David Hellin

447 citations

31 papers · 356 indexed · h-index 9

Impact in

Radiation top 5%
- X-ray Spectroscopy and Fluorescence Analysis
Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques

Papers in ⓘ

Surfaces, Coatings and Films 11
- Electron and X-Ray Spectroscopy Techniques 9
Radiation 9
- X-ray Spectroscopy and Fluorescence Analysis 9

Co-authors: Stefan De Gendt (15 shared papers)Chris Vinckier (9 shared papers)Jens Rip (9 shared papers)Paul Mertens (4 shared papers)Thierry Conard (5 shared papers)Annelies Delabie (4 shared papers)Werner Boullart (7 shared papers)Matty Caymax (5 shared papers)
Journals: Spectrochimica Acta Part B Atomic Spectroscopy (4 papers)Applied Physics Letters (2 papers)Journal of Micro/Nanolithography MEMS and MOEMS (2 papers)Journal of Analytical Atomic Spectrometry (2 papers)Japanese Journal of Applied Physics (1 paper)
Partner nations: Belgium United States Netherlands

In The Last Decade

David Hellin

31 papers receiving 345 citations

Peers

Countries citing papers authored by David Hellin

Since Specialization

Citations

This map shows the geographic impact of David Hellin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David Hellin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David Hellin more than expected).

Fields of papers citing papers by David Hellin

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David Hellin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David Hellin. The network helps show where David Hellin may publish in the future.

Co-authors

The 25 scholars most cited alongside David Hellin, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with David Hellin Line = papers co-authored together David Hellin links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 31 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Saturation effects in TXRF on micro-droplet residue samples Journal of Analytical Atomic Spectrometry ·David Hellin, Wim Fyen, Jens Rip, Tinne Delande, Paul Mertens, Stefan De Gendt, Chris Vinckier	2004	42
2	Thin epitaxial Si films as a passivation method for Ge(100): Influence of deposition temperature on Ge surface segregation and the high-k/Ge interface quality Materials Science in Semiconductor Processing ·Frederik Leys, Renaud Bonzom, B. Kaczer, Tom Janssens, Wilfried Vandervorst, Brice De Jaeger, Jan Van Steenbergen, Koen Martens, David Hellin, Jens Rip, Gabriela Dilliway, Annelies Delabie, Paul Zimmerman, Michel Houssa, Antoon Theuwis, Roger Loo, Marc Meuris, Matty Caymax, Marc Heyns	2006	41
3	Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films Applied Physics Letters ·Riikka L. Puurunen, Annelies Delabie, Sven Van Elshocht, Matty Caymax, Martin L. Green, Bert Brijs, Olivier Richard, H. Bender, Thierry Conard, I. Hoflijk, Wilfried Vandervorst, David Hellin, Danielle Vanhaeren, Chao Zhao, Stefan De Gendt, Marc Heyns	2005	40
4	Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology Spectrochimica Acta Part B Atomic Spectroscopy ·David Hellin, Stefan De Gendt, Nick Valckx, Paul Mertens, Chris Vinckier	2006	35
5	H 2 S exposure of a (100)Ge surface: Evidences for a (2×1) electrically passivated surface Applied Physics Letters ·Michel Houssa, Daniël Nelis, David Hellin, G. Pourtois, Thierry Conard, Kristof Paredis, K. Vanormelingen, A. Vantomme, Marlies K. Van Bael, J.A. Mullens, Matty Caymax, Marc Meuris, M. M. Heyns	2007	29
6	Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers Spectrochimica Acta Part B Atomic Spectroscopy ·David Hellin, Jens Rip, Sophia Arnauts, Stefan De Gendt, P. Mertens, Chris Vinckier	2004	25
7	Silicon Nano-Pillar Test Structures for Quantitative Evaluation of Wafer Drying Induced Pattern Collapse ECS Transactions ·Ingrid Vos, David Hellin, Johan Vertommen, M. Demand, Werner Boullart	2011	23
8	Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers Journal of Analytical Atomic Spectrometry ·David Hellin, Jens Rip, V. Geens, Tinne Delande, Thierry Conard, Stefan De Gendt, C. Vinckier	2005	19
9	Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High-κDielectric HfO2 Layers Analytical Sciences ·David Hellin, Annelies Delabie, Riikka L. Puurunen, P.A. Beaven, Thierry Conard, Bert Brijs, Stefan De Gendt, Chris Vinckier	2005	16
10	15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kai Xu, Laurent Souriau, David Hellin, Janko Versluijs, Patrick Wong, Diziana Vangoidsenhoven, Nadia Vandenbroeck, Harold Dekkers, Xiaoyu Shi, Johan Albert, C.-L. Tan, Johan Vertommen, B. Coenegrachts, Isabelle Orain, Y. Kimura, Vincent Wiaux, Werner Boullart	2013	8
11	Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers Spectrochimica Acta Part B Atomic Spectroscopy ·David Hellin, V. Geens, Ivo Teerlinck, Jan Van Steenbergen, Jens Rip, W. Laureyn, G. Raskin, Paul Mertens, Stefan De Gendt, Chris Vinckier	2005	7
12	Total reflection X-ray fluorescence spectrometry for the introduction of novel materials in clean-room production environments IEEE Transactions on Device and Materials Reliability ·David Hellin, Stefan De Gendt, Jens Rip, Chris Vinckier	2005	7
13	Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry Spectrochimica Acta Part B Atomic Spectroscopy ·David Hellin, Twan Bearda, Chenguang Zhao, G. Raskin, P. Mertens, Stefan De Gendt, Marc Heyns, C. Vinckier	2003	7
14	The influence of post-etch InGaAs fin profile on electrical performance Japanese Journal of Applied Physics ·Tsvetan Ivanov, Mohammad Ali Pourghaderi, Dennis Lin, Jen-Kan Yu, Samantha Tan, Yoshie Kimura, David Hellin, Jeffrey Geypen, H. Bender, Johan Vertommen, Gowri Kamarthy, Nadine Collaert, Jef Marks, Vahid Vahedi, Reza Arghavani, Aaron Thean	2014	7
15	Gate double patterning strategies for 10-nm node FinFET devices Journal of Micro/Nanolithography MEMS and MOEMS ·Hubert Hody, Vasile Paraschiv, David Hellin, T. Vandeweyer, G. Boccardi, Kaidong Xu	2015	7
16	Self-aligned quadruple patterning to meet requirements for fins with high density SPIE Newsroom ·Efrain Altamirano Sánchez, Tao Zheng, Anil Gunay-Demirkol, Gian F. Lorusso, T. Hopf, Jean-Luc Everaert, William R. Clark, Vassilios Constantoudis, Daniel Sobieski, Fung Suong Ou, David Hellin	2016	5
17	Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning Journal of Micro/Nanolithography MEMS and MOEMS ·Kaidong Xu, Laurent Souriau, David Hellin, Janko Versluijs, Patrick Wong, Diziana Vangoidsenhoven, Nadia Vandenbroeck, Harold Dekkers, Xiaoping Shi, Johan Albert, C.-L. Tan, Johan Vertommen, B. Coenegrachts, Isabelle Orain, Yoshie Kimura, Vincent Wiaux, Werner Boullart	2013	5
18	How Trace Analytical Techniques Contribute to the Research and Development of Ge and III/V Semiconductor Devices ECS Transactions ·David Hellin, Jens Rip, Renaud Bonzom, Daniël Nelis, Sonja Sioncke, Guy Brammertz, Matty Caymax, M. Meuris, Stefan De Gendt, Chris Vinckier	2006	4
19	Introduction of High-k Materials into Wet Processing, Analysis and Behavior Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Bart Onsia, David Hellin, Martine Claes, Ashley Maes, Stefan De Gendt, Marc Heyns	2003	4
20	Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Michael Kubis, Rich Wise, Charlotte Chahine, Katja Viatkina, Samee Ur-Rehman, Geert Simons, Mircea Dusa, David Hellin, Daniel Sobieski, Wenzhe Zhang, Christiane Jehoul, Patrick Jaenen, Philippe Leray	2017	4

About David Hellin

David Hellin is a scholar working on Surfaces, Coatings and Films, Radiation, Electrical and Electronic Engineering, Computational Mechanics and Analytical Chemistry, having authored 31 papers that have together received 356 indexed citations. Recurring topics across this work include Semiconductor materials and devices (14 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Electron and X-Ray Spectroscopy Techniques (9 papers), X-ray Spectroscopy and Fluorescence Analysis (9 papers), Advancements in Photolithography Techniques (8 papers), Thin-Film Transistor Technologies (4 papers), Ion-surface interactions and analysis (3 papers) and Advancements in Semiconductor Devices and Circuit Design (3 papers). The work is most often cited by research in Radiation (126 citations), Surfaces, Coatings and Films (80 citations), Electrical and Electronic Engineering (229 citations), Analytical Chemistry (32 citations) and Archeology (25 citations). David Hellin has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include Stefan De Gendt, Chris Vinckier, Jens Rip, Paul Mertens, Thierry Conard, Annelies Delabie, Werner Boullart, Matty Caymax, Wim Fyen and Marc Heyns. Their work appears in journals such as Spectrochimica Acta Part B Atomic Spectroscopy, Applied Physics Letters, Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Analytical Atomic Spectrometry and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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