A. Kornblit

1.1k total citations
50 papers, 701 citations indexed

About

A. Kornblit is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, A. Kornblit has authored 50 papers receiving a total of 701 indexed citations (citations by other indexed papers that have themselves been cited), including 45 papers in Electrical and Electronic Engineering, 10 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. Recurrent topics in A. Kornblit's work include Semiconductor materials and devices (24 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers) and Advancements in Photolithography Techniques (13 papers). A. Kornblit is often cited by papers focused on Semiconductor materials and devices (24 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers) and Advancements in Photolithography Techniques (13 papers). A. Kornblit collaborates with scholars based in United States, Germany and Netherlands. A. Kornblit's co-authors include Vincent M. Donnelly, M. V. Malyshev, R. L. Opila, Catherine B. Labelle, F. Klemens, Jennifer Colonell, Gregory R. Bogart, S.J. Hillenius, Richard A. Gottscho and T. Sorsch and has published in prestigious journals such as Nano Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

A. Kornblit

46 papers receiving 640 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A. Kornblit United States 17 624 164 145 125 107 50 701
E. Räuchle Germany 12 327 0.5× 83 0.5× 123 0.8× 100 0.8× 69 0.6× 31 470
Camille Petit‐Etienne France 15 567 0.9× 87 0.5× 246 1.7× 218 1.7× 112 1.0× 58 768
Hisataka Hayashi Japan 12 468 0.8× 158 1.0× 146 1.0× 47 0.4× 86 0.8× 40 505
Akinori Ebe Japan 15 483 0.8× 263 1.6× 346 2.4× 52 0.4× 42 0.4× 50 669
J. M. Cook United States 8 686 1.1× 305 1.9× 233 1.6× 46 0.4× 66 0.6× 9 748
Masaki Hirayama Japan 16 720 1.2× 79 0.5× 239 1.6× 102 0.8× 80 0.7× 76 821
T. Meziani Italy 9 201 0.3× 87 0.5× 82 0.6× 78 0.6× 178 1.7× 11 380
Shoji Den Japan 14 295 0.5× 95 0.6× 263 1.8× 43 0.3× 65 0.6× 30 488
N. R. Rueger United States 9 864 1.4× 385 2.3× 303 2.1× 45 0.4× 94 0.9× 11 945
Kyong Nam Kim South Korea 14 390 0.6× 180 1.1× 234 1.6× 52 0.4× 80 0.7× 47 519

Countries citing papers authored by A. Kornblit

Since Specialization
Citations

This map shows the geographic impact of A. Kornblit's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Kornblit with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Kornblit more than expected).

Fields of papers citing papers by A. Kornblit

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Kornblit. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Kornblit. The network helps show where A. Kornblit may publish in the future.

Co-authorship network of co-authors of A. Kornblit

This figure shows the co-authorship network connecting the top 25 collaborators of A. Kornblit. A scholar is included among the top collaborators of A. Kornblit based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Kornblit. A. Kornblit is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Dimitrov, V., J.B. Heng, R. Chan, et al.. (2008). Small-signal performance and modeling of sub-50nm nMOSFETs with fT above 460-GHz. Solid-State Electronics. 52(6). 899–908. 17 indexed citations
2.
Dimitrov, V., Aleksei Aksimentiev, Klaus Schulten, et al.. (2006). Exploring the Prospects for a Nanometer-scale Gene Chip. 1–4. 3 indexed citations
3.
Dimitrov, V., J.B. Heng, R. Chan, et al.. (2006). High performance, sub-50nm MOSFETS for mixed signal applications. 41. 204–207. 7 indexed citations
4.
5.
6.
Hillenius, S.J., et al.. (2002). Self-aligned silicided inverse-T gate LDD devices for sub-half micron CMOS technology. 6. 829–832. 1 indexed citations
7.
Oh, Sang‐Hyun, J. M. Hergenrother, Don Monroe, et al.. (2000). The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET. MRS Proceedings. 610. 1 indexed citations
8.
Ashraf, Huma, Jy Bhardwaj, A. Hynes, et al.. (2000). <title>Etching 200-mm diameter SCALPEL masks with the ASE process</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7 indexed citations
9.
Farrow, R. C., W. K. Waskiewicz, I.C. Kizilyalli, et al.. (1999). CMOS compatible alignment marks for the SCALPEL proof of lithography tool. Microelectronic Engineering. 46(1-4). 263–266. 2 indexed citations
10.
Malyshev, M. V., et al.. (1999). Langmuir probe studies of a transformer-coupled plasma, aluminum etcher. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(2). 480–492. 28 indexed citations
11.
Farrow, R. C., W. K. Waskiewicz, I.C. Kizilyalli, et al.. (1999). Alignment mark detection in CMOS materials with SCALPEL e-beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 217–217. 1 indexed citations
12.
Tennant, D. M., G. Timp, Leonidas E. Ocola, et al.. (1999). Progress toward a 30 nm silicon metal–oxide–semiconductor gate technology. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3158–3163. 6 indexed citations
13.
Malyshev, M. V., et al.. (1998). Percent dissociation of Cl2 in inductively coupled, chlorine-containing plasmas. Journal of Applied Physics. 84(1). 137–146. 88 indexed citations
14.
Cirelli, Raymond A., Gary R. Weber, A. Kornblit, et al.. (1996). A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4229–4233. 16 indexed citations
15.
Haaland, David M., et al.. (1994). Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles. Journal of the Optical Society of America A. 11(9). 2485–2485. 27 indexed citations
16.
17.
Gottscho, Richard A., J. Greguš, Konstantinos P. Giapis, et al.. (1992). <title>Light scattering methods for semiconductor process monitoring and control</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1594. 306–312. 1 indexed citations
18.
Smolinsky, G., et al.. (1990). Material Properties of Spin‐on Silicon Oxide (SOX) for Fully Recessed NMOS Field Isolation. Journal of The Electrochemical Society. 137(1). 229–234. 3 indexed citations
19.
Hillenius, S.J., et al.. (1986). A symmetric submicron CMOS technology. 252–255. 55 indexed citations
20.
Lipsicas, M., et al.. (1970). Negative resistance and modulation in metal oxides (“Moxies”). Journal of Non-Crystalline Solids. 2. 550–557. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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