J. Kluth

425 citations
12 papers · 58 indexed · h-index 5

J. Kluth

12 papers receiving 54 citations

Peers

J. Kluth
Comparison fields: 5 of 11
  • Electrical and Electronic Engineering 55
  • Metals and Alloys 1
  • Electronic, Optical and Magnetic Materials 6
  • Materials Chemistry 14
  • Biomedical Engineering 8
Replace M. Inoue with:
M. Inoue Japan
Wenju Zhou China
Irina G. Galben-Sandulache France
Yugang Yu United States
P. Moll Germany
S. M. Jang Taiwan
E. del Pino Rosendo Germany
L. Pasini France
M. Hierholzer Germany
F. Wacquant France
J. Kluth relative to M. Inoue Japan M. Inoue's profile →
Citations per field
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Citations per year

Countries citing papers authored by J. Kluth

Since Specialization
Citations

This map shows the geographic impact of J. Kluth's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Kluth with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Kluth more than expected).

Fields of papers citing papers by J. Kluth

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Kluth. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Kluth. The network helps show where J. Kluth may publish in the future.

Co-authorship network

The 25 scholars most cited alongside J. Kluth, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. Kluth Line = papers co-authored together J. Kluth links everyone, so they are left out of the graph.

All Works

12 of 12 papers shown
#Work
1 20191
2 20173
3 20169
4 20162
5 20152
6 20064
7 20067
8 200416
9 20032
10
Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
20023
11 20023
12 20026

About J. Kluth

J. Kluth is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Atomic and Molecular Physics, and Optics and Infectious Diseases, having authored 12 papers that have together received 58 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Copper Interconnects and Reliability (3 papers), Metal and Thin Film Mechanics (2 papers), Silicon and Solar Cell Technologies (1 paper), Semiconductor materials and interfaces (1 paper) and Ferroelectric and Negative Capacitance Devices (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (55 citations), Metals and Alloys (1 citation), Electronic, Optical and Magnetic Materials (6 citations), Materials Chemistry (14 citations) and Biomedical Engineering (8 citations). J. Kluth has collaborated with scholars based in United States, Germany and Belgium. Frequent co-authors include Olivier Richard, Stefan De Gendt, Thierry Conard, Matty Caymax, Bert Brijs, Danielle Vanhaeren, Guy Vereecke, Marc Heyns, Martine Claes and L. Daté. Their work appears in journals such as Journal of The Electrochemical Society, Solid-State Electronics, ECS Transactions and MRS Proceedings.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026