Mark J. Kushner

23.4k total citations · 4 hit papers
453 papers, 17.2k citations indexed

About

Mark J. Kushner is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging and Mechanics of Materials. According to data from OpenAlex, Mark J. Kushner has authored 453 papers receiving a total of 17.2k indexed citations (citations by other indexed papers that have themselves been cited), including 406 papers in Electrical and Electronic Engineering, 162 papers in Radiology, Nuclear Medicine and Imaging and 140 papers in Mechanics of Materials. Recurrent topics in Mark J. Kushner's work include Plasma Diagnostics and Applications (289 papers), Plasma Applications and Diagnostics (162 papers) and Electrohydrodynamics and Fluid Dynamics (96 papers). Mark J. Kushner is often cited by papers focused on Plasma Diagnostics and Applications (289 papers), Plasma Applications and Diagnostics (162 papers) and Electrohydrodynamics and Fluid Dynamics (96 papers). Mark J. Kushner collaborates with scholars based in United States, South Korea and France. Mark J. Kushner's co-authors include Natalia Yu. Babaeva, Shahid Rauf, Rajesh Dorai, Wei Tian, Amanda Lietz, Robert J. Hoekstra, Timothy J. Sommerer, Eric Johnsen, Seth Norberg and Peter L. G. Ventzek and has published in prestigious journals such as Proceedings of the National Academy of Sciences, Environmental Science & Technology and Applied Physics Letters.

In The Last Decade

Mark J. Kushner

434 papers receiving 16.2k citations

Hit Papers

align trajectories sort by overperformance

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

The 2012 Plasma Roadmap

2012 530 citations Mark J. Kushner et al. Journal of Physics D Applied Physics profile →
A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon

1988 394 citations Mark J. Kushner profile →
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

2009 314 citations Mark J. Kushner Journal of Physics D Applied Physics profile →
Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue

2014 296 citations Mark J. Kushner et al. Journal of Physics D Applied Physics profile →

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author						Papers	Cites
Mark J. Kushner	14.3k	7.7k	3.6k	3.5k	3.1k	453	17.2k
David B. Graves	11.9k 0.8×	8.1k 1.1×	2.9k 0.8×	2.9k 0.8×	2.5k 0.8×	287	16.6k
Vincent M. Donnelly	6.5k 0.5×	1.6k 0.2×	2.6k 0.7×	1.9k 0.5×	1.5k 0.5×	194	8.0k
Zoran Petrović	6.3k 0.4×	2.9k 0.4×	2.2k 0.6×	1.2k 0.3×	3.0k 1.0×	349	8.5k
Kunihide Tachibana	3.8k 0.3×	2.3k 0.3×	788 0.2×	1.2k 0.3×	2.0k 0.6×	190	6.0k
Jean-Pierre Bœuf	9.6k 0.7×	4.5k 0.6×	1.1k 0.3×	959 0.3×	2.8k 0.9×	208	10.9k
Uwe Kortshagen	7.2k 0.5×	1.5k 0.2×	999 0.3×	8.3k 2.4×	2.5k 0.8×	279	13.1k
Demetre J. Economou	4.9k 0.3×	1.7k 0.2×	1.8k 0.5×	1.0k 0.3×	1.1k 0.4×	178	5.5k
В. Ф. Тарасенко	5.5k 0.4×	4.8k 0.6×	615 0.2×	821 0.2×	1.1k 0.4×	742	7.1k
Andreas Mandelis	2.9k 0.2×	1.1k 0.1×	6.9k 1.9×	1.6k 0.5×	1.2k 0.4×	564	10.9k
Daniel Flamm	4.0k 0.3×	485 0.1×	1.2k 0.3×	1.5k 0.4×	1.5k 0.5×	141	5.6k

Countries citing papers authored by Mark J. Kushner

Since Specialization

Citations

This map shows the geographic impact of Mark J. Kushner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark J. Kushner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark J. Kushner more than expected).

Fields of papers citing papers by Mark J. Kushner

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark J. Kushner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark J. Kushner. The network helps show where Mark J. Kushner may publish in the future.

Co-authorship network of co-authors of Mark J. Kushner

This figure shows the co-authorship network connecting the top 25 collaborators of Mark J. Kushner. A scholar is included among the top collaborators of Mark J. Kushner based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mark J. Kushner. Mark J. Kushner is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Kushner, Mark J., et al.. (2025). 2D photofragmentation LIF imaging of H ₂ O ₂ and HO ₂ in the effluent of an atmospheric-pressure plasma jet: effects of solid and liquid interfaces. Journal of Physics D Applied Physics. 58(43). 435205–435205.

Nam, Sang Ki, et al.. (2025). Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 43(3). 1 indexed citations

Kushner, Mark J., et al.. (2025). Two-dimensional mapping of absolute OH densities in an atmospheric pressure plasma effluent via planar laser-induced fluorescence: effects of He/H₂O and He/O₂ mixtures in N₂ and air, with and without solid targets. Journal of Physics D Applied Physics. 58(17). 175205–175205. 2 indexed citations

Gunn, J.P., et al.. (2024). Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF₃ mixtures. Journal of Physics D Applied Physics. 57(43). 435202–435202.

Luan, Pingshan, et al.. (2024). Autonomous hybrid optimization of a SiO2 plasma etching mechanism. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(4). 2 indexed citations

Diomede, P., Andrew Gibson, Vasco Guerra, et al.. (2024). Low-pressure inductively coupled plasmas in hydrogen: impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states. Plasma Sources Science and Technology. 33(2). 25002–25002. 6 indexed citations

Alves, L. L., Markus M. Becker, Jan van Dijk, et al.. (2023). Foundations of plasma standards. Plasma Sources Science and Technology. 32(2). 23001–23001. 25 indexed citations

Stapelmann, Katharina, et al.. (2023). Reaction mechanism for atmospheric pressure plasma treatment of cysteine in solution. Journal of Physics D Applied Physics. 56(39). 395205–395205. 3 indexed citations

Lee, Hyunjae, et al.. (2022). Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(1). 11 indexed citations

10.

Nam, Sang Ki, et al.. (2022). Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 40(5). 4 indexed citations

11.

Lee, Hyunjae, et al.. (2021). Electric field reversals resulting from voltage waveform tailoring in Ar/O ₂ capacitively coupled plasmas sustained in asymmetric systems. Plasma Sources Science and Technology. 30(8). 85002–85002. 14 indexed citations

12.

Nam, Sang Ki, et al.. (2020). Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(2). 21 indexed citations

13.

Huang, Shuo, Seung‐Bo Shim, Sang Ki Nam, & Mark J. Kushner. (2020). Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(2). 34 indexed citations

14.

Huang, Shuo, et al.. (2019). Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 37(3). 84 indexed citations

15.

Gibson, Andrew, Jason D. Flatt, Rod Boswell, et al.. (2018). Spatio-temporal plasma heating mechanisms in a radio frequency electrothermal microthruster. Plasma Sources Science and Technology. 27(8). 85011–85011. 10 indexed citations

16.

Babaeva, Natalia Yu., G V Naĭdis, & Mark J. Kushner. (2018). Interaction of positive streamers in air with bubbles floating on liquid surfaces: conductive and dielectric bubbles. Plasma Sources Science and Technology. 27(1). 15016–15016. 21 indexed citations

17.

Zidan, Mohammed A., YeonJoo Jeong, Jihang Lee, et al.. (2018). A general memristor-based partial differential equation solver. Nature Electronics. 1(7). 411–420. 201 indexed citations

18.

Lafleur, Trevor, et al.. (2017). Enhanced control of the ionization rate in radio-frequency plasmas with structured electrodes via tailored voltage waveforms. Plasma Sources Science and Technology. 26(12). 125005–125005. 20 indexed citations

19.

Kushner, Mark J., et al.. (2011). Observations of electric discharge streamer propagation and capillary oscillations on the surface of air bubbles in water. Deep Blue (University of Michigan).

20.

Bhoj, Ananth & Mark J. Kushner. (2004). Avalanche process in an idealized lamp: II. Modelling of breakdown in Ar/Xe electric discharges. Journal of Physics D Applied Physics. 37(18). 2510–2526. 34 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact