Frank Holsteyns

1.6k total citations
112 papers, 993 citations indexed

About

Frank Holsteyns is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Frank Holsteyns has authored 112 papers receiving a total of 993 indexed citations (citations by other indexed papers that have themselves been cited), including 78 papers in Electrical and Electronic Engineering, 42 papers in Biomedical Engineering and 32 papers in Materials Chemistry. Recurrent topics in Frank Holsteyns's work include Semiconductor materials and devices (49 papers), Advancements in Semiconductor Devices and Circuit Design (19 papers) and Nanowire Synthesis and Applications (18 papers). Frank Holsteyns is often cited by papers focused on Semiconductor materials and devices (49 papers), Advancements in Semiconductor Devices and Circuit Design (19 papers) and Nanowire Synthesis and Applications (18 papers). Frank Holsteyns collaborates with scholars based in Belgium, United States and Germany. Frank Holsteyns's co-authors include Robert Mettin, Alexander R. Lippert, Stefan De Gendt, Guy Vereecke, XiuMei Xu, Utkur Mirsaidov, Sophia Arnauts, Carlos Cairós, Dennis H. van Dorp and Paul Mertens and has published in prestigious journals such as Proceedings of the National Academy of Sciences, Nano Letters and ACS Nano.

In The Last Decade

Frank Holsteyns

101 papers receiving 947 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Frank Holsteyns Belgium 18 497 442 387 148 142 112 993
Shayandev Sinha United States 13 310 0.6× 404 0.9× 245 0.6× 137 0.9× 238 1.7× 35 956
Ofer Manor Israel 19 480 1.0× 738 1.7× 228 0.6× 277 1.9× 129 0.9× 62 1.2k
Gary Tepper United States 21 529 1.1× 650 1.5× 175 0.5× 161 1.1× 401 2.8× 85 1.4k
Dajun Lin China 11 392 0.8× 223 0.5× 365 0.9× 64 0.4× 53 0.4× 19 833
Ruoping Li China 15 243 0.5× 289 0.7× 337 0.9× 155 1.0× 333 2.3× 48 958
Flávio Horowitz Brazil 18 211 0.4× 185 0.4× 313 0.8× 165 1.1× 296 2.1× 70 828
Oleg Baranov Ukraine 18 420 0.8× 191 0.4× 448 1.2× 34 0.2× 74 0.5× 49 938
A. Purkayastha United States 13 278 0.6× 220 0.5× 447 1.2× 94 0.6× 36 0.3× 17 844
Vipin N. Tondare United States 12 209 0.4× 175 0.4× 359 0.9× 77 0.5× 46 0.3× 21 660
Jin-You Lu United Arab Emirates 19 345 0.7× 310 0.7× 365 0.9× 34 0.2× 215 1.5× 54 1.6k

Countries citing papers authored by Frank Holsteyns

Since Specialization
Citations

This map shows the geographic impact of Frank Holsteyns's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Frank Holsteyns with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Frank Holsteyns more than expected).

Fields of papers citing papers by Frank Holsteyns

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Frank Holsteyns. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Frank Holsteyns. The network helps show where Frank Holsteyns may publish in the future.

Co-authorship network of co-authors of Frank Holsteyns

This figure shows the co-authorship network connecting the top 25 collaborators of Frank Holsteyns. A scholar is included among the top collaborators of Frank Holsteyns based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Frank Holsteyns. Frank Holsteyns is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Deng, Kerong, Ivan Erofeev, Angshuman Ray Chowdhuri, et al.. (2024). Nanoscale Wet Etching of Molybdenum Interconnects with Organic Solutions. Small. 20(51). e2406713–e2406713. 2 indexed citations
2.
Erofeev, Ivan, Zainul Aabdin, Antoine Pacco, et al.. (2024). Solving the Annealing of Mo Interconnects for Next‐Gen Integrated Circuits. Advanced Electronic Materials. 10(9). 5 indexed citations
3.
Erofeev, Ivan, Kerong Deng, Zainul Aabdin, et al.. (2024). Digital Etching of Molybdenum Interconnects Using Plasma Oxidation. Advanced Materials Interfaces. 12(1). 1 indexed citations
4.
Erofeev, Ivan, Zainul Aabdin, Antoine Pacco, et al.. (2023). Controlled Stepwise Wet Etching of Polycrystalline Mo Nanowires. Advanced Functional Materials. 34(12). 10 indexed citations
5.
Ghosh, Tanmay, Eva‐Corinna Fritz, Ziyu Zhang, et al.. (2022). Preventing the Capillary-Induced Collapse of Vertical Nanostructures. ACS Applied Materials & Interfaces. 14(4). 5537–5544. 16 indexed citations
6.
Aabdin, Zainul, Tanmay Ghosh, Antoine Pacco, et al.. (2022). Controlling the Wet-Etch Directionality in Nanostructured Silicon. ACS Applied Electronic Materials. 4(11). 5191–5198. 9 indexed citations
7.
Anand, Utkarsh, Tanmay Ghosh, Zainul Aabdin, et al.. (2021). Deep Learning-Based High Throughput Inspection in 3D Nanofabrication and Defect Reversal in Nanopillar Arrays: Implications for Next Generation Transistors. ACS Applied Nano Materials. 4(3). 2664–2672. 8 indexed citations
8.
Anand, Utkarsh, Tanmay Ghosh, Zainul Aabdin, et al.. (2021). Dynamics of thin precursor film in wetting of nanopatterned surfaces. Proceedings of the National Academy of Sciences. 118(38). 15 indexed citations
9.
Vrancken, Nandi, Tanmay Ghosh, Utkarsh Anand, et al.. (2020). Nanoscale Elastocapillary Effect Induced by Thin-Liquid-Film Instability. The Journal of Physical Chemistry Letters. 11(7). 2751–2758. 14 indexed citations
10.
Fingerle, Mathias, М. В. Лебедев, Sophia Arnauts, et al.. (2020). Wet Chemical Processing of Ge in Acidic H 2 O 2 Solution: Nanoscale Etching and Surface Chemistry. ECS Journal of Solid State Science and Technology. 9(8). 84002–84002. 8 indexed citations
11.
Baraissov, Zhaslan, Antoine Pacco, Siddardha Koneti, et al.. (2019). Selective Wet Etching of Silicon Germanium in Composite Vertical Nanowires. ACS Applied Materials & Interfaces. 11(40). 36839–36846. 28 indexed citations
12.
Pacco, Antoine, Zheng Tao, Jens Rip, et al.. (2019). Scaled-Down c-Si and c-SiGe Wagon-Wheels for the Visualization of the Anisotropy and Selectivity of Wet-Chemical Etchants. Nanoscale Research Letters. 14(1). 285–285. 3 indexed citations
13.
Vrancken, Nandi, Jiaqi Li, Stefanie Sergeant, et al.. (2018). In-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces. Scientific Reports. 8(1). 11637–11637. 24 indexed citations
14.
Aabdin, Zainul, XiuMei Xu, Soumyo Sen, et al.. (2017). Transient Clustering of Reaction Intermediates during Wet Etching of Silicon Nanostructures. Nano Letters. 17(5). 2953–2958. 34 indexed citations
15.
Holsteyns, Frank, et al.. (2016). Sonoluminescence and dynamics of cavitation bubble populations in sulfuric acid. Ultrasonics Sonochemistry. 34. 663–676. 50 indexed citations
16.
Dorp, Dennis H. van, et al.. (2014). Nanoscale Etching and Reoxidation of InAs. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 219. 56–58. 3 indexed citations
17.
Cegla, Frederic, et al.. (2011). Study on the bubble transport mechanism in an acoustic standing wave field. Ultrasonics. 51(8). 1014–1025. 30 indexed citations
18.
Mettin, Robert, et al.. (2010). Characterization of an acoustic cavitation bubble structure at 230 kHz. Ultrasonics Sonochemistry. 18(2). 595–600. 55 indexed citations
19.
Vereecke, Guy, et al.. (2004). Investigating the role of gas cavitation in megasonic nanoparticle removal. International Symposium on Microarchitecture. 22(1). 57–63. 3 indexed citations
20.
Loo, Roger, Matty Caymax, Frank Holsteyns, et al.. (2003). A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth. Applied Surface Science. 224(1-4). 63–67. 27 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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