S. Ponoth

1.1k total citations
29 papers, 498 citations indexed

About

S. Ponoth is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Biomedical Engineering. According to data from OpenAlex, S. Ponoth has authored 29 papers receiving a total of 498 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 10 papers in Electronic, Optical and Magnetic Materials and 8 papers in Biomedical Engineering. Recurrent topics in S. Ponoth's work include Semiconductor materials and devices (14 papers), Copper Interconnects and Reliability (10 papers) and Photonic and Optical Devices (8 papers). S. Ponoth is often cited by papers focused on Semiconductor materials and devices (14 papers), Copper Interconnects and Reliability (10 papers) and Photonic and Optical Devices (8 papers). S. Ponoth collaborates with scholars based in United States, France and Switzerland. S. Ponoth's co-authors include John B. McLaughlin, P. D. Persans, Joel L. Plawsky, Svetlana Rogojevic, E. Simonyi, M. Tomozawa, W. N. Gill, A. K. Jain, Sidney Cohen and J. R. Lloyd and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemical Engineering Science.

In The Last Decade

S. Ponoth

28 papers receiving 483 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
S. Ponoth United States 11 275 157 142 127 74 29 498
M. C. Peignon France 12 362 1.3× 71 0.5× 186 1.3× 129 1.0× 38 0.5× 16 531
Carlos Guerra‐Nuñez Switzerland 17 323 1.2× 54 0.3× 334 2.4× 76 0.6× 56 0.8× 25 585
J. Chapple-Sokol United States 11 274 1.0× 69 0.4× 285 2.0× 89 0.7× 20 0.3× 22 546
Janusz Jaglarz Poland 12 240 0.9× 25 0.2× 223 1.6× 62 0.5× 53 0.7× 61 451
Nobuhiro Ishikawa Japan 13 164 0.6× 80 0.5× 257 1.8× 102 0.8× 60 0.8× 64 523
Emil Agócs Hungary 12 149 0.5× 61 0.4× 158 1.1× 109 0.9× 49 0.7× 44 334
Steven Verhaverbeke United States 12 412 1.5× 62 0.4× 208 1.5× 155 1.2× 37 0.5× 50 558
Z. A. Sechrist United States 7 457 1.7× 103 0.7× 582 4.1× 88 0.7× 13 0.2× 9 758
A. Axelevitch Israel 11 403 1.5× 138 0.9× 321 2.3× 171 1.3× 38 0.5× 48 630
S. I. Pavlov Russia 11 195 0.7× 95 0.6× 244 1.7× 176 1.4× 19 0.3× 64 464

Countries citing papers authored by S. Ponoth

Since Specialization
Citations

This map shows the geographic impact of S. Ponoth's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Ponoth with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Ponoth more than expected).

Fields of papers citing papers by S. Ponoth

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Ponoth. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Ponoth. The network helps show where S. Ponoth may publish in the future.

Co-authorship network of co-authors of S. Ponoth

This figure shows the co-authorship network connecting the top 25 collaborators of S. Ponoth. A scholar is included among the top collaborators of S. Ponoth based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Ponoth. S. Ponoth is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hook, Terence B., Kangguo Cheng, B. Doris, et al.. (2013). Fully-depleted planar technologies and static RAM. 1 indexed citations
2.
Khakifirooz, A., Kangguo Cheng, Toshiharu Nagumo, et al.. (2012). Extremely thin SOI for system-on-chip applications. 1–4. 4 indexed citations
3.
Vinet, M., Arvind Kumar, L. Grenouillet, et al.. (2012). Enabling the use of ion implantation for ultra-thin FDSOI n-MOSFETs. 42. 1–2. 1 indexed citations
4.
Khakifirooz, A., Kangguo Cheng, A. Reznicek, et al.. (2011). Scalability of Extremely Thin SOI (ETSOI) MOSFETs to Sub-20-nm Gate Length. IEEE Electron Device Letters. 33(2). 149–151. 30 indexed citations
5.
Schwarzenbach, W., Nicolas Daval, B.-Y. Nguyen, et al.. (2011). Ultra-thin SOI for 20nm node and beyond. 35. 1–2. 1 indexed citations
6.
Grenouillet, L., N. Possémé, S. Ponoth, et al.. (2011). Enabling epitaxy on ultrathin implanted SOI. 1 indexed citations
7.
Hook, Terence B., M. Vinet, Richard Murphy, S. Ponoth, & L. Grenouillet. (2011). Transistor matching and silicon thickness variation in ETSOI technology. 5.7.1–5.7.4. 10 indexed citations
8.
Nitta, S., D. Edelstein, S. Ponoth, et al.. (2008). Performance and reliability of airgaps for advanced BEOL Interconnects. 191–192. 14 indexed citations
9.
Lloyd, J. R., Conal E. Murray, S. Ponoth, Sidney Cohen, & E. Liniger. (2006). The effect of Cu diffusion on the TDDB behavior in a low-k interlevel dielectrics. Microelectronics Reliability. 46(9-11). 1643–1647. 39 indexed citations
10.
Iijima, Takashi, Qinghuang Lin, Catherine B. Labelle, et al.. (2006). BEOL Integration of Highly Damage -Resistant Porous Ultra Low-K Material Using Direct CMP and Via-first Process. 21–23. 4 indexed citations
11.
Tseng, Wei‐Tsu, Akihisa Sakamoto, S. Ponoth, et al.. (2006). Chemical-Mechanical Polishing of SiCOH-Based Low-k Dielectrics. ECS Meeting Abstracts. MA2006-01(9). 397–397. 1 indexed citations
12.
Ponoth, S., et al.. (2004). Plasma silicon oxide–silica xerogel based planar optical waveguides. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(3). 902–908. 3 indexed citations
13.
Ponoth, S., et al.. (2003). Fabrication of controlled sidewall angles in thin films using isotropic etches. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(4). 1240–1247. 8 indexed citations
14.
Ponoth, S., et al.. (2003). Siloxane-based polymer epoxies for optical waveguides. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5260. 331–331. 3 indexed citations
15.
Ponoth, S.. (2003). Silicon-CMOS BEOL compatible material systems and processing for on-chip optical interconnect components. 1 indexed citations
16.
Jain, Anurag, Svetlana Rogojevic, S. Ponoth, et al.. (2002). Processing dependent thermal conductivity of nanoporous silica xerogel films. Journal of Applied Physics. 91(5). 3275–3281. 49 indexed citations
17.
Ponoth, S., et al.. (2002). Optimized oxygen plasma etching of polyimide films for low loss optical waveguides. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(5). 1587–1591. 30 indexed citations
18.
Jain, A. K., Svetlana Rogojevic, S. Ponoth, et al.. (2001). Porous silica materials as low-k dielectrics for electronic and optical interconnects. Thin Solid Films. 398-399. 513–522. 147 indexed citations
19.
Ponoth, S. & John B. McLaughlin. (2000). Numerical simulation of mass transfer for bubbles in water. Chemical Engineering Science. 55(7). 1237–1255. 73 indexed citations
20.
Huang, Xuefeng, P. D. Persans, Joel L. Plawsky, et al.. (1999). Optical Properties of a Polyimide for Waveguide Applications in On-Chip Interconnects. MRS Proceedings. 597. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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