C. Surisetty

486 total citations
11 papers, 132 citations indexed

About

C. Surisetty is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, C. Surisetty has authored 11 papers receiving a total of 132 indexed citations (citations by other indexed papers that have themselves been cited), including 9 papers in Electrical and Electronic Engineering, 8 papers in Biomedical Engineering and 4 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in C. Surisetty's work include Advanced Surface Polishing Techniques (8 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and devices (3 papers). C. Surisetty is often cited by papers focused on Advanced Surface Polishing Techniques (8 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and devices (3 papers). C. Surisetty collaborates with scholars based in United States, Qatar and Germany. C. Surisetty's co-authors include S. V. Babu, D. Roy, R. Patlolla, P.C. Goonetilleke, B. Peethala, C.M. Pettit, Stan Tsai, D. Canaperi, James J. Kelly and R. Divakaruni and has published in prestigious journals such as Journal of The Electrochemical Society, Electrochemical and Solid-State Letters and Journal of Applied Electrochemistry.

In The Last Decade

C. Surisetty

11 papers receiving 126 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
C. Surisetty United States	8	86	84	57	32	16	11	132
Ricardo Cotrin Teixeira Brazil	7	140 1.6×	69 0.8×	53 0.9×	21 0.7×	11 0.7×	40	177
J. Neirynck United States	6	82 1.0×	81 1.0×	32 0.6×	21 0.7×	35 2.2×	10	123
S. Siddiqui United States	7	137 1.6×	38 0.5×	31 0.5×	22 0.7×	32 2.0×	18	151
C. Bowen United States	6	168 2.0×	44 0.5×	60 1.1×	42 1.3×	9 0.6×	14	211
El Mehdi Bazizi United States	8	228 2.7×	43 0.5×	37 0.6×	35 1.1×	12 0.8×	50	250
Evi Vrancken Belgium	6	173 2.0×	61 0.7×	41 0.7×	38 1.2×	7 0.4×	10	183
А. М. Орлов Russia	7	113 1.3×	21 0.3×	63 1.1×	39 1.2×	9 0.6×	49	156
Ru Han China	10	324 3.8×	75 0.9×	36 0.6×	17 0.5×	21 1.3×	31	347
A. Opdebeeck Belgium	4	119 1.4×	26 0.3×	33 0.6×	21 0.7×	8 0.5×	4	130
R.G.R. Weemaes Netherlands	6	282 3.3×	75 0.9×	98 1.7×	50 1.6×	41 2.6×	13	312

Countries citing papers authored by C. Surisetty

Since Specialization

Citations

This map shows the geographic impact of C. Surisetty's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Surisetty with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Surisetty more than expected).

Fields of papers citing papers by C. Surisetty

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Surisetty. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Surisetty. The network helps show where C. Surisetty may publish in the future.

Co-authorship network of co-authors of C. Surisetty

This figure shows the co-authorship network connecting the top 25 collaborators of C. Surisetty. A scholar is included among the top collaborators of C. Surisetty based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Surisetty. C. Surisetty is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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11 of 11 papers shown

Carr, Adra, C. Lavoie, H. van Meer, et al.. (2017). Highly-selective superconformai CVD Ti silicide process enabling area-enhanced contacts for next-generation CMOS architectures. T216–T217. 19 indexed citations

Zhang, John H., Stan Tsai, C. Surisetty, et al.. (2017). CMP Challenges for Advanced Technology Nodes beyond Si. MRS Advances. 2(51). 2891–2902. 1 indexed citations

Patlolla, R., et al.. (2017). Cleaning Solutions for Ultrathin Co Barriers for Advanced Technology Nodes. ECS Journal of Solid State Science and Technology. 6(9). P671–P680. 25 indexed citations

Tsai, Stan, H. P. Amanapu, Ruilong Xie, et al.. (2017). CMP: Consideration of Stop-on Selectivity in Advanced Node Semiconductor Manufacturing Technology. ECS Transactions. 77(4). 169–177. 3 indexed citations

Zhang, John H., Andrew Greene, Ruilong Xie, et al.. (2017). CMP Challenges for Advanced Technology Nodes. MRS Advances. 2(44). 2361–2372. 8 indexed citations

Cheng, Kangguo, C. Surisetty, Raja Muthinti, et al.. (2016). Air spacer for 10nm FinFET CMOS and beyond. 17.1.1–17.1.4. 20 indexed citations

Kelly, James J., C. Surisetty, & D. Canaperi. (2012). Experimental study of copper leveling additives and their wafer and pattern-scale effect on copper planarization. Comptes Rendus Chimie. 16(1). 15–20. 4 indexed citations

Pettit, C.M., et al.. (2011). Electrochemical investigation of the roles of oxyanions in chemical–mechanical planarization of tantalum and tantalum nitride. Journal of Applied Electrochemistry. 41(5). 561–576. 11 indexed citations

Surisetty, C., B. Peethala, D. Roy, & S. V. Babu. (2010). Utility of Oxy-Anions for Selective Low Pressure Polishing of Cu and Ta in Chemical Mechanical Planarization. Electrochemical and Solid-State Letters. 13(7). H244–H244. 9 indexed citations

10.

Surisetty, C., et al.. (2008). Dissolution Inhibition in Cu-CMP Using Dodecyl-Benzene-Sulfonic Acid Surfactant with Oxalic Acid and Glycine as Complexing Agents. Journal of The Electrochemical Society. 155(12). H971–H971. 17 indexed citations

11.

Surisetty, C., et al.. (2008). Oxalic-Acid-Based Slurries with Tunable Selectivity for Copper and Tantalum Removal in CMP. Electrochemical and Solid-State Letters. 11(3). H66–H66. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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