N. Possémé
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Advancements in Photolithography Techniques
Papers in
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- Copper Interconnects and Reliability 33
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- Semiconductor materials and devices 52
- Advancements in Photolithography Techniques 17
- Plasma Diagnostics and Applications 14
- Integrated Circuits and Semiconductor Failure Analysis 9
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (15 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (12 papers)Microelectronic Engineering (6 papers)Applied Physics Letters (3 papers)Dalton Transactions (1 paper)
- Partner nations
- FranceUnited StatesSwitzerland
In The Last Decade
N. Possémé
72 papers receiving 746 citations
Peers
Comparison fields: 5 of 38
- Electronic, Optical and Magnetic Materials 376
- Electrical and Electronic Engineering 668
- Mechanics of Materials 248
- Materials Chemistry 236
- Ceramics and Composites 27
Countries citing papers authored by N. Possémé
This map shows the geographic impact of N. Possémé's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by N. Possémé with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites N. Possémé more than expected).
Fields of papers citing papers by N. Possémé
This network shows the impact of papers produced by N. Possémé. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by N. Possémé. The network helps show where N. Possémé may publish in the future.
Co-authors
The 25 scholars most cited alongside N. Possémé, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 3 | |
| 2 | 2023 | 2 | |
| 3 | 2023 | 2 | |
| 4 | 2022 | 1 | |
| 5 | 2021 | 4 | |
| 6 | 2021 | 4 | |
| 7 | 2020 | 44 | |
| 8 | 2020 | 9 | |
| 9 | 2019 | 14 | |
| 10 | 2018 | 2 | |
| 11 | 2018 | 3 | |
| 12 | 2016 | 36 | |
| 13 | 2015 | 14 | |
| 14 | 2015 | 1 | |
| 15 | 2014 | 10 | |
| 16 | 2013 | 4 | |
| 17 | 2012 | 24 | |
| 18 | 2006 | 2 | |
| 19 | 2004 | 45 | |
| 20 | 2003 | 59 |
About N. Possémé
N. Possémé is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Ceramics and Composites, Surfaces, Coatings and Films and Materials Chemistry, having authored 75 papers that have together received 769 indexed citations. Recurring topics across this work include Semiconductor materials and devices (52 papers), Copper Interconnects and Reliability (33 papers), Advancements in Photolithography Techniques (17 papers), Plasma Diagnostics and Applications (14 papers), Metal and Thin Film Mechanics (11 papers), Block Copolymer Self-Assembly (11 papers), Advanced Surface Polishing Techniques (10 papers) and Integrated Circuits and Semiconductor Failure Analysis (9 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (376 citations), Electrical and Electronic Engineering (668 citations), Mechanics of Materials (248 citations), Materials Chemistry (236 citations) and Ceramics and Composites (27 citations). N. Possémé has collaborated with scholars based in France, United States and Switzerland. Frequent co-authors include T. Chevolleau, O. Joubert, S. Barnola, David Tormey, Maxime Darnon, L. Vallier, O. Louveau, N. Rochat, P. Mangiagalli and C. Arvet. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Microelectronic Engineering, Applied Physics Letters and Dalton Transactions.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.