Vincent Wiaux

2.9k total citations · 1 hit paper
73 papers, 2.2k citations indexed

About

Vincent Wiaux is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Vincent Wiaux has authored 73 papers receiving a total of 2.2k indexed citations (citations by other indexed papers that have themselves been cited), including 72 papers in Electrical and Electronic Engineering, 29 papers in Surfaces, Coatings and Films and 21 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Vincent Wiaux's work include Advancements in Photolithography Techniques (49 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Photonic Crystals and Applications (21 papers). Vincent Wiaux is often cited by papers focused on Advancements in Photolithography Techniques (49 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Photonic Crystals and Applications (21 papers). Vincent Wiaux collaborates with scholars based in Belgium, United States and Netherlands. Vincent Wiaux's co-authors include Wim Bogaerts, Dirk Taillaert, Pieter Dumon, Dries Van Thourhout, Bert Luyssaert, Peter Bienstman, Joris Van Campenhout, Roel Baets, S. Beckx and S. Beckx and has published in prestigious journals such as Optics Letters, Optics Express and Japanese Journal of Applied Physics.

In The Last Decade

Vincent Wiaux

69 papers receiving 2.1k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology

2005 657 citations Wim Bogaerts, Pieter Dumon et al. Journal of Lightwave Technology profile →

Peers

Countries citing papers authored by Vincent Wiaux

Since Specialization

Citations

This map shows the geographic impact of Vincent Wiaux's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vincent Wiaux with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vincent Wiaux more than expected).

Fields of papers citing papers by Vincent Wiaux

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Vincent Wiaux. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vincent Wiaux. The network helps show where Vincent Wiaux may publish in the future.

Co-authorship network of co-authors of Vincent Wiaux

This figure shows the co-authorship network connecting the top 25 collaborators of Vincent Wiaux. A scholar is included among the top collaborators of Vincent Wiaux based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Vincent Wiaux. Vincent Wiaux is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	High NA EUV stitching: mask performance is a key 2024 ·Natalia Davydova, Vincent Wiaux, (unknown), (unknown), (unknown), Frank Timmermans, Cyrus Tabery, Joost Bekaert, Lieve Van Look, (unknown), (unknown), Nitesh Pandey, S. Hunsche, (unknown), (unknown)	1
2	Mask innovations on the eve of high NA EUV lithography 2024 ·Japanese Journal of Applied Physics ·Vicky Philipsen, Andreas Frommhold, (unknown), (unknown), Inhwan Lee, Joern-Holger Franke, Joost Bekaert, Lieve Van Look, (unknown), Peter De Bisschop, R. Jonckheere, (unknown), Vincent Wiaux, Eric Hendrickx	2
3	Stitching for high-NA: zooming in on CDU budget 2023 ·Natalia Davydova, Lieve Van Look, (unknown), Vincent Wiaux, (unknown), (unknown), (unknown), Frank Timmermans, (unknown), Eelco van Setten, Daniel W. Wilson	2
4	Resist and reticle activities towards High-NA EUV ecosystem readiness 2022 ·(unknown), Weimin Gao, Eric Hendrickx, Vincent Wiaux, Joern-Holger Franke, Emily J. Gallagher, (unknown), (unknown), Jo Finders	5
5	Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes 2020 ·Joern-Holger Franke, Natalia Davydova, Joost Bekaert, Vincent Wiaux, (unknown), (unknown), Ziyang Wang, (unknown), Eric Hendrickx	7
6	Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Weimin Gao, Víctor Blanco, Vicky Philipsen, (unknown), (unknown), Ivan Ciofi, Lawrence S. Melvin, Eric Hendrickx, Vincent Wiaux, (unknown)	5
7	15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kai Xu, Laurent Souriau, David Hellin, Janko Versluijs, Patrick Wong, (unknown), (unknown), Harold Dekkers, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Vincent Wiaux, Werner Boullart	8
8	Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), David del Rio, (unknown), Werner Gillijns, Jinling Wang, Patrick Wong, Dieter Van den Heuvel, Vincent Wiaux, (unknown), Jo Finders	2
9	Checking design conformance and optimizing manufacturability using automated double patterning decomposition 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Brian Ward, (unknown), (unknown), Kevin Lucas, (unknown), Vincent Wiaux, (unknown), Mireille Maenhoudt	3
10	Exploration of etch step interactions in the dual patterning process for process modeling 2008 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Lawrence S. Melvin, Brian S. Ward, (unknown), (unknown), Kevin Lucas, Vincent Wiaux, (unknown), Mireille Maenhoudt	1
11	Optical extensions integration for a 0.314-μm²45-nm node 6-transistor SRAM cell 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), A. Nackaerts, Vincent Wiaux, Eric Hendrickx, Geert Vandenberghe	4
12	Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology breakdown → 2005 ·Journal of Lightwave Technology ·Wim Bogaerts, (unknown), Pieter Dumon, Vincent Wiaux, S. Beckx, Dirk Taillaert, Bert Luyssaert, Joris Van Campenhout, Peter Bienstman, Dries Van Thourhout	657
13	Silicon-on-insulator nanophotonics 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Wim Bogaerts, Pieter Dumon, Patrick Jaenen, Johan Wouters, S. Beckx, Vincent Wiaux, Dries Van Thourhout, Dirk Taillaert, Bert Luyssaert, Roel Baets	10
14	Ultralow-loss 3-dB photonic crystal waveguide splitter 2004 ·Optics Letters ·Lars H. Frandsen, P.I. Borel, Yanxin Zhuang, Anders Harpøth, M. Thorhauge, Martin Kristensen, Wim Bogaerts, Pieter Dumon, Roel Baets, Vincent Wiaux, Johan Wouters, S. Beckx	95
15	A compact photonic horizontal spot-size converter realized in silicon-on-insulator 2004 ·IEEE Photonics Technology Letters ·Bert Luyssaert, (unknown), Dirk Taillaert, Pieter Dumon, Wim Bogaerts, Peter Bienstman, Dries Van Thourhout, Vincent Wiaux, S. Beckx, Roel Baets	22
16	Basic structures for photonic integrated circuits in Silicon-on-insulator 2004 ·Optics Express ·Wim Bogaerts, Dirk Taillaert, Bert Luyssaert, Pieter Dumon, Joris Van Campenhout, Peter Bienstman, Dries Van Thourhout, Roel Baets, Vincent Wiaux, S. Beckx	201
17	Low-loss photonic wires and compact ring resonators in silicon-on-insulator 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Pieter Dumon, Wim Bogaerts, Joris Van Campenhout, Vincent Wiaux, (unknown), S. Beckx, Roel Baets	5
18	Low-loss photonic wires and compact ring resonators in silicon-on-insulator 2003 ·Ghent University Academic Bibliography (Ghent University) ·Pieter Dumon, Wim Bogaerts, Jan Van Campenhout, Vincent Wiaux, Johan Wouters, S. Beckx, Roel Baets	4
19	Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography 2002 ·IEEE Journal of Selected Topics in Quantum Electronics ·Wim Bogaerts, Vincent Wiaux, Dirk Taillaert, S. Beckx, Bert Luyssaert, Peter Bienstman, Roel Baets	113
20	Reticle quality needs for advanced 193-nm lithography 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. Jonckheere, Geert Vandenberghe, Vincent Wiaux, (unknown), Kurt Ronse	2

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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