Vincent M. Donnelly
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- Plasma Diagnostics and Applications 136
- Semiconductor materials and devices 92
- Mechanics of Materials top 0.2%
- Metal and Thin Film Mechanics 63
- Laser-induced spectroscopy and plasma 20
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- Plasma Applications and Diagnostics 30
- Spectroscopy top 1%
- Mass Spectrometry Techniques and Applications 13
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- Ion-surface interactions and analysis 27
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- Diamond and Carbon-based Materials Research 22
- Co-authors
- Daniel FlammM. V. MalyshevDemetre J. EconomouIrving P. HermanJ. A. MuchaD. E. IbbotsonJ. R. McDonaldNicholas Fuller
- Cited by
- Electrical and Electronic EngineeringMechanics of MaterialsRadiology, Nuclear Medicine and Imaging
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (53 papers)Journal of Applied Physics (39 papers)Applied Physics Letters (16 papers)
- Partner nations
- United StatesFranceJapan
In The Last Decade
Vincent M. Donnelly
193 papers receiving 7.5k citations
Hit Papers
Peers
Comparison fields: 5 of 100
- Electrical and Electronic Engineering 6.5k
- Mechanics of Materials 2.6k
- Radiology, Nuclear Medicine and Imaging 1.6k
- Spectroscopy 841
- Atomic and Molecular Physics, and Optics 1.5k
Countries citing papers authored by Vincent M. Donnelly
This map shows the geographic impact of Vincent M. Donnelly's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vincent M. Donnelly with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vincent M. Donnelly more than expected).
Fields of papers citing papers by Vincent M. Donnelly
This network shows the impact of papers produced by Vincent M. Donnelly. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vincent M. Donnelly. The network helps show where Vincent M. Donnelly may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Vincent M. Donnelly, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 6 | |
| 2 | 2024 | 3 | |
| 3 | 2024 | 1 | |
| 4 | 2024 | 0 | |
| 5 | 2023 | 9 | |
| 6 | 2023 | 11 | |
| 7 | Decarbonization of the chemical industry through electrification: Barriers and opportunitiesbreakdown → | 2023 | 190 |
| 8 | 2021 | 4 | |
| 9 | 2020 | 22 | |
| 10 | 2019 | 8 | |
| 11 | 2019 | 12 | |
| 12 | 2015 | 15 | |
| 13 | 2012 | 11 | |
| 14 | 2007 | 6 | |
| 15 | 2006 | 25 | |
| 16 | 2006 | 29 | |
| 17 | 2002 | 9 | |
| 18 | 1999 | 118 | |
| 19 | 1998 | 88 | |
| 20 | 1993 | 35 |
About Vincent M. Donnelly
Vincent M. Donnelly is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Surfaces, Coatings and Films, having authored 194 papers that have together received 8.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (136 papers), Semiconductor materials and devices (92 papers), Metal and Thin Film Mechanics (63 papers), Plasma Applications and Diagnostics (30 papers), Ion-surface interactions and analysis (27 papers), Diamond and Carbon-based Materials Research (22 papers), Laser-induced spectroscopy and plasma (20 papers) and Mass Spectrometry Techniques and Applications (13 papers). The work is most often cited by research in Electrical and Electronic Engineering (6.5k citations), Mechanics of Materials (2.6k citations) and Radiology, Nuclear Medicine and Imaging (1.6k citations). Vincent M. Donnelly has collaborated with scholars based in United States, France and Japan. Frequent co-authors include Daniel Flamm, M. V. Malyshev, Demetre J. Economou, Irving P. Herman, J. A. Mucha, D. E. Ibbotson, J. R. McDonald, Nicholas Fuller, A. P. Baronavski and F. Kaufman. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, Applied Physics Letters, Journal of Physics D Applied Physics and Plasma Sources Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.