | 2013 | 10 | |
| 4 | 2013 | 15 | |
| 5 | 2013 | 28 | |
| 6 | 2013 | 8 | |
| 7 | 2012 | 75 | |
| 8 | 2012 | 33 | |
| 9 | 2012 | 1 | |
| 10 | 2012 | 10 | |
| 11 | 2012 | 1 | |
| 12 | 2012 | 5 | |
| 13 | 2011 | 49 | |
| 14 | 2010 | 7 | |
| 15 | 2002 | 6 | |
| 16 | 2002 | 1 | |
| 17 | 2002 | 11 | |
| 18 | 2002 | 8 | |
| 19 | 2001 | 16 | |
| 20 | 1993 | 4 |
About M. Togo
M. Togo is a scholar working on Electrical and Electronic Engineering, Hardware and Architecture, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Condensed Matter Physics, having authored 68 papers that have together received 619 indexed citations. Recurring topics across this work include Semiconductor materials and devices (56 papers), Advancements in Semiconductor Devices and Circuit Design (51 papers), Integrated Circuits and Semiconductor Failure Analysis (25 papers), Ferroelectric and Negative Capacitance Devices (9 papers), Silicon and Solar Cell Technologies (7 papers), Semiconductor materials and interfaces (6 papers), Copper Interconnects and Reliability (4 papers) and Photonic and Optical Devices (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (599 citations), Hardware and Architecture (18 citations), Atomic and Molecular Physics, and Optics (62 citations), Biomedical Engineering (69 citations) and Materials Chemistry (66 citations). M. Togo has collaborated with scholars based in Japan, Belgium and United States. Frequent co-authors include T. Chiarella, Naoto Horiguchi, G. Groeseneken, J. Franco, L.-Å. Ragnarsson, Tohru Mogami, Thomas Hoffmann, P. Absil, T. Schram and B. Kaczer. Their work appears in journals such as IEEE Transactions on Electron Devices, Japanese Journal of Applied Physics, IEEE Electron Device Letters, Applied Physics Letters and Microelectronic Engineering.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.