J. Pender

533 total citations
18 papers, 155 citations indexed

About

J. Pender is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, J. Pender has authored 18 papers receiving a total of 155 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 6 papers in Mechanics of Materials and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in J. Pender's work include Semiconductor materials and devices (9 papers), Plasma Diagnostics and Applications (9 papers) and Copper Interconnects and Reliability (5 papers). J. Pender is often cited by papers focused on Semiconductor materials and devices (9 papers), Plasma Diagnostics and Applications (9 papers) and Copper Interconnects and Reliability (5 papers). J. Pender collaborates with scholars based in United States, Germany and Japan. J. Pender's co-authors include M.L. Brake, Tyrone L. Vincent, James Paul Holloway, Peter L. G. Ventzek, M.E. Elta, J. P. Apruzese, J. Davis, P. Kepple, J. Holloway and Alessandro Ricci and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Physics of Plasmas.

In The Last Decade

J. Pender

17 papers receiving 149 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
J. Pender United States	7	108	62	42	19	16	18	155
D.E. Beutler United States	10	260 2.4×	32 0.5×	39 0.9×	6 0.3×	21 1.3×	26	370
R. D. Fulton United States	11	105 1.0×	97 1.6×	172 4.1×	29 1.5×	80 5.0×	28	317
Ulrich Weinert Germany	11	161 1.5×	16 0.3×	59 1.4×	9 0.5×	11 0.7×	27	314
J.S. Cable United States	10	264 2.4×	14 0.2×	20 0.5×	8 0.4×	39 2.4×	21	331
G.F. Kiuttu United States	8	61 0.6×	45 0.7×	33 0.8×	16 0.8×	79 4.9×	41	190
Esther C. Cassidy United States	9	180 1.7×	19 0.3×	90 2.1×	14 0.7×	9 0.6×	17	252
K. R. Manes United States	7	208 1.9×	35 0.6×	117 2.8×	6 0.3×	6 0.4×	12	284
Sascha Schnepp Germany	10	168 1.6×	42 0.7×	99 2.4×	10 0.5×	16 1.0×	31	237
N.M. Froberg United States	12	380 3.5×	41 0.7×	197 4.7×	6 0.3×	12 0.8×	26	438
K. Watabe Japan	10	89 0.8×	28 0.5×	224 5.3×	2 0.1×	25 1.6×	40	310

Countries citing papers authored by J. Pender

Since Specialization

Citations

This map shows the geographic impact of J. Pender's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Pender with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Pender more than expected).

Fields of papers citing papers by J. Pender

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Pender. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Pender. The network helps show where J. Pender may publish in the future.

Co-authorship network of co-authors of J. Pender

This figure shows the co-authorship network connecting the top 25 collaborators of J. Pender. A scholar is included among the top collaborators of J. Pender based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Pender. J. Pender is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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18 of 18 papers shown

Possémé, N., L. Vallier, Christophe Licitra, et al.. (2013). New fluorocarbon free chemistry proposed as solution to limit porous SiOCH film modification during etching. 1–3. 4 indexed citations

Xia, Li-Qun, et al.. (2011). Novel Hardmask for Sub-20nm Copper/Low K Backend Dual Damascene Integration. ECS Transactions. 35(4). 651–665. 3 indexed citations

Labelle, Catherine B., R. P. Srivastava, John Arnold, et al.. (2011). Plasma Etch Challenges for Porous Low k Materials for 32nm and Beyond. ECS Transactions. 34(1). 329–334. 2 indexed citations

Shi, Hua‐Tian, Huai Huang, J. Im, et al.. (2010). Minimization of plasma ashing damage to OSG low-k dielectrics. 1–3. 1 indexed citations

Shi, Hua‐Tian, Huai Huang, J. Im, et al.. (2009). Plasma altered layer model for plasma damage characterization of porous OSG films. 78–80. 4 indexed citations

Pender, J., et al.. (2005). Correlating Plasma Emissivity And Etch Depth*. 215–215.

Brake, M.L., et al.. (1999). The Gaseous Electronic Conference (GEC) reference cell as a benchmark for understanding microelectronics processing plasmas. Physics of Plasmas. 6(5). 2307–2313. 9 indexed citations

Pender, J., et al.. (1998). Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 16(3). 1464–1468. 24 indexed citations

Pender, J. & M.L. Brake. (1998). Fast, zero-dimensional simulation of radio frequency glow discharges for quick estimates of fluorine concentrations. IEEE Transactions on Plasma Science. 26(5). 1583–1585. 4 indexed citations

10.

Pender, J., et al.. (1996). Abel's inversion applied to experimental spectroscopic data with off axis peaks. Journal of Quantitative Spectroscopy and Radiative Transfer. 55(2). 231–243. 46 indexed citations

11.

Pender, J., et al.. (1996). In situ sensor of spatially resolved optical emission. IEEE Transactions on Plasma Science. 24(1). 111–112. 5 indexed citations

12.

Pender, J.. (1995). A comparison of etching conditions in the GEC reference cell to a commercial reactive ion etcher.. Deep Blue (University of Michigan). 3 indexed citations

13.

Brake, M.L., et al.. (1995). Reactive Ion Etching in the Gaseous Electronics Conference Rf Reference Cell. Journal of Research of the National Institute of Standards and Technology. 100(4). 441–441. 8 indexed citations

14.

Pender, J., et al.. (1995). In situ diagnostic for etch uniformity. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 13(4). 1930–1934. 10 indexed citations

15.

Pender, J., et al.. (1994). Optical emission spectroscopy on the GEC reference cell. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2091. 211–211. 5 indexed citations

16.

Pender, J., et al.. (1993). Radial optical emission profiles of radio frequency glow discharges. Journal of Applied Physics. 74(5). 3590–3592. 15 indexed citations

17.

Pender, J., et al.. (1992). Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges. Applied Physics Letters. 60(7). 818–820. 2 indexed citations

18.

Apruzese, J. P., P. Kepple, J. Davis, & J. Pender. (1988). Recombination lasing in heliumlike silicon: a possible path to the water window. IEEE Transactions on Plasma Science. 16(5). 529–533. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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