David Hellin

447 total citations
31 papers, 356 citations indexed

About

David Hellin is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, David Hellin has authored 31 papers receiving a total of 356 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 11 papers in Surfaces, Coatings and Films and 9 papers in Radiation. Recurrent topics in David Hellin's work include Semiconductor materials and devices (14 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers) and X-ray Spectroscopy and Fluorescence Analysis (9 papers). David Hellin is often cited by papers focused on Semiconductor materials and devices (14 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers) and X-ray Spectroscopy and Fluorescence Analysis (9 papers). David Hellin collaborates with scholars based in Belgium, United States and Netherlands. David Hellin's co-authors include Stefan De Gendt, Chris Vinckier, Jens Rip, Paul Mertens, Thierry Conard, Annelies Delabie, Werner Boullart, Matty Caymax, Marc Heyns and Wim Fyen and has published in prestigious journals such as Applied Physics Letters, Japanese Journal of Applied Physics and Spectrochimica Acta Part B Atomic Spectroscopy.

In The Last Decade

David Hellin

31 papers receiving 345 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
David Hellin Belgium	9	229	126	97	80	64	31	356
Masaru Takakura Japan	9	161 0.7×	25 0.2×	110 1.1×	61 0.8×	33 0.5×	29	266
И. А. Иванов Kazakhstan	9	49 0.2×	81 0.6×	100 1.0×	55 0.7×	26 0.4×	57	268
Y. Yatsurugi Japan	8	260 1.1×	47 0.4×	174 1.8×	34 0.4×	29 0.5×	13	378
M. L. Thomas United States	9	283 1.2×	15 0.1×	87 0.9×	55 0.7×	86 1.3×	16	370
I. Zamboni Croatia	8	28 0.1×	41 0.3×	68 0.7×	15 0.2×	32 0.5×	15	160
M.A. Nitti Italy	10	87 0.4×	43 0.3×	114 1.2×	24 0.3×	52 0.8×	17	187
S. Intarasiri Thailand	10	93 0.4×	17 0.1×	221 2.3×	12 0.1×	16 0.3×	49	376
Shaista Zeb Pakistan	8	206 0.9×	16 0.1×	146 1.5×	22 0.3×	14 0.2×	13	366
H. E. Beske Germany	8	43 0.2×	32 0.3×	195 2.0×	38 0.5×	32 0.5×	24	392
Bart Onsia Belgium	8	348 1.5×	12 0.1×	139 1.4×	15 0.2×	45 0.7×	22	375

Countries citing papers authored by David Hellin

Since Specialization

Citations

This map shows the geographic impact of David Hellin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David Hellin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David Hellin more than expected).

Fields of papers citing papers by David Hellin

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David Hellin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David Hellin. The network helps show where David Hellin may publish in the future.

Co-authorship network of co-authors of David Hellin

This figure shows the co-authorship network connecting the top 25 collaborators of David Hellin. A scholar is included among the top collaborators of David Hellin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with David Hellin. David Hellin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Wise, Rich, Liesbeth Reijnen, Patrick Jaenen, et al.. (2016). Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978007–978007. 3 indexed citations

Sánchez, Efrain Altamirano, Gian F. Lorusso, T. Hopf, et al.. (2016). Self-aligned quadruple patterning to meet requirements for fins with high density. SPIE Newsroom. 5 indexed citations

Xu, Kai, Laurent Souriau, David Hellin, et al.. (2013). 15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8685. 86850C–86850C. 8 indexed citations

Hellin, David, et al.. (2010). Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-κ/metal gate stacks. Microelectronic Engineering. 88(1). 21–27. 2 indexed citations

Houssa, Michel, Daniël Nelis, David Hellin, et al.. (2007). H 2 S exposure of a (100)Ge surface: Evidences for a (2×1) electrically passivated surface. Applied Physics Letters. 90(22). 29 indexed citations

Hellin, David, et al.. (2007). Investigation of Metallic Contamination Analysis Using Vapor Phase Decomposition – Droplet Collection – Total Reflection X-Ray Fluorescence (VPD-DC-TXRF) for Pt-Group Elements on Silicon Wafers. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 134. 273–276. 2 indexed citations

Hellin, David, et al.. (2007). A Novel Concept for Contact Etch Residue Removal. ECS Transactions. 11(2). 403–407. 2 indexed citations

Hellin, David, Jens Rip, Daniël Nelis, et al.. (2006). How Trace Analytical Techniques Contribute to the Research and Development of Ge and III/V Semiconductor Devices. ECS Transactions. 3(7). 173–181. 4 indexed citations

Hellin, David, et al.. (2006). Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology. Spectrochimica Acta Part B Atomic Spectroscopy. 61(5). 496–514. 35 indexed citations

10.

Leys, Frederik, B. Kaczer, Tom Janssens, et al.. (2006). Thin epitaxial Si films as a passivation method for Ge(100): Influence of deposition temperature on Ge surface segregation and the high-k/Ge interface quality. Materials Science in Semiconductor Processing. 9(4-5). 679–684. 41 indexed citations

11.

Hellin, David, Annelies Delabie, Riikka L. Puurunen, et al.. (2005). Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High-κDielectric HfO2 Layers. Analytical Sciences. 21(7). 845–850. 16 indexed citations

12.

Puurunen, Riikka L., Annelies Delabie, Sven Van Elshocht, et al.. (2005). Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films. Applied Physics Letters. 86(7). 40 indexed citations

13.

Hellin, David, Stefan De Gendt, Jens Rip, & Chris Vinckier. (2005). Total reflection X-ray fluorescence spectrometry for the introduction of novel materials in clean-room production environments. IEEE Transactions on Device and Materials Reliability. 5(4). 639–651. 7 indexed citations

14.

Hellin, David, Ivo Teerlinck, Jan Van Steenbergen, et al.. (2005). Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers. Spectrochimica Acta Part B Atomic Spectroscopy. 60(2). 209–213. 7 indexed citations

15.

Hellin, David, et al.. (2005). Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers. Journal of Analytical Atomic Spectrometry. 20(7). 652–652. 19 indexed citations

16.

Hellin, David, et al.. (2004). Saturation effects in TXRF on micro-droplet residues. 1 indexed citations

17.

Hellin, David, Jens Rip, Sophia Arnauts, et al.. (2004). Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers. Spectrochimica Acta Part B Atomic Spectroscopy. 59(8). 1149–1157. 25 indexed citations

18.

Hellin, David, et al.. (2004). The role of TXRF in the introduction of high-k materials into IC processing. 199–211. 2 indexed citations

19.

Hellin, David, Wim Fyen, Jens Rip, et al.. (2004). Saturation effects in TXRF on micro-droplet residue samples. Journal of Analytical Atomic Spectrometry. 19(12). 1517–1517. 42 indexed citations

20.

Hellin, David, Twan Bearda, Chenguang Zhao, et al.. (2003). Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry. Spectrochimica Acta Part B Atomic Spectroscopy. 58(12). 2093–2104. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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