C. D’Emic

1.1k total citations
15 papers, 630 citations indexed

About

C. D’Emic is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, C. D’Emic has authored 15 papers receiving a total of 630 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 6 papers in Atomic and Molecular Physics, and Optics and 2 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in C. D’Emic's work include Semiconductor materials and devices (12 papers), Advancements in Semiconductor Devices and Circuit Design (10 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). C. D’Emic is often cited by papers focused on Semiconductor materials and devices (12 papers), Advancements in Semiconductor Devices and Circuit Design (10 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). C. D’Emic collaborates with scholars based in United States, Japan and Switzerland. C. D’Emic's co-authors include E. P. Gusev, M. Gribelyuk, M. Copel, C. Cabral, Wilfried Haensch, H.‐S. Philip Wong, Huiling Shang, E. Sikorski, P. Kozlowski and K.W. Guarini and has published in prestigious journals such as IEEE Electron Device Letters, IEEE Transactions on Nuclear Science and Microelectronic Engineering.

In The Last Decade

C. D’Emic

14 papers receiving 607 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C. D’Emic United States 11 605 197 115 49 39 15 630
S.-H. Lo United States 7 909 1.5× 234 1.2× 111 1.0× 44 0.9× 52 1.3× 16 933
A. Chou United States 11 657 1.1× 114 0.6× 80 0.7× 71 1.4× 24 0.6× 24 684
Hiroaki Arimura Belgium 15 620 1.0× 95 0.5× 82 0.7× 95 1.9× 20 0.5× 96 651
Stanislav Tyaginov Austria 22 1.2k 2.0× 143 0.7× 123 1.1× 41 0.8× 44 1.1× 125 1.3k
Slimane Oussalah Algeria 11 264 0.4× 124 0.6× 53 0.5× 46 0.9× 27 0.7× 57 327
J. Siegert Austria 10 271 0.4× 114 0.6× 189 1.6× 68 1.4× 21 0.5× 33 328
E. Dentoni Litta Belgium 12 414 0.7× 106 0.5× 53 0.5× 50 1.0× 30 0.8× 69 469
C.H. Ling Singapore 14 585 1.0× 124 0.6× 95 0.8× 27 0.6× 32 0.8× 77 614
Kathy Barla Belgium 13 485 0.8× 128 0.6× 279 2.4× 107 2.2× 23 0.6× 26 551
Paul M. Jordan Germany 10 397 0.7× 115 0.6× 93 0.8× 82 1.7× 33 0.8× 21 421

Countries citing papers authored by C. D’Emic

Since Specialization
Citations

This map shows the geographic impact of C. D’Emic's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. D’Emic with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. D’Emic more than expected).

Fields of papers citing papers by C. D’Emic

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. D’Emic. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. D’Emic. The network helps show where C. D’Emic may publish in the future.

Co-authorship network of co-authors of C. D’Emic

This figure shows the co-authorship network connecting the top 25 collaborators of C. D’Emic. A scholar is included among the top collaborators of C. D’Emic based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. D’Emic. C. D’Emic is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

15 of 15 papers shown
1.
Worledge, D. C., Christopher Safranski, G. Hu, et al.. (2022). STT-MRAM - Status and Outlook. 1–2. 5 indexed citations
2.
Hu, G., Christopher Safranski, J. Z. Sun, et al.. (2022). Double spin-torque magnetic tunnel junction devices for last-level cache applications. 2022 International Electron Devices Meeting (IEDM). 10.2.1–10.2.4. 20 indexed citations
3.
Hu, G., G. Lauer, J. Z. Sun, et al.. (2021). 2X reduction of STT-MRAM switching current using double spin-torque magnetic tunnel junction. 2021 IEEE International Electron Devices Meeting (IEDM). 2.5.1–2.5.4. 21 indexed citations
4.
Tega, Naoki, Hiroshi Miki, Zhibin Ren, et al.. (2011). Impact of HK / MG stacks and future device scaling on RTN. 6A.5.1–6A.5.6. 14 indexed citations
5.
Tega, Naoki, Hiroshi Miki, Zhibin Ren, et al.. (2009). Reduction of random telegraph noise in High-к / metal-gate stacks for 22 nm generation FETs. 1–4. 20 indexed citations
6.
Callegari, Agnese, P. Jamison, E. Cartier, et al.. (2005). Interface engineering for enhanced electron mobilities in W/HfO/sub 2/ gate stacks. 825–828. 19 indexed citations
7.
Shang, Huiling, P. Kozlowski, C. D’Emic, et al.. (2004). Self-Aligned n-Channel Germanium MOSFETs With a Thin Ge Oxynitride Gate Dielectric and Tungsten Gate. IEEE Electron Device Letters. 25(3). 135–137. 136 indexed citations
8.
Félix, J., M.R. Shaneyfelt, Daniel M. Fleetwood, et al.. (2004). Charge trapping and annealing in high-/spl kappa/ gate dielectrics. IEEE Transactions on Nuclear Science. 51(6). 3143–3149. 21 indexed citations
9.
Han, Jin‐Ping, Eric M. Vogel, E. P. Gusev, et al.. (2004). Energy distribution of interface traps in high-k gated MOSFETs. 451. 161–162. 15 indexed citations
10.
Kirsch, P. D., et al.. (2004). Nitrogen interface engineering in Al2O3 capacitors for improved thermal stability. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(5). 2462–2466. 1 indexed citations
11.
Han, Jin‐Ping, Eric M. Vogel, E. P. Gusev, et al.. (2004). Asymmetric Energy Distribution of Interface Traps in n- and p-MOSFETs With<tex>$hbox HfO _2$</tex>Gate Dielectric on Ultrathin SiON Buffer Layer. IEEE Electron Device Letters. 25(3). 126–128. 32 indexed citations
12.
Gusev, E. P., C. Cabral, M. Copel, C. D’Emic, & M. Gribelyuk. (2003). Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications. Microelectronic Engineering. 69(2-4). 145–151. 270 indexed citations
13.
Félix, J., M.R. Shaneyfelt, Daniel M. Fleetwood, et al.. (2003). Radiation-induced charge trapping in thin Al/sub 2/O/sub 3//SiO/sub x/N/sub y//Si(100) gate dielectric stacks. IEEE Transactions on Nuclear Science. 50(6). 1910–1918. 46 indexed citations
14.
Han, Jin‐Ping, Eric M. Vogel, Evgeni Gusev, et al.. (2003). Energy Distribution of Interface Traps in High-K Gated MOSFETs. 10 indexed citations
15.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026