G. Mannaert

1.7k total citations
51 papers, 662 citations indexed

About

G. Mannaert is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, G. Mannaert has authored 51 papers receiving a total of 662 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 9 papers in Electronic, Optical and Magnetic Materials and 9 papers in Materials Chemistry. Recurrent topics in G. Mannaert's work include Semiconductor materials and devices (37 papers), Advancements in Semiconductor Devices and Circuit Design (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). G. Mannaert is often cited by papers focused on Semiconductor materials and devices (37 papers), Advancements in Semiconductor Devices and Circuit Design (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). G. Mannaert collaborates with scholars based in Belgium, United States and South Korea. G. Mannaert's co-authors include Stefaan Decoutere, Brice De Jaeger, D. Wellekens, M. Van Hove, L. Carbonell, Shuzhen You, Jie Hu, Benoit Bakeroot, Silvia Lenci and Mikhaı̈l R. Baklanov and has published in prestigious journals such as Journal of The Electrochemical Society, ACS Applied Materials & Interfaces and Thin Solid Films.

In The Last Decade

G. Mannaert

48 papers receiving 635 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
G. Mannaert Belgium	12	581	245	190	125	98	51	662
N. Dharmarasu Singapore	14	451 0.8×	263 1.1×	174 0.9×	217 1.7×	177 1.8×	67	628
D. S. Rawal India	15	474 0.8×	424 1.7×	164 0.9×	169 1.4×	153 1.6×	83	619
A. K. Stamper United States	13	457 0.8×	71 0.3×	279 1.5×	69 0.6×	123 1.3×	30	590
Toshiya Tabuchi Japan	13	335 0.6×	401 1.6×	245 1.3×	85 0.7×	164 1.7×	35	498
Gatien Cosendey Switzerland	13	289 0.5×	359 1.5×	91 0.5×	336 2.7×	87 0.9×	22	567
K. B. Jung United States	15	532 0.9×	214 0.9×	199 1.0×	182 1.5×	207 2.1×	48	666
M. W. Leksono United States	9	265 0.5×	407 1.7×	186 1.0×	121 1.0×	200 2.0×	16	492
Veit Hoffmann Germany	14	273 0.5×	441 1.8×	197 1.0×	235 1.9×	222 2.3×	44	585
A. Fontserè Spain	13	305 0.5×	289 1.2×	143 0.8×	92 0.7×	86 0.9×	25	415
M. Tordjman France	14	362 0.6×	502 2.0×	223 1.2×	141 1.1×	105 1.1×	29	545

Countries citing papers authored by G. Mannaert

Since Specialization

Citations

This map shows the geographic impact of G. Mannaert's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Mannaert with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Mannaert more than expected).

Fields of papers citing papers by G. Mannaert

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Mannaert. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Mannaert. The network helps show where G. Mannaert may publish in the future.

Co-authorship network of co-authors of G. Mannaert

This figure shows the co-authorship network connecting the top 25 collaborators of G. Mannaert. A scholar is included among the top collaborators of G. Mannaert based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with G. Mannaert. G. Mannaert is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Hosseini, Maryam, et al.. (2024). Active area patterning for CFET: nanosheet etch. 3–3. 1 indexed citations

Mannaert, G., et al.. (2024). Patterning spacer source drain cavities in CFET devices. 4–4. 1 indexed citations

Mannaert, G., et al.. (2023). Challenges for spacer and source/drain cavity patterning in CFET devices. 13–13. 3 indexed citations

Li, Jiajing, et al.. (2021). Understanding Kinetics of Defect Annihilation in Chemoepitaxy-Directed Self-Assembly. ACS Applied Materials & Interfaces. 13(21). 25357–25364. 6 indexed citations

Wu, Zhicheng, J. Franco, Hiroaki Arimura, et al.. (2021). 3D sequential CMOS top tier devices demonstration using a low temperature Smart Cut™ Si layer transfer. 1 indexed citations

Hiblot, Gaspard, Narendra Parihar, Emmanuel Dupuy, et al.. (2021). Plasma Charging Damage in HK-First and HK-Last RMG NMOS Devices. IEEE Transactions on Device and Materials Reliability. 21(2). 192–198. 1 indexed citations

Vais, Abhitosh, Liesbeth Witters, Y. Mols, et al.. (2019). First demonstration of III-V HBTs on 300 mm Si substrates using nano-ridge engineering. VUBIR (Vrije Universiteit Brussel). 9.1.1–9.1.4. 18 indexed citations

Litta, E. Dentoni, R. Ritzenthaler, T. Schram, et al.. (2018). CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits. Japanese Journal of Applied Physics. 57(4S). 04FB08–04FB08. 4 indexed citations

Ritzenthaler, R., Hans Mertens, V. Peña, et al.. (2018). Vertically Stacked Gate-All-Around Si Nanowire CMOS Transistors with Reduced Vertical Nanowires Separation, New Work Function Metal Gate Solutions, and DC/AC Performance Optimization. 21.5.1–21.5.4. 79 indexed citations

10.

McKenzie, Douglas S., Munirathna Padmanaban, G. Mannaert, et al.. (2016). Spin-on Metal Oxides and Their Applications for Next Generation Lithography. Journal of Photopolymer Science and Technology. 29(1). 59–67. 6 indexed citations

11.

Togo, M., G. Boccardi, R. Ritzenthaler, et al.. (2013). Heated implantation with amorphous Carbon CMOS mask for scaled FinFETs. Symposium on VLSI Technology. 6 indexed citations

12.

Jaeger, Brice De, M. Van Hove, D. Wellekens, et al.. (2012). Au-free CMOS-compatible AlGaN/GaN HEMT processing on 200 mm Si substrates. 49–52. 80 indexed citations

13.

Mannaert, G., Rita Vos, D. Tsvetanova, et al.. (2011). Optimization of Resist Ash Processes on Si_0.45Ge_0.55 Substrates for Post Extension-Halo Ion Implantation. ECS Transactions. 41(7). 283–291. 2 indexed citations

14.

Radisic, D., Denis Shamiryan, G. Mannaert, et al.. (2010). Metrology for Implanted Si Substrate Loss Studies. Journal of The Electrochemical Society. 157(5). H580–H580. 3 indexed citations

15.

Mannaert, G., Liesbeth Witters, Denis Shamiryan, et al.. (2009). Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 253–256. 3 indexed citations

16.

Mannaert, G., et al.. (2007). Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 134. 113–116. 4 indexed citations

17.

Frank, Martin M., Rita Vos, Sophia Arnauts, et al.. (2007). Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments. ECS Transactions. 11(2). 219–226. 10 indexed citations

18.

Collaert, Nadine, M. Demand, Isabelle Ferain, et al.. (2005). Tall triple-gate devices with TiN/HfO/sub 2/ gate stack. 108–109. 38 indexed citations

19.

Mannaert, G., M. Schmidt, Michele Stucchi, et al.. (2003). Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands<sup>TM</sup> Chamber. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 92. 267–270. 1 indexed citations

20.

Lepage, Muriel, Denis Shamiryan, Mikhaı̈l R. Baklanov, et al.. (2001). Optimization of etching and stripping chemistries for Z3MS/sup TM/ Low-k. 174–176. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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