Andreas Knorr

1.7k total citations
23 papers, 273 citations indexed

About

Andreas Knorr is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Andreas Knorr has authored 23 papers receiving a total of 273 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 7 papers in Atomic and Molecular Physics, and Optics and 6 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Andreas Knorr's work include Semiconductor materials and devices (12 papers), Copper Interconnects and Reliability (6 papers) and 2D Materials and Applications (4 papers). Andreas Knorr is often cited by papers focused on Semiconductor materials and devices (12 papers), Copper Interconnects and Reliability (6 papers) and 2D Materials and Applications (4 papers). Andreas Knorr collaborates with scholars based in United States, Germany and Japan. Andreas Knorr's co-authors include Rohit Galatage, Ali Razavieh, Zoran Krivokapić, Ahmedullah Aziz, Jiajun Shi, Ajey P. Jacob, Ryan Sporer, Johannes Müller, Walter Kleemeier and Claudy Serrao and has published in prestigious journals such as Physical Review Letters, Nature Communications and Journal of The Electrochemical Society.

In The Last Decade

Andreas Knorr

19 papers receiving 259 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Andreas Knorr United States 6 251 104 27 21 20 23 273
Elke Erben Germany 12 347 1.4× 170 1.6× 44 1.6× 9 0.4× 12 0.6× 31 364
Mitsuhiro Omura Japan 8 169 0.7× 90 0.9× 20 0.7× 24 1.1× 51 2.5× 17 198
Seiji Inumiya Japan 9 286 1.1× 42 0.4× 27 1.0× 26 1.2× 17 0.8× 47 302
Tomasz Brożek United States 9 273 1.1× 48 0.5× 26 1.0× 20 1.0× 11 0.6× 76 292
C. Arvet France 10 223 0.9× 44 0.4× 24 0.9× 16 0.8× 61 3.0× 28 230
Rich Wise United States 5 184 0.7× 54 0.5× 21 0.8× 36 1.7× 25 1.3× 16 194
Ihor Brunets Netherlands 7 105 0.4× 50 0.5× 12 0.4× 11 0.5× 22 1.1× 26 118
Rusty Harris United States 10 299 1.2× 64 0.6× 19 0.7× 16 0.8× 32 1.6× 27 313
Katsunori Onishi United States 5 358 1.4× 118 1.1× 52 1.9× 27 1.3× 6 0.3× 10 369
P. Mortini France 10 335 1.3× 50 0.5× 21 0.8× 8 0.4× 12 0.6× 33 343

Countries citing papers authored by Andreas Knorr

Since Specialization
Citations

This map shows the geographic impact of Andreas Knorr's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andreas Knorr with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andreas Knorr more than expected).

Fields of papers citing papers by Andreas Knorr

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andreas Knorr. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andreas Knorr. The network helps show where Andreas Knorr may publish in the future.

Co-authorship network of co-authors of Andreas Knorr

This figure shows the co-authorship network connecting the top 25 collaborators of Andreas Knorr. A scholar is included among the top collaborators of Andreas Knorr based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Andreas Knorr. Andreas Knorr is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Bertolotti, M., Chiara Trovatello, Xiaoyang Zhu, et al.. (2026). Dissecting intervalley coupling mechanisms in monolayer transition metal dichalcogenides. npj 2D Materials and Applications. 10(1). 21–21.
2.
Pugžlys, A., et al.. (2025). Nonlinear Transmission of Strong THz‐Electric Fields Through Thin Gold Films. Advanced Optical Materials. 13(35). 1 indexed citations
3.
4.
Greben, Kyrylo, Qing Cao, Kenji Watanabe, et al.. (2025). Revealing hidden interlayer excitons in 2D bilayers via hybrid molecular gating. Nature Communications. 16(1). 9893–9893. 1 indexed citations
5.
Watanabe, Kenji, Takashi Taniguchi, Cornelius Gahl, et al.. (2025). Ultrafast Optical Control of Rashba Interactions in a TMDC Heterostructure. Physical Review Letters. 134(2). 26901–26901. 5 indexed citations
6.
Schäfer, F. P., Christian Fuchs, Kenji Watanabe, et al.. (2025). Distinct Rabi splitting in confined systems of MoSe2 monolayers and (Ga,In)As quantum wells. Nature Communications. 16(1). 8109–8109. 1 indexed citations
7.
Selig, Malte, et al.. (2025). Theory of nonlinear electron relaxation in thin gold films and their signatures in optical observables. Physical review. B.. 112(24). 1 indexed citations
8.
Mazurier, J., et al.. (2023). 22FDXⓇ EDMOS for 5G mmW Power Amplifier Applications. 301–304. 2 indexed citations
9.
Chen, Tianbing, et al.. (2023). 22FDX® Device Optimization for mmW PA. 105–108.
10.
Singh, Jagar, S. Cimino, Jeffrey B. Johnson, et al.. (2021). FinFET LDMOS technology challenges and opportunities for digital TV and 6GHz WiFi PA applications. Symposium on VLSI Technology. 1–2. 4 indexed citations
11.
Mochizuki, Shinichi, Richard G. Southwick, J. Li, et al.. (2017). A comparative study of strain and Ge content in Si<inf>1−x</inf>Ge<inf>x</inf> channel using planar FETs, FinFETs, and strained relaxed buffer layer FinFETs. 37.2.1–37.2.4. 20 indexed citations
12.
Krivokapić, Zoran, Rohit Galatage, Ali Razavieh, et al.. (2017). 14nm Ferroelectric FinFET technology with steep subthreshold slope for ultra low power applications. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 15.1.1–15.1.4. 183 indexed citations
13.
Knorr, Andreas, et al.. (2005). Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric. MRS Proceedings. 863. 2 indexed citations
14.
Knorr, Andreas, et al.. (2005). Reduction of the initial defect density and improvement of the reliability of Cu/low-k structures by a methylating treatment. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(5). 2222–2225. 2 indexed citations
15.
White, Brian E., et al.. (2005). Dual damascene ash development for a VFTL of target k=2.0 integration. Microelectronic Engineering. 82(3-4). 348–355. 9 indexed citations
16.
Knorr, Andreas, et al.. (2004). Vertically Self-Aligned Buried Junction Formation for Ultrahigh-Density DRAM Applications. IEEE Electron Device Letters. 25(5). 259–261.
17.
Bian, Zailong, Andreas Knorr, Alain E. Kaloyeros, et al.. (2000). Material and process studies in the integration of plasma-promoted chemical-vapor deposition of aluminum with benzocyclobutene low-dielectric constant polymer. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(1). 252–261. 5 indexed citations
18.
Shaffer, Edward O., M. E. Mills, David D. Hawn, et al.. (1998). Adhesion Energy Measurements of Multilayer Low-K Dielectric Materials for ULSI Applications. MRS Proceedings. 511. 10 indexed citations
19.
Goldberg, Cindy, A. Upham, Andreas Knorr, et al.. (1998). The Effects of Processing Parameters in the Low‐Temperature Chemical Vapor Deposition of Titanium Nitride from Tetraiodotitanium. Journal of The Electrochemical Society. 145(2). 676–683. 10 indexed citations
20.
Knorr, Andreas, et al.. (1997). Integrated plasma-promoted chemical vapor deposition route to aluminum interconnect and plug technologies for emerging computer chip metallization. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(5). 1758–1766. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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