Werner Boullart

1.8k total citations
104 papers, 1.4k citations indexed

About

Werner Boullart is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Werner Boullart has authored 104 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 90 papers in Electrical and Electronic Engineering, 34 papers in Electronic, Optical and Magnetic Materials and 22 papers in Mechanics of Materials. Recurrent topics in Werner Boullart's work include Semiconductor materials and devices (60 papers), Copper Interconnects and Reliability (32 papers) and Metal and Thin Film Mechanics (22 papers). Werner Boullart is often cited by papers focused on Semiconductor materials and devices (60 papers), Copper Interconnects and Reliability (32 papers) and Metal and Thin Film Mechanics (22 papers). Werner Boullart collaborates with scholars based in Belgium, United States and Japan. Werner Boullart's co-authors include Jozef Peeters, K. Devriendt, Denis Shamiryan, Stefan Tinck, Annemie Bogaerts, Minh Tho Nguyen, Mikhaı̈l R. Baklanov, Vasile Paraschiv, Luc Vereecken and S. Vanhaelemeersch and has published in prestigious journals such as Journal of The Electrochemical Society, Langmuir and The Journal of Physical Chemistry.

In The Last Decade

Werner Boullart

96 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Werner Boullart Belgium 22 771 312 292 268 200 104 1.4k
Allen J. Twarowski United States 19 268 0.3× 74 0.2× 313 1.1× 243 0.9× 70 0.3× 28 1.0k
Brigitte Attal‐Trétout France 18 224 0.3× 64 0.2× 230 0.8× 672 2.5× 67 0.3× 52 1.3k
Casey Smith United States 18 813 1.1× 108 0.3× 204 0.7× 197 0.7× 55 0.3× 67 1.2k
D. Fuhrmann Germany 22 463 0.6× 65 0.2× 821 2.8× 616 2.3× 363 1.8× 80 1.6k
Bipin Bihari United States 16 545 0.7× 23 0.1× 187 0.6× 619 2.3× 132 0.7× 67 1.2k
J. Hader United States 27 1.7k 2.2× 40 0.1× 1.9k 6.4× 354 1.3× 153 0.8× 132 2.4k
Daniel Jakubczyk Poland 17 279 0.4× 167 0.5× 145 0.5× 298 1.1× 127 0.6× 48 878
G. Zalczer France 19 219 0.3× 34 0.1× 244 0.8× 301 1.1× 66 0.3× 50 940
Volker Beushausen Germany 17 117 0.2× 90 0.3× 123 0.4× 53 0.2× 59 0.3× 42 790
K. Kolwas Poland 17 324 0.4× 139 0.4× 260 0.9× 378 1.4× 498 2.5× 62 1.2k

Countries citing papers authored by Werner Boullart

Since Specialization
Citations

This map shows the geographic impact of Werner Boullart's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Werner Boullart with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Werner Boullart more than expected).

Fields of papers citing papers by Werner Boullart

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Werner Boullart. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Werner Boullart. The network helps show where Werner Boullart may publish in the future.

Co-authorship network of co-authors of Werner Boullart

This figure shows the co-authorship network connecting the top 25 collaborators of Werner Boullart. A scholar is included among the top collaborators of Werner Boullart based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Werner Boullart. Werner Boullart is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Milenin, Alexey, et al.. (2014). Study on processing step uniformity tuning during FET fabrication and sensor wafer response as a function of chuck temperature adjustment. Japanese Journal of Applied Physics. 53(3S2). 03DC02–03DC02. 9 indexed citations
2.
Hody, Hubert, Vasile Paraschiv, E. Vecchio, et al.. (2013). Double patterning with dual hard mask for 28nm node devices and below. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8685. 86850P–86850P. 2 indexed citations
3.
Hellin, David, et al.. (2010). Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-κ/metal gate stacks. Microelectronic Engineering. 88(1). 21–27. 2 indexed citations
4.
Radisic, D., Denis Shamiryan, G. Mannaert, et al.. (2010). Metrology for Implanted Si Substrate Loss Studies. Journal of The Electrochemical Society. 157(5). H580–H580. 3 indexed citations
5.
Shamiryan, Denis, D. Radisic, & Werner Boullart. (2009). In-line control of Si loss after post ion implantation strip. Microelectronic Engineering. 87(9). 1669–1673. 1 indexed citations
6.
Tinck, Stefan, Werner Boullart, & Annemie Bogaerts. (2009). Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments. Journal of Physics D Applied Physics. 42(9). 95204–95204. 44 indexed citations
7.
Mannaert, G., Liesbeth Witters, Denis Shamiryan, et al.. (2009). Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 253–256. 3 indexed citations
8.
Milenin, Alexey, Jean‐François de Marneffe, Herbert Struyf, & Werner Boullart. (2008). In-situ Spatial Analysis of RF Voltage during Plasma Etching. ECS Transactions. 13(8). 17–22. 2 indexed citations
9.
Shamiryan, Denis, A. Redolfi, & Werner Boullart. (2008). Dry etching process for bulk finFET manufacturing. Microelectronic Engineering. 86(1). 96–98. 16 indexed citations
10.
Peeters, Jozef, et al.. (2007). Structure−Activity Relationship for the Addition of OH to (Poly)alkenes:  Site-Specific and Total Rate Constants. The Journal of Physical Chemistry A. 111(9). 1618–1631. 102 indexed citations
11.
Mannaert, G., et al.. (2007). Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 134. 113–116. 4 indexed citations
12.
Shamiryan, Denis, et al.. (2006). Influence of crystallographic orientation on etch properties of TiN. Lirias (KU Leuven). 1 indexed citations
13.
Struyf, Herbert, J. Van Olmen, Francesca Iacopi, et al.. (2005). Low-damage damascene patterning of SiOC(H) low-k dielectrics. 30–32. 4 indexed citations
14.
Shamiryan, Denis, Mikhaı̈l R. Baklanov, & Werner Boullart. (2005). Highly Sensitive Monitoring of Ru Etching Using Optical Emission. Electrochemical and Solid-State Letters. 8(7). G176–G176. 3 indexed citations
15.
Collaert, Nadine, M. Demand, Isabelle Ferain, et al.. (2005). Tall triple-gate devices with TiN/HfO/sub 2/ gate stack. 108–109. 38 indexed citations
16.
Le, Quoc Toan, Caroline M. Whelan, Herbert Struyf, et al.. (2004). Plasma Modification of Porous Low-k Dielectrics. Electrochemical and Solid-State Letters. 7(9). F49–F49. 12 indexed citations
17.
Mannaert, G., M. Schmidt, Michele Stucchi, et al.. (2003). Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands<sup>TM</sup> Chamber. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 92. 267–270. 1 indexed citations
18.
Proost, Joris, et al.. (1999). Chemical and Electrical Characterization of the Interaction of BCl3 / Cl2 Etching and  CF 4 /  H 2 O  Stripping Plasmas with Aluminum Surfaces. Journal of The Electrochemical Society. 146(11). 4230–4235. 7 indexed citations
19.
Devriendt, K., et al.. (1995). Kinetic investigation of the ch2((x)over-tilde(3)b(1))+h-]ch(x(2)pi)+h-2 reaction in the temperature-range 400k-less-than-t-less-than-1000k. The Journal of Physical Chemistry. 99(46). 16953–16959. 10 indexed citations
20.
Nguyen, Minh Tho, Werner Boullart, & Jozef Peeters. (1994). Theoretical Characterization of the Reaction between Nitric Oxide and Ketenyl Radicals (HCCO + NO): CO versus CO2 Loss. The Journal of Physical Chemistry. 98(33). 8030–8035. 55 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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