Walter Kleemeier

1.1k total citations
10 papers, 237 citations indexed

About

Walter Kleemeier is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Walter Kleemeier has authored 10 papers receiving a total of 237 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 6 papers in Biomedical Engineering and 2 papers in Materials Chemistry. Recurrent topics in Walter Kleemeier's work include Advanced Surface Polishing Techniques (4 papers), Semiconductor materials and devices (4 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Walter Kleemeier is often cited by papers focused on Advanced Surface Polishing Techniques (4 papers), Semiconductor materials and devices (4 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Walter Kleemeier collaborates with scholars based in United States, Germany and Czechia. Walter Kleemeier's co-authors include Rohit Galatage, Ali Razavieh, Ahmedullah Aziz, Zoran Krivokapić, Jiajun Shi, Ajey P. Jacob, Johannes Müller, Ryan Sporer, Claudy Serrao and P. Polakowski and has published in prestigious journals such as Thin Solid Films, Microelectronic Engineering and ECS Transactions.

In The Last Decade

Walter Kleemeier

10 papers receiving 228 citations

Peers

Countries citing papers authored by Walter Kleemeier

Since Specialization

Citations

This map shows the geographic impact of Walter Kleemeier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Walter Kleemeier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Walter Kleemeier more than expected).

Fields of papers citing papers by Walter Kleemeier

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Walter Kleemeier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Walter Kleemeier. The network helps show where Walter Kleemeier may publish in the future.

Co-authorship network of co-authors of Walter Kleemeier

This figure shows the co-authorship network connecting the top 25 collaborators of Walter Kleemeier. A scholar is included among the top collaborators of Walter Kleemeier based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Walter Kleemeier. Walter Kleemeier is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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10 of 10 papers shown

#	Work	Indexed citations
1	External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS Technology 2018 ·Oleg Gluschenkov, Heng Wu, Kevin Brew, (unknown), Yu Lan, (unknown), S. Choi, (unknown), J. Demarest, Adra Carr, Shaoyin Chen, (unknown), (unknown), (unknown), Walter Kleemeier, Dechao Guo	8
2	14nm Ferroelectric FinFET technology with steep subthreshold slope for ultra low power applications 2017 ·Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) ·Zoran Krivokapić, (unknown), Rohit Galatage, Ali Razavieh, Ahmedullah Aziz, (unknown), Jiajun Shi, (unknown), Ryan Sporer, Claudy Serrao, (unknown), P. Polakowski, Johannes Müller, Walter Kleemeier, Ajey P. Jacob, D.E. Brown, Andreas Knorr, (unknown), Srinivasa Banna	183
3	CMP Challenges for Advanced Technology Nodes beyond Si 2017 ·MRS Advances ·John H. Zhang, Stan Tsai, C. Surisetty, Jody Fronheiser, (unknown), (unknown), R. Patlolla, D. Canaperi, Walter Kleemeier, Catherine B. Labelle	1
4	CMP Challenges for Advanced Technology Nodes 2017 ·MRS Advances ·John H. Zhang, (unknown), Andrew Greene, Ruilong Xie, Soon‐Cheon Seo, P. Montanini, Wei‐Tsu Tseng, Stan Tsai, (unknown), Qiang Fang, R. Patlolla, (unknown), Dechao Guo, D. Canaperi, C. Surisetty, (unknown), Walter Kleemeier, Catherine B. Labelle	8
5	Mechanical Analyses of Extended and Localized UTBB Stressors Formed with Ge Enrichment Techniques 2015 ·ECS Transactions ·(unknown), L. Grenouillet, (unknown), Alexandre Pofelski, (unknown), Qing Liu, E. Augendre, S. Maı̂trejean, Vincent Fiori, B. De Salvo, B. Doris, Walter Kleemeier	1
6	Cu CMP and its Challenge for 20nm Nodes and Beyond 2012 ·MRS Proceedings ·John H. Zhang, Wei‐Tsu Tseng, Laertis Economikos, Qiang Fang, J. P. Zheng, Lin Yang, D. Canaperi, (unknown), Ben Kim, (unknown), E. Liniger, Richard J. Murphy, (unknown), Walter Kleemeier, Cindy Goldberg, (unknown), Xiaomeng Chen, (unknown)	3
7	56 nm pitch Cu dual-damascene interconnects with self-aligned via using negative-tone development Lithography-Etch-Lithography-Etch patterning scheme 2012 ·Microelectronic Engineering ·(unknown), Yann Mignot, (unknown), (unknown), M. Sankarapandian, (unknown), P. Flaitz, (unknown), (unknown), (unknown), (unknown), Walter Kleemeier, E. Liniger, T. Spooner	9
8	Ultra-low resistivity in-situ phosphorus doped Si and SiC epitaxy for source/drain formation in advanced 20nm n-type field effect transistor devices 2011 ·Thin Solid Films ·N. Loubet, Thomas Adam, Mark Raymond, Qing Liu, Kangguo Cheng, (unknown), A. Reznicek, Prasanna Khare, Walter Kleemeier, Vamsi Paruchuri, B. Doris, (unknown)	18
9	Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization 2011 ·MRS Proceedings ·John H. Zhang, (unknown), J. Strane, (unknown), Laertis Economikos, Lindsey Hall, Jie Chen, (unknown), (unknown), (unknown), Paulo Ferreira, Walter Kleemeier, Cindy Goldberg, (unknown), (unknown), J. Sudijono, Xiaomeng Chen, (unknown)	1
10	Thin-film induced stress in GaAs ridge-waveguide structures integrated with sputter-deposited ZnO films 1994 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Hong Koo Kim, Walter Kleemeier, (unknown), D. W. Langer, Daniel T. Cassidy, (unknown)	5

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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