Monique Ercken

728 total citations
49 papers, 331 citations indexed

About

Monique Ercken is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Monique Ercken has authored 49 papers receiving a total of 331 indexed citations (citations by other indexed papers that have themselves been cited), including 49 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 7 papers in Surfaces, Coatings and Films. Recurrent topics in Monique Ercken's work include Advancements in Photolithography Techniques (41 papers), Integrated Circuits and Semiconductor Failure Analysis (27 papers) and Advanced Surface Polishing Techniques (13 papers). Monique Ercken is often cited by papers focused on Advancements in Photolithography Techniques (41 papers), Integrated Circuits and Semiconductor Failure Analysis (27 papers) and Advanced Surface Polishing Techniques (13 papers). Monique Ercken collaborates with scholars based in Belgium, United States and Japan. Monique Ercken's co-authors include Ivan Pollentier, J.A. Croon, H.E. Maes, Willy Sansen, Stefaan Decoutere, Gert Storms, Kurt Ronse, Leonardus H. A. Leunissen, G. P. Patsis and Roel Gronheid and has published in prestigious journals such as Japanese Journal of Applied Physics, Microelectronic Engineering and ECS Transactions.

In The Last Decade

Monique Ercken

44 papers receiving 297 citations

Peers

Monique Ercken
Carlos Fonseca United States
Ryoung-Han Kim United States
Neal Lafferty United States
Mireille Maenhoudt Belgium
Alessandro Vaglio Pret Belgium
John L. Sturtevant United States
Ki‐Ho Baik United States
Mark D. Smith United States
Stewart A. Robertson United States
G. Owen United States
Carlos Fonseca United States
Monique Ercken
Citations per year, relative to Monique Ercken Monique Ercken (= 1×) peers Carlos Fonseca

Countries citing papers authored by Monique Ercken

Since Specialization
Citations

This map shows the geographic impact of Monique Ercken's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Monique Ercken with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Monique Ercken more than expected).

Fields of papers citing papers by Monique Ercken

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Monique Ercken. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Monique Ercken. The network helps show where Monique Ercken may publish in the future.

Co-authorship network of co-authors of Monique Ercken

This figure shows the co-authorship network connecting the top 25 collaborators of Monique Ercken. A scholar is included among the top collaborators of Monique Ercken based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Monique Ercken. Monique Ercken is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Litta, E. Dentoni, R. Ritzenthaler, T. Schram, et al.. (2018). CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits. Japanese Journal of Applied Physics. 57(4S). 04FB08–04FB08. 4 indexed citations
2.
Wan, Danny, Mauricio Manfrini, Adrien Vaysset, et al.. (2018). Fabrication of magnetic tunnel junctions connected through a continuous free layer to enable spin logic devices. Japanese Journal of Applied Physics. 57(4S). 04FN01–04FN01. 10 indexed citations
3.
Wan, Danny, Sara Paolillo, Nouredine Rassoul, et al.. (2018). Subtractive Etch of Ruthenium for Sub-5nm Interconnect. 10–12. 22 indexed citations
4.
Winroth, Gustaf, et al.. (2014). Modeling the lithography of ion implantation resists on topography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9052. 90520Z–90520Z. 2 indexed citations
5.
Versluijs, Janko, Gayle Murdoch, Peter De Bisschop, et al.. (2012). Process development using negative tone development for the dark field critical layers in a 28nm node process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8326. 83260W–83260W. 2 indexed citations
6.
Sánchez, Efrain Altamirano, Yoko Yamaguchi, Naoto Horiguchi, et al.. (2011). Dry Etch Fin Patterning of a Sub-22nm Node SRAM Cell: EUV Lithography New Dry Etch Challenges. ECS Transactions. 34(1). 377–382. 2 indexed citations
7.
Ercken, Monique, et al.. (2009). Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 727211–727211. 1 indexed citations
8.
Gronheid, Roel, et al.. (2007). Measurement and evaluation of water uptake by resists, top coats, stacks, and correlation with watermark defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65190E–65190E. 5 indexed citations
9.
Ercken, Monique, et al.. (2006). Investigation of New Slection Citeria for an Otimized Imersion Process. Journal of Photopolymer Science and Technology. 19(4). 539–546. 3 indexed citations
10.
Rooyackers, R., E. Augendre, B. Degroote, et al.. (2006). Doubling or quadrupling MuGFET fin integration scheme with higher pattern fidelity, lower CD variation and higher layout efficiency. 1–4. 17 indexed citations
11.
Lorusso, Gian F., Philippe Leray, T. Vandeweyer, et al.. (2006). Comprehensive approach to MuGFET metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 615219–615219. 5 indexed citations
12.
Vandenberghe, Geert, et al.. (2005). Opportunities and Challenges in Immersion Lithography. Journal of Photopolymer Science and Technology. 18(5). 571–577. 4 indexed citations
13.
Leunissen, Leonardus H. A., Monique Ercken, & G. P. Patsis. (2005). Determining the impact of statistical fluctuations on resist line edge roughness. Microelectronic Engineering. 78-79. 2–10. 13 indexed citations
14.
Pollentier, Ivan, et al.. (2005). Resist profile control in immersion lithography using scatterometry measurements. 11–11. 3 indexed citations
15.
Gronheid, Roel, Monique Ercken, Mireille Maenhoudt, et al.. (2005). Impact of water and top-coats on lithographic performance in 193-nm immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 20–20. 7 indexed citations
16.
Ercken, Monique, Leonardus H. A. Leunissen, Ivan Pollentier, et al.. (2004). Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5375. 266–266. 10 indexed citations
17.
Ercken, Monique, Christie Delvaux, Kris Baert, et al.. (2004). Challenges in patterning 45nm node multiple-gate devices and SRAM cells. 2 indexed citations
18.
Ercken, Monique, et al.. (2001). Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 1020–1020. 1 indexed citations
19.
Pollentier, Ivan, et al.. (2001). Front-end-of-line process development using 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4404. 56–56. 1 indexed citations
20.
Mack, Chris A., et al.. (1999). Matching simulation and experiment for chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 183–183. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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