Ryoung-Han Kim

419 total citations
54 papers, 284 citations indexed

About

Ryoung-Han Kim is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Ryoung-Han Kim has authored 54 papers receiving a total of 284 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 26 papers in Surfaces, Coatings and Films and 16 papers in Biomedical Engineering. Recurrent topics in Ryoung-Han Kim's work include Advancements in Photolithography Techniques (46 papers), Integrated Circuits and Semiconductor Failure Analysis (23 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Ryoung-Han Kim is often cited by papers focused on Advancements in Photolithography Techniques (46 papers), Integrated Circuits and Semiconductor Failure Analysis (23 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Ryoung-Han Kim collaborates with scholars based in United States, Belgium and Japan. Ryoung-Han Kim's co-authors include Harry Levinson, Yulu Chen, Obert R. Wood, Lei Sun, Thomas I. Wallow, Werner Gillijns, Jongwook Kye, Vicky Philipsen, Tom Wallow and Bruno La Fontaine and has published in prestigious journals such as Optics Letters, IEEE Transactions on Semiconductor Manufacturing and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Ryoung-Han Kim

50 papers receiving 264 citations

Peers

Ryoung-Han Kim
Alessandro Vaglio Pret Belgium
Carlos Fonseca United States
Jan Hermans Belgium
Mark D. Smith United States
Koen van Ingen Schenau Netherlands
Paul Graeupner Germany
Monique Ercken Belgium
Soichi Inoue Japan
Gregory McIntyre United States
Bernhard Kneer Germany
Alessandro Vaglio Pret Belgium
Ryoung-Han Kim
Citations per year, relative to Ryoung-Han Kim Ryoung-Han Kim (= 1×) peers Alessandro Vaglio Pret

Countries citing papers authored by Ryoung-Han Kim

Since Specialization
Citations

This map shows the geographic impact of Ryoung-Han Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ryoung-Han Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ryoung-Han Kim more than expected).

Fields of papers citing papers by Ryoung-Han Kim

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ryoung-Han Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ryoung-Han Kim. The network helps show where Ryoung-Han Kim may publish in the future.

Co-authorship network of co-authors of Ryoung-Han Kim

This figure shows the co-authorship network connecting the top 25 collaborators of Ryoung-Han Kim. A scholar is included among the top collaborators of Ryoung-Han Kim based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ryoung-Han Kim. Ryoung-Han Kim is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kim, Ryoung-Han, et al.. (2024). Curvilinear Standard Cell Design for Semiconductor Manufacturing. IEEE Transactions on Semiconductor Manufacturing. 37(2). 152–159. 2 indexed citations
2.
Kim, Ryoung-Han, et al.. (2024). Study of EUV stochastic defect on wafer yield. 4–4. 1 indexed citations
3.
Gillijns, Werner, et al.. (2023). EUV single patterning of random logic via using bright field mask. 41–41.
4.
Gillijns, Werner, et al.. (2022). EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm. 56–56. 1 indexed citations
5.
Dey, Bappaditya, Kasem Khalil, Sandip Halder, et al.. (2020). Unsupervised machine learning based CD-SEM image segregator for OPC and process window estimation. 53–53. 5 indexed citations
6.
Gao, Weimin, Vincent Wiaux, W Hoppe, et al.. (2018). Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison. 20–20. 7 indexed citations
7.
Bekaert, Joost, Ming Mao, Ryoung-Han Kim, et al.. (2018). Single Exposure EUV of 32nm pitch logic structures: Patterning performance on BF and DF masks. 17–17. 6 indexed citations
8.
Kim, Ryoung-Han, Julien Ryckaert, Praveen Raghavan, et al.. (2017). Design and pitch scaling for affordable node transition and EUV insertion scenario. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10148. 101480V–101480V. 9 indexed citations
9.
Debacker, Peter, et al.. (2017). Large marginal 2D self-aligned via patterning for sub-5nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10148. 101480J–101480J. 1 indexed citations
10.
Kim, Ryoung-Han, et al.. (2017). 2D self-aligned via patterning strategy with EUV single-exposure in 3nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 1014321–1014321. 2 indexed citations
11.
Sun, Lei, Obert R. Wood, Yulu Chen, et al.. (2016). Thin absorber EUV photomask based on mixed Ni and TaN material. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9984. 99840G–99840G. 7 indexed citations
12.
Kim, Ryoung-Han, et al.. (2016). Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97761R–97761R. 17 indexed citations
13.
Mohanty, Nihar, Richard A. Farrell, Jeffrey Smith, et al.. (2016). LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9782. 97820Q–97820Q. 3 indexed citations
14.
Saulnier, Nicole, Wenhui Wang, Yongan Xu, et al.. (2016). Comparison of left and right side line edge roughness in lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9778. 977822–977822. 20 indexed citations
15.
Sun, Lei, Obert R. Wood, Myungjun Lee, et al.. (2014). Fourier spectrum method to determine dose-to-clear in a photoresist. Optics Letters. 39(2). 402–402.
16.
McIntyre, Gregory, Daniel Corliss, Jeremy Woods, et al.. (2011). Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 797306–797306. 4 indexed citations
17.
Kim, Ryoung-Han, et al.. (2009). 22 nm technology node active layer patterning for planar transistor devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72742X–72742X. 3 indexed citations
18.
Fontaine, Bruno La, Yunfei Deng, Ryoung-Han Kim, et al.. (2007). Extreme ultraviolet lithography: From research to manufacturing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2089–2093. 5 indexed citations
19.
Naulleau, Patrick, Christopher N. Anderson, Bruno La Fontaine, Ryoung-Han Kim, & Tom Wallow. (2007). Lithographic metrics for the determination of intrinsic resolution limits in EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65172N–65172N. 8 indexed citations
20.
Wallow, Thomas I., et al.. (2007). Progress in EUV photoresist technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6533. 653317–653317. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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