Catherine B. Labelle

1.9k total citations
34 papers, 551 citations indexed

About

Catherine B. Labelle is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Catherine B. Labelle has authored 34 papers receiving a total of 551 indexed citations (citations by other indexed papers that have themselves been cited), including 33 papers in Electrical and Electronic Engineering, 15 papers in Electronic, Optical and Magnetic Materials and 12 papers in Mechanics of Materials. Recurrent topics in Catherine B. Labelle's work include Semiconductor materials and devices (20 papers), Copper Interconnects and Reliability (15 papers) and Metal and Thin Film Mechanics (12 papers). Catherine B. Labelle is often cited by papers focused on Semiconductor materials and devices (20 papers), Copper Interconnects and Reliability (15 papers) and Metal and Thin Film Mechanics (12 papers). Catherine B. Labelle collaborates with scholars based in United States, Germany and Singapore. Catherine B. Labelle's co-authors include Karen K. Gleason, Scott J. Limb, David J. Edell, Edward F. Gleason, A. Kornblit, R. L. Opila, Vincent M. Donnelly, Gregory R. Bogart, Helen Maynard and D. Canaperi and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Catherine B. Labelle

34 papers receiving 515 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Catherine B. Labelle United States 14 365 225 163 142 123 34 551
R. Lamendola Italy 12 200 0.5× 211 0.9× 156 1.0× 69 0.5× 116 0.9× 19 420
F. Weilnboeck United States 13 376 1.0× 180 0.8× 112 0.7× 59 0.4× 73 0.6× 21 505
F. Emmi United States 10 187 0.5× 157 0.7× 84 0.5× 72 0.5× 103 0.8× 18 373
P. J. Matsuo United States 13 598 1.6× 226 1.0× 272 1.7× 139 1.0× 32 0.3× 14 686
V. Kopustinskas Lithuania 14 167 0.5× 362 1.6× 257 1.6× 27 0.2× 111 0.9× 47 571
N. Possémé France 15 668 1.8× 236 1.0× 248 1.5× 376 2.6× 32 0.3× 75 769
Takaomi Matsutani Japan 13 308 0.8× 290 1.3× 92 0.6× 66 0.5× 33 0.3× 50 508
S.P. Speakman United Kingdom 9 340 0.9× 314 1.4× 136 0.8× 37 0.3× 16 0.1× 14 538
Estelle Wagner Switzerland 12 254 0.7× 180 0.8× 170 1.0× 58 0.4× 283 2.3× 34 590
Wen‐Ching Shih Taiwan 14 326 0.9× 454 2.0× 84 0.5× 141 1.0× 15 0.1× 56 612

Countries citing papers authored by Catherine B. Labelle

Since Specialization
Citations

This map shows the geographic impact of Catherine B. Labelle's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Catherine B. Labelle with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Catherine B. Labelle more than expected).

Fields of papers citing papers by Catherine B. Labelle

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Catherine B. Labelle. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Catherine B. Labelle. The network helps show where Catherine B. Labelle may publish in the future.

Co-authorship network of co-authors of Catherine B. Labelle

This figure shows the co-authorship network connecting the top 25 collaborators of Catherine B. Labelle. A scholar is included among the top collaborators of Catherine B. Labelle based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Catherine B. Labelle. Catherine B. Labelle is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Graves, David B., Catherine B. Labelle, Mark J. Kushner, et al.. (2024). Science challenges and research opportunities for plasma applications in microelectronics. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 42(4). 10 indexed citations
2.
Labelle, Catherine B., et al.. (2018). Introduction of pre-etch deposition techniques in EUV patterning. 9776. 19–19. 2 indexed citations
3.
Mochizuki, Shinichi, Richard G. Southwick, J. Li, et al.. (2017). A comparative study of strain and Ge content in Si<inf>1−x</inf>Ge<inf>x</inf> channel using planar FETs, FinFETs, and strained relaxed buffer layer FinFETs. 37.2.1–37.2.4. 20 indexed citations
4.
Zhang, John H., Stan Tsai, C. Surisetty, et al.. (2017). CMP Challenges for Advanced Technology Nodes beyond Si. MRS Advances. 2(51). 2891–2902. 1 indexed citations
5.
Tsai, Stan, H. P. Amanapu, Ruilong Xie, et al.. (2017). CMP: Consideration of Stop-on Selectivity in Advanced Node Semiconductor Manufacturing Technology. ECS Transactions. 77(4). 169–177. 3 indexed citations
6.
Peethala, B., Frank W. Mont, S. Molis, et al.. (2016). Impact of HF-based cleaning solutions on via resistance for sub-10 nm BEOL structures. Microelectronic Engineering. 161. 98–103. 4 indexed citations
7.
Huang, Huai, R. Patlolla, Wei Wang, et al.. (2016). Ruthenium interconnect resistivity and reliability at 48 nm pitch. 31–33. 38 indexed citations
8.
Mohanty, Nihar, Richard A. Farrell, Jeffrey Smith, et al.. (2016). LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9782. 97820Q–97820Q. 3 indexed citations
9.
Lee, Chang‐Woo, Peng Wang, Yann Mignot, et al.. (2015). Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280A–94280A. 2 indexed citations
10.
Ho, Paul S., et al.. (2014). Co Liner Impact on Microstructure of Cu Interconnects. ECS Journal of Solid State Science and Technology. 4(1). N3177–N3179. 13 indexed citations
11.
Labelle, Catherine B., R. P. Srivastava, John Arnold, et al.. (2011). Plasma Etch Challenges for Porous Low k Materials for 32nm and Beyond. ECS Transactions. 34(1). 329–334. 2 indexed citations
12.
Iijima, Takashi, Qinghuang Lin, Catherine B. Labelle, et al.. (2006). BEOL Integration of Highly Damage -Resistant Porous Ultra Low-K Material Using Direct CMP and Via-first Process. 21–23. 4 indexed citations
13.
Moon, Bum Ki, Takashi Iijima, S. G. Malhotra, et al.. (2005). Integration of ALD-TaN Liners on Nanoporous Dielectrics. MRS Proceedings. 863. 2 indexed citations
14.
Labelle, Catherine B., R. L. Opila, & A. Kornblit. (2005). Plasma deposition of fluorocarbon thin films from c-C4F8 using pulsed and continuous rf excitation. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(1). 190–196. 30 indexed citations
15.
Dalton, T., Nicholas Fuller, Catherine B. Labelle, et al.. (2004). Ash-induced modification of porous and dense SiCOH inter-level-dielectric (ILD) materials during damascene plasma processing. 154–156. 1 indexed citations
16.
Labelle, Catherine B. & Karen K. Gleason. (2001). Pulsed plasma deposition from 1,1,2,2‐tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition. Journal of Applied Polymer Science. 80(11). 2084–2092. 23 indexed citations
17.
Labelle, Catherine B. & Karen K. Gleason. (2000). Fourier Transform Infrared Spectroscopy Study of Thermal Annealing Behavior of ECR Pulsed Plasma Deposited Fluorocarbon Thin Films from 1,1,2,2-Tetrafluoroethane. Journal of The Electrochemical Society. 147(2). 678–678. 13 indexed citations
18.
Labelle, Catherine B. & Karen K. Gleason. (2000). Overhang Test Structure Deposition Profiles of Pulsed Plasma Fluorocarbon Films from Hexafluoropropylene Oxide, 1,1,2,2-Tetrafluorethane, and Difluoromethane. Chemical Vapor Deposition. 6(1). 27–32. 4 indexed citations
19.
Labelle, Catherine B. & Karen K. Gleason. (1999). Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHClF2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(2). 445–452. 47 indexed citations
20.
Labelle, Catherine B., et al.. (1996). Metal stack etching using a helical resonator plasma. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(4). 2574–2581. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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