Frédéric Lazzarino

536 total citations
51 papers, 273 citations indexed

About

Frédéric Lazzarino is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Surfaces, Coatings and Films. According to data from OpenAlex, Frédéric Lazzarino has authored 51 papers receiving a total of 273 indexed citations (citations by other indexed papers that have themselves been cited), including 48 papers in Electrical and Electronic Engineering, 17 papers in Electronic, Optical and Magnetic Materials and 12 papers in Surfaces, Coatings and Films. Recurrent topics in Frédéric Lazzarino's work include Advancements in Photolithography Techniques (25 papers), Semiconductor materials and devices (20 papers) and Copper Interconnects and Reliability (17 papers). Frédéric Lazzarino is often cited by papers focused on Advancements in Photolithography Techniques (25 papers), Semiconductor materials and devices (20 papers) and Copper Interconnects and Reliability (17 papers). Frédéric Lazzarino collaborates with scholars based in Belgium, Japan and Netherlands. Frédéric Lazzarino's co-authors include Zsolt Tökei, Sara Paolillo, Nouredine Rassoul, Danny Wan, Stefan Decoster, Gayle Murdoch, Geert Vandenberghe, Danilo De Simone, Ming Mao and Joost Bekaert and has published in prestigious journals such as ACS Applied Materials & Interfaces, Japanese Journal of Applied Physics and IEEE Electron Device Letters.

In The Last Decade

Frédéric Lazzarino

42 papers receiving 258 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Frédéric Lazzarino Belgium 10 251 78 58 46 43 51 273
Tomoyuki Suwa Japan 12 434 1.7× 44 0.6× 56 1.0× 97 2.1× 26 0.6× 86 488
Inoh Hwang South Korea 9 127 0.5× 70 0.9× 129 2.2× 156 3.4× 30 0.7× 29 272
Slimane Oussalah Algeria 11 264 1.1× 27 0.3× 46 0.8× 124 2.7× 5 0.1× 57 327
E. Dentoni Litta Belgium 12 414 1.6× 30 0.4× 50 0.9× 106 2.3× 12 0.3× 69 469
Vadim Sidorkin Netherlands 9 225 0.9× 27 0.3× 99 1.7× 78 1.7× 73 1.7× 22 314
Claus Villringer Germany 11 232 0.9× 18 0.2× 86 1.5× 43 0.9× 13 0.3× 35 308
Satyavolu S. Papa Rao United States 9 213 0.8× 37 0.5× 122 2.1× 58 1.3× 10 0.2× 30 301
Shoko Manako Japan 11 303 1.2× 18 0.2× 131 2.3× 63 1.4× 60 1.4× 27 350
Mitsuhiro Omura Japan 8 169 0.7× 20 0.3× 51 0.9× 90 2.0× 10 0.2× 17 198
D. Manger Germany 11 366 1.5× 67 0.9× 36 0.6× 52 1.1× 5 0.1× 21 401

Countries citing papers authored by Frédéric Lazzarino

Since Specialization
Citations

This map shows the geographic impact of Frédéric Lazzarino's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Frédéric Lazzarino with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Frédéric Lazzarino more than expected).

Fields of papers citing papers by Frédéric Lazzarino

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Frédéric Lazzarino. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Frédéric Lazzarino. The network helps show where Frédéric Lazzarino may publish in the future.

Co-authorship network of co-authors of Frédéric Lazzarino

This figure shows the co-authorship network connecting the top 25 collaborators of Frédéric Lazzarino. A scholar is included among the top collaborators of Frédéric Lazzarino based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Frédéric Lazzarino. Frédéric Lazzarino is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kundu, Shreya, et al.. (2024). Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas. Plasma Processes and Polymers. 22(2). 2 indexed citations
2.
Kundu, Souvik, Jean-Philippe Soulié, Laurent Souriau, et al.. (2024). Directional Etching of Barrierless NiAl Lines on 300mm Wafers for Interconnects Applications. IEEE Electron Device Letters. 1–1. 1 indexed citations
3.
Darnon, Maxime, et al.. (2024). Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(3). 1 indexed citations
4.
Hosseini, Maryam, et al.. (2024). Active area patterning for CFET: nanosheet etch. 3–3. 1 indexed citations
5.
Mannaert, G., et al.. (2024). Patterning spacer source drain cavities in CFET devices. 4–4. 1 indexed citations
6.
Kundu, Shreya, et al.. (2024). (Invited) Investigating ALE Approaches for Novel Metal Oxide Patterning at Sub-100 Nm Pitch for High-Density Memory & Compute Applications. ECS Meeting Abstracts. MA2024-02(30). 2233–2233. 1 indexed citations
7.
Kundu, Shreya, Daniele Garbin, Wouter Devulder, Gabriele Luca Donadio, & Frédéric Lazzarino. (2023). High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory Applications. ACS Applied Nano Materials. 6(12). 10668–10679. 1 indexed citations
8.
9.
Mannaert, G., et al.. (2023). Challenges for spacer and source/drain cavity patterning in CFET devices. 13–13. 3 indexed citations
10.
Hermans, Yannick, Chen Wu, Gerardo Martínez, et al.. (2023). Improving uniformity of 3-level High Aspect Ratio Supervias. 1–3.
11.
Kundu, Shreya, et al.. (2022). High-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE. ACS Applied Materials & Interfaces. 14(29). 34029–34039. 12 indexed citations
12.
Agarwal, Ankur, Chad M. Huard, Alessandro Vaglio Pret, et al.. (2022). Evolution of lithography-to-etch bias in multi-patterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(6). 2 indexed citations
13.
Wan, Danny, Sébastien Couet, Laurent Souriau, et al.. (2021). Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers. Japanese Journal of Applied Physics. 60(SB). SBBI04–SBBI04. 10 indexed citations
14.
Leray, Philippe, et al.. (2020). Influence and control of CD on defectivity for EUV Pitch 32 Line-Space. 20–20. 1 indexed citations
15.
Paolillo, Sara, et al.. (2018). Direct metal etch of ruthenium for advanced interconnect. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(3). 41 indexed citations
16.
Yamaguchi, Tatsuya, et al.. (2018). Gas Phase Pore Stuffing (GPPS). 4. 129–131. 1 indexed citations
17.
Lorusso, Gian F., Danilo De Simone, Frédéric Lazzarino, et al.. (2018). Setting up a proper power spectral density and autocorrelation analysis for material and process characterization. Journal of Micro/Nanolithography MEMS and MOEMS. 17(4). 1–1. 2 indexed citations
18.
Mao, Ming, et al.. (2017). Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 101460I–101460I. 7 indexed citations
19.
Wen, Lianggong, Bao-Jun Tang, Kristof Croes, et al.. (2015). Direct etched Cu characterization for advanced interconnects. 173–176. 6 indexed citations
20.
Lazzarino, Frédéric, et al.. (2012). Etch challenges of a spin-on trilayer resist system for narrow pitch dual damascene patterning. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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