Yusuke Oniki

571 total citations
32 papers, 282 citations indexed

About

Yusuke Oniki is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Yusuke Oniki has authored 32 papers receiving a total of 282 indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 7 papers in Electronic, Optical and Magnetic Materials and 7 papers in Materials Chemistry. Recurrent topics in Yusuke Oniki's work include Semiconductor materials and devices (28 papers), Advancements in Semiconductor Devices and Circuit Design (15 papers) and Copper Interconnects and Reliability (7 papers). Yusuke Oniki is often cited by papers focused on Semiconductor materials and devices (28 papers), Advancements in Semiconductor Devices and Circuit Design (15 papers) and Copper Interconnects and Reliability (7 papers). Yusuke Oniki collaborates with scholars based in Belgium, Japan and United States. Yusuke Oniki's co-authors include Tomo Ueno, Efrain Altamirano Sánchez, Julien Ryckaert, Pieter Weckx, Frank Holsteyns, Naoto Horiguchi, E. Dentoni Litta, Doyoung Jang, Bilal Chehab and P. Schuddinck and has published in prestigious journals such as Nano Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Yusuke Oniki

29 papers receiving 264 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Yusuke Oniki Belgium	8	257	60	46	27	17	32	282
E. Dentoni Litta Belgium	12	414 1.6×	106 1.8×	50 1.1×	53 2.0×	30 1.8×	69	469
F. Bénistant Singapore	10	260 1.0×	34 0.6×	37 0.8×	55 2.0×	12 0.7×	52	294
Juergen Boemmels Belgium	7	316 1.2×	36 0.6×	54 1.2×	17 0.6×	46 2.7×	28	351
F.N. Cubaynes Belgium	9	369 1.4×	48 0.8×	60 1.3×	34 1.3×	7 0.4×	26	388
S. Locorotondo Belgium	10	266 1.0×	33 0.6×	51 1.1×	51 1.9×	13 0.8×	19	269
C. Arvet France	10	223 0.9×	44 0.7×	61 1.3×	23 0.9×	24 1.4×	28	230
Y. Kamigaki Japan	9	355 1.4×	95 1.6×	27 0.6×	32 1.2×	19 1.1×	18	370
Farid Sebaai Belgium	10	397 1.5×	85 1.4×	91 2.0×	56 2.1×	21 1.2×	41	411
R. Schreutelkamp Belgium	10	257 1.0×	41 0.7×	51 1.1×	39 1.4×	7 0.4×	31	276
Hiroaki Arimura Belgium	15	620 2.4×	95 1.6×	95 2.1×	82 3.0×	20 1.2×	96	651

Countries citing papers authored by Yusuke Oniki

Since Specialization

Citations

This map shows the geographic impact of Yusuke Oniki's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Yusuke Oniki with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Yusuke Oniki more than expected).

Fields of papers citing papers by Yusuke Oniki

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Yusuke Oniki. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Yusuke Oniki. The network helps show where Yusuke Oniki may publish in the future.

Co-authorship network of co-authors of Yusuke Oniki

This figure shows the co-authorship network connecting the top 25 collaborators of Yusuke Oniki. A scholar is included among the top collaborators of Yusuke Oniki based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Yusuke Oniki. Yusuke Oniki is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Nuytten, Thomas, et al.. (2024). Taming the Distribution of Light in Gate-All-Around Semiconductor Devices. Nano Letters. 24(4). 1191–1196. 2 indexed citations

Oniki, Yusuke, et al.. (2023). Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescence. Journal of Micro/Nanopatterning Materials and Metrology. 22(3). 5 indexed citations

Veloso, A., Geert Eneman, Bjorn Vermeersch, et al.. (2022). Insights into Scaled Logic Devices Connected from Both Wafer Sides. 2022 International Electron Devices Meeting (IEDM). 23.3.1–23.3.4. 4 indexed citations

Oniki, Yusuke, Efrain Altamirano Sánchez, Hans Mertens, et al.. (2022). Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs. 6–6. 2 indexed citations

Murdoch, Gayle, Martin G. O’Toole, D. Tsvetanova, et al.. (2022). First demonstration of Two Metal Level Semi-damascene Interconnects with Fully Self-aligned Vias at 18MP. 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits). 1–2. 5 indexed citations

Arreghini, A., Devin Verreck, Gabriele Luca Donadio, et al.. (2022). At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells. Lirias (KU Leuven). 8 indexed citations

Breuil, L., Filip Schleicher, Farid Sebaai, et al.. (2021). First Demonstration of Ruthenium and Molybdenum Word lines Integrated into 40nm Pitch 3D-NAND Memory Devices. Symposium on VLSI Technology. 1–2. 4 indexed citations

Harada, Ken, et al.. (2021). Si<sub>1-X</sub>Ge<sub>X</sub> Selective Etchant for Gate-All-Around Transistors. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 314. 71–76. 2 indexed citations

Arimura, Hiroaki, Lars‐Åke Ragnarsson, Yusuke Oniki, et al.. (2021). Dipole-First Gate Stack as a Scalable and Thermal Budget Flexible Multi-Vt Solution for Nanosheet/CFET Devices. 2021 IEEE International Electron Devices Meeting (IEDM). 13.5.1–13.5.4. 15 indexed citations

10.

Oniki, Yusuke, Efrain Altamirano Sánchez, & Frank Holsteyns. (2019). (Invited) Selective Etches for Gate-All-Around (GAA) Device Integration: Opportunities and Challenges. ECS Meeting Abstracts. MA2019-02(23). 1092–1092. 2 indexed citations

11.

Oniki, Yusuke, Efrain Altamirano Sánchez, & Frank Holsteyns. (2019). (Invited) Selective Etches for Gate-All-Around (GAA) Device Integration: Opportunities and Challenges. ECS Transactions. 92(2). 3–12. 23 indexed citations

12.

Oniki, Yusuke, Guy Vereecke, E. Dentoni Litta, et al.. (2018). RMG Patterning by Digital Wet Etching of Polycrystalline Metal Films. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 282. 132–138.

13.

Mocuta, A., Pieter Weckx, S. Demuynck, et al.. (2018). Enabling CMOS Scaling Towards 3nm and Beyond. 147–148. 25 indexed citations

14.

Oniki, Yusuke & Tomo Ueno. (2012). Water-Related Hole Traps at Thermally Grown GeO₂–Ge Interface. Japanese Journal of Applied Physics. 51(4S). 04DA01–04DA01. 4 indexed citations

15.

Suzuki, Yuya, et al.. (2011). Fabrication of High-k/Ge Stacks with High Quality GeO₂ Interlayer. ECS Transactions. 41(3). 29–37.

16.

Oniki, Yusuke & Tomo Ueno. (2011). Generation and Controlling the Trap in Absorbent Germanium Oxide Film. Applied Physics Express. 4(8). 81101–81101. 5 indexed citations

17.

Suzuki, Yuya, et al.. (2010). Achievement of Excellent C-V Characteristics in GeO₂/Ge System Using Post Metal Deposition Annealing. ECS Transactions. 33(6). 111–119. 1 indexed citations

18.

Oniki, Yusuke, et al.. (2010). Evaluation of GeO desorption behavior in the metal/GeO2/Ge structure and its improvement of the electrical characteristics. Journal of Applied Physics. 107(12). 124113–124113. 39 indexed citations

19.

Oniki, Yusuke, et al.. (2009). HfO₂/Si and HfSiO/Si Structures Fabricated by Oxidation of Metal Thin Films. Japanese Journal of Applied Physics. 48(5S1). 05DA01–05DA01. 13 indexed citations

20.

Oniki, Yusuke, et al.. (2008). Fabrication of High-k/Si Structure Using Metal Deposition Followed by Oxidation. ECS Transactions. 16(5). 139–145. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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