Ryoung-Han Kim
- Electrical and Electronic Engineering
- Surfaces, Coatings and Films top 5%
- Biomedical Engineering
- Electronic, Optical and Magnetic Materials
- Industrial and Manufacturing Engineering
- Co-authors
- Harry LevinsonYulu ChenObert R. WoodLei SunThomas I. WallowWerner GillijnsJongwook KyeVicky Philipsen
- Topics
- Advancements in Photolithography Techniques (46 papers)Integrated Circuits and Semiconductor Failure Analysis (23 papers)Electron and X-Ray Spectroscopy Techniques (19 papers)
- Journals
- Optics LettersIEEE Transactions on Semiconductor ManufacturingJournal of Micro/Nanolithography MEMS and MOEMS
- Partner nations
- United StatesBelgiumJapan
In The Last Decade
Ryoung-Han Kim
50 papers receiving 264 citations
Peers
Comparison fields: 5 of 28
- Electrical and Electronic Engineering 264
- Surfaces, Coatings and Films 101
- Biomedical Engineering 71
- Electronic, Optical and Magnetic Materials 22
- Industrial and Manufacturing Engineering 20
Countries citing papers authored by Ryoung-Han Kim
This map shows the geographic impact of Ryoung-Han Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ryoung-Han Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ryoung-Han Kim more than expected).
Fields of papers citing papers by Ryoung-Han Kim
This network shows the impact of papers produced by Ryoung-Han Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ryoung-Han Kim. The network helps show where Ryoung-Han Kim may publish in the future.
Co-authorship network of co-authors of Ryoung-Han Kim
This figure shows the co-authorship network connecting the top 25 collaborators of Ryoung-Han Kim. A scholar is included among the top collaborators of Ryoung-Han Kim based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ryoung-Han Kim. Ryoung-Han Kim is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 1 | |
| 3 | 0 | |
| 4 | 1 | |
| 5 | 5 | |
| 6 | 7 | |
| 7 | 6 | |
| 8 | 9 | |
| 9 | 1 | |
| 10 | 2 | |
| 11 | 7 | |
| 12 | 17 | |
| 13 | 3 | |
| 14 | 20 | |
| 15 | 0 | |
| 16 | 4 | |
| 17 | 3 | |
| 18 | 5 | |
| 19 | 8 | |
| 20 | 8 |
About Ryoung-Han Kim
Ryoung-Han Kim is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Industrial and Manufacturing Engineering, having authored 54 papers that have together received 284 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (46 papers), Integrated Circuits and Semiconductor Failure Analysis (23 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). The work is most often cited by research in Surfaces, Coatings and Films (101 citations), Electrical and Electronic Engineering (264 citations) and Structural Biology (4 citations). Ryoung-Han Kim has collaborated with scholars based in United States, Belgium and Japan. Frequent co-authors include Harry Levinson, Yulu Chen, Obert R. Wood, Lei Sun, Thomas I. Wallow, Werner Gillijns, Jongwook Kye, Vicky Philipsen, Tom Wallow and Bruno La Fontaine. Their work appears in journals such as Optics Letters, IEEE Transactions on Semiconductor Manufacturing and Journal of Micro/Nanolithography MEMS and MOEMS.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.