Harold Dekkers

2.0k total citations
55 papers, 963 citations indexed

About

Harold Dekkers is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering. According to data from OpenAlex, Harold Dekkers has authored 55 papers receiving a total of 963 indexed citations (citations by other indexed papers that have themselves been cited), including 53 papers in Electrical and Electronic Engineering, 12 papers in Materials Chemistry and 10 papers in Biomedical Engineering. Recurrent topics in Harold Dekkers's work include Semiconductor materials and devices (27 papers), Thin-Film Transistor Technologies (22 papers) and Silicon and Solar Cell Technologies (19 papers). Harold Dekkers is often cited by papers focused on Semiconductor materials and devices (27 papers), Thin-Film Transistor Technologies (22 papers) and Silicon and Solar Cell Technologies (19 papers). Harold Dekkers collaborates with scholars based in Belgium, United States and Netherlands. Harold Dekkers's co-authors include G. Beaucarne, Stefaan De Wolf, G. Agostinelli, A. Delabie, P. Vitanov, Z. Alexieva, Filip Duerinckx, Jozef Szlufcik, Naoto Horiguchi and Johan Nijs and has published in prestigious journals such as ACS Applied Materials & Interfaces, Applied Surface Science and IEEE Transactions on Electron Devices.

In The Last Decade

Harold Dekkers

46 papers receiving 921 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Harold Dekkers Belgium 15 917 283 206 163 38 55 963
Eric Johlin United States 13 744 0.8× 348 1.2× 122 0.6× 121 0.7× 42 1.1× 27 871
Per I. Widenborg Australia 14 689 0.8× 540 1.9× 90 0.4× 112 0.7× 45 1.2× 54 761
Minkyu Ju South Korea 15 607 0.7× 312 1.1× 112 0.5× 192 1.2× 41 1.1× 71 704
S. Janz Germany 21 1.2k 1.3× 753 2.7× 297 1.4× 304 1.9× 28 0.7× 130 1.3k
Lubomyr T. Romankiw United States 12 1.0k 1.1× 696 2.5× 114 0.6× 111 0.7× 66 1.7× 31 1.1k
Matthew Page United States 18 1.3k 1.4× 617 2.2× 398 1.9× 390 2.4× 16 0.4× 84 1.4k
Twan Bearda Belgium 15 699 0.8× 294 1.0× 228 1.1× 231 1.4× 73 1.9× 94 848
A. Kaminski France 16 825 0.9× 335 1.2× 250 1.2× 234 1.4× 23 0.6× 44 963
A. Tauzin France 13 586 0.6× 143 0.5× 183 0.9× 124 0.8× 13 0.3× 31 633
X. Niquille Switzerland 16 971 1.1× 517 1.8× 144 0.7× 168 1.0× 27 0.7× 39 1.0k

Countries citing papers authored by Harold Dekkers

Since Specialization
Citations

This map shows the geographic impact of Harold Dekkers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Harold Dekkers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Harold Dekkers more than expected).

Fields of papers citing papers by Harold Dekkers

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Harold Dekkers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Harold Dekkers. The network helps show where Harold Dekkers may publish in the future.

Co-authorship network of co-authors of Harold Dekkers

This figure shows the co-authorship network connecting the top 25 collaborators of Harold Dekkers. A scholar is included among the top collaborators of Harold Dekkers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Harold Dekkers. Harold Dekkers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ronchi, N., M. Popovici, Harold Dekkers, et al.. (2025). Understanding the Slow Erase Operation in IGZO-Channel FeFETs: The Role of Positive Charge Generation Kinetics. IEEE Journal of the Electron Devices Society. 13. 245–251.
2.
Kim, Hyuncheol, M. Popovici, Javier Herrero‐Martín, et al.. (2025). Soft X‐Ray Absorption Spectroscopy Investigation of HfO 2 and ZrO 2 Thin Films with Modulated Crystalline Phase by Varying Dopants (Al, Si, Gd) for Ferroelectric and High‐ k Dielectric Applications. physica status solidi (RRL) - Rapid Research Letters. 19(9).
3.
Lin, Dennis, Subhali Subhechha, Adrian Chasin, et al.. (2025). The Impact of Process Steps on Nearly Ideal Subthreshold Slope in 300-mm Compatible InGaZnO TFTs. IEEE Electron Device Letters. 46(5). 761–764.
4.
Matsubayashi, Daisuke, Subhali Subhechha, Nouredine Rassoul, et al.. (2025). Accurate off-current evaluation by parasitic capacitance extraction in capacitor-less DRAM cells. 1–4.
5.
Matsubayashi, Daisuke, Attilio Belmonte, Shreya Kundu, et al.. (2025). Pathways for Retention Boost in Atomic Layer Etched IGZO-Based Capacitorless DRAM. IEEE Electron Device Letters. 46(7). 1111–1114.
6.
Zhao, Ying, Ben Kaczer, Nouredine Rassoul, et al.. (2024). Light-Assisted Investigation of the Role of Oxygen Flow during IGZO Deposition on Deep Subgap States and their Evolution Under PBTI. 1–6. 3 indexed citations
7.
Ronchi, N., Kaustuv Banerjee, A. Walke, et al.. (2024). Understanding the Time Dependent Write and Read Performance of IGZO-channel FeFETs. Lirias (KU Leuven). 661–664.
8.
Dekkers, Harold, Nouredine Rassoul, Surajit Sutar, et al.. (2023). Study of Contact Resistance Components in Short-Channel Indium-Gallium-Zinc-Oxide Transistor. IEEE Transactions on Electron Devices. 71(1). 567–573. 21 indexed citations
9.
Kundu, Shreya, et al.. (2022). High-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE. ACS Applied Materials & Interfaces. 14(29). 34029–34039. 12 indexed citations
10.
Smets, Quentin, Michiel J. van Setten, Jérôme Mitard, et al.. (2020). 300mm IGZO nFETs with low-T Ru contacts for localized doping and increased BEOL compatibility. 3 indexed citations
11.
Arimura, Hiroaki, Harold Dekkers, Lars‐Åke Ragnarsson, et al.. (2019). Record GmSAT/SSSAT and PBTI Reliability in Si-Passivated Ge nFinFETs by Improved Gate-Stack Surface Preparation. IEEE Transactions on Electron Devices. 66(12). 5387–5392. 4 indexed citations
13.
Oniki, Yusuke, Guy Vereecke, E. Dentoni Litta, et al.. (2018). RMG Patterning by Digital Wet Etching of Polycrystalline Metal Films. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 282. 132–138.
14.
Togo, M., G. Boccardi, R. Ritzenthaler, et al.. (2013). Heated implantation with amorphous Carbon CMOS mask for scaled FinFETs. Symposium on VLSI Technology. 6 indexed citations
15.
Xu, Kai, Laurent Souriau, David Hellin, et al.. (2013). 15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8685. 86850C–86850C. 8 indexed citations
16.
Bertoni, Mariana I., Bonna Newman, Sarah Bernardis, et al.. (2010). Impact of defect type on hydrogen passivation effectiveness in multicrystalline silicon solar cells. KOPS (University of Konstanz). 345–346. 2 indexed citations
17.
Agostinelli, G., A. Delabie, P. Vitanov, et al.. (2006). Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge. Solar Energy Materials and Solar Cells. 90(18-19). 3438–3443. 372 indexed citations
18.
Dekkers, Harold, Stefaan De Wolf, G. Agostinelli, et al.. (2003). Investigation on mc-Si bulk passivation using deuterated silicon-nitride. 3rd World Conference onPhotovoltaic Energy Conversion, 2003. Proceedings of. 1. 983–986. 4 indexed citations
19.
Szlufcik, Jozef, Filip Duerinckx, Jörg Horzel, et al.. (2000). Advanced concepts of industrial technologies of crystalline silicon solar cells. Opto-Electronics Review. 8(4). 299–306. 7 indexed citations
20.
Dekkers, Harold, Filip Duerinckx, Jozef Szlufcik, & Johan Nijs. (2000). Silicon surface texturing by reactive ion etching. Opto-Electronics Review. 8(4). 311–316. 31 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026