Jeffrey Smith

457 citations

15 papers · 369 indexed · h-index 7

Impact in

Electrical and Electronic Engineering
- Semiconductor materials and devices
- Advancements in Photolithography Techniques
- Ferroelectric and Negative Capacitance Devices
Surfaces, Coatings and Films

Papers in

Surfaces, Coatings and Films 3
Electrical and Electronic Engineering 14
- Semiconductor materials and devices 9
- Advancements in Photolithography Techniques 6
- Advancements in Semiconductor Devices and Circuit Design 5
- 3D IC and TSV technologies 4
- Integrated Circuits and Semiconductor Failure Analysis 2

Co-authors: Robert D. Clark G. J. Leusink Steven Consiglio Cory S. Wajda Kandabara Tapily Chris Bencher Joy Cheng Daniel P. Sanders
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)APL Materials (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (6 papers)2021 IEEE International Electron Devices Meeting (IEDM) (1 paper)
Partner nations: United States Japan Belgium

In The Last Decade

Jeffrey Smith

13 papers receiving 364 citations

Peers

Countries citing papers authored by Jeffrey Smith

Since Specialization

Citations

This map shows the geographic impact of Jeffrey Smith's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey Smith with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey Smith more than expected).

Fields of papers citing papers by Jeffrey Smith

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey Smith. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey Smith. The network helps show where Jeffrey Smith may publish in the future.

Co-authors

The 25 scholars most cited alongside Jeffrey Smith, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Jeffrey Smith Line = papers co-authored together Jeffrey Smith links everyone, so they are left out of the graph.

All Works

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15 of 15 papers shown

#	Work
1	CFET Design Options, Challenges, and Opportunities for 3D Integration 2021 IEEE International Electron Devices Meeting (IEDM) ·Lars W. Liebmann, Jeffrey Smith, D. Chanemougame, M. C. Banda	2021	20
2	Agile Pathfinding Technology Prototyping: the Hunt for Directional Correctness D. Chanemougame, Jeffrey Smith, M. C. Banda, Мелто Татьяна Леонидовна, Lars W. Liebmann	2020	1
3	DTCO acceleration to fight scaling stagnation Lars W. Liebmann, D. Chanemougame, Jucilene da Silva Souza, Jonathan Cobb, Chia-Tung Ho, Victor Moroz, Jeffrey Smith	2020	9
4	Plasma etch selectivity study and material screening for self-aligned gate contact (SAGC) D. Radisic, M. Demand, Geovana Rodrigues Cavalcanti, S. Demuynck, 幸祐栄徳, Andrew Metz, Lieve Teugels, 尚美中村, Jeffrey Smith, Farid Sebaai, T. Hopf, Efrain Altamirano Sánchez	2019	2
5	Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors (Conference Presentation) Filipic Miha, Yusuke Oniki, A. Deermann, Fisca Mawa’ Pangraran, Qi Wang, Frank Holsteyns, Jeffrey Smith, H. Audemard, 幸祐栄徳, Juergen Boemmels, Julien Ryckaert, Ye Xing, Trace Hurd	2019	2
6	Perspective: New process technologies required for future devices and scaling APL Materials ·Robert D. Clark, Kandabara Tapily, Silvia Franchino, 秀夫戸田, Steven Consiglio, Daniel Jesper, Cory S. Wajda, Jeffrey Smith, G. J. Leusink	2018	154
7	Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning Ednaldo F Silva Filho, Monali Gangurde, Jeffrey Smith, Xinghua Sun, Richard J. Farrell, Jeffrey C. Shearer, Yongan Xu, Natasha Sena, Andrew Metz, Ye Xing, K G Prashanth, John Arnold, Nelson Felix	2018	3
8	Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning Journal of Micro/Nanolithography MEMS and MOEMS ·Ednaldo F Silva Filho, Monali Gangurde, Jeffrey Smith, Xinghua Sun, Richard A. Farrell, Jeffrey C. Shearer, Yongan Xu, Natasha Sena, Andrew Metz, Ye Xing, K G Prashanth, John Arnold, Nelson Felix	2018	5
9	Thin Film Process Technologies for Continued Scaling Robert D. Clark, Kandabara Tapily, S. Muhammed Mubeez, 秀夫戸田, Steven Consiglio, Daniel Jesper, Cory S. Wajda, Jeffrey Smith, Gert J. Leusink	2018	1
10	Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ednaldo F Silva Filho, Nihar Mohanty, Xinghua Sun, Richard A. Farrell, Jeffrey Smith, Natasha Sena, Andrew Metz, Ye Xing, K G Prashanth	2017	6
11	EPE improvement thru self-alignment via multi-color material integration Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Jeffrey Smith, Hermann Pilabré, Fisca Mawa’ Pangraran, Ednaldo F Silva Filho, Filipic Miha, Carlos Fonseca, Xinghua Sun, Ryan L. Burns, Richard A. Farrell, Pittman Lynn, Andrew Metz, Natasha Sena, Alejandro E. Alvarez, Ye Xing, Lister Arruda Modesto dos Santos	2017	9
12	LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Richard A. Farrell, Leonardo Jair Barón Salazar, Filipic Miha, Tiantian Xue, Jeffrey Smith, Natasha Sena, K G Prashanth, Ye Xing, Lei Sun, Solanke Bansal, Erik R. Hosler, 名城浄子, Wenhui Wang, Catherine B. Labelle, Ryoung-Han Kim	2016	3
13	Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Tiantian Xue, Eric Liu, Ednaldo F Silva Filho, Jeffrey Smith, Richard A. Farrell, Mingmei Wang, Wu Yi, 高艳铃, Natasha Sena, 幸祐栄徳, Alok Ranjan, Daniel Jesper, Burcu Toydemir, Alejandro E. Alvarez, Lister Arruda Modesto dos Santos, Ye Xing	2015	11
14	Directed self-assembly defectivity assessment. Part II Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chris Bencher, He Yi, Lee Boon Ang, Jenny Pery, Jeffrey Smith, Julieta Suarez Cao, Al Lauder, Daranee Versluis-Tantbirojn, M. Baumert, Oliver Bröker, Huixiong Dai, Joy Cheng, Daniel P. Sanders, Shishir Pratap Singh, Steven J. Holmes	2012	54
15	Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chris Bencher, Jeffrey Smith, Julieta Suarez Cao, E. N. Mohov, Yongmei Chen, Joy Cheng, Daniel P. Sanders, Shishir Pratap Singh, Hoa D. Truong, Steven J. Holmes, William D. Hinsberg	2011	89

About Jeffrey Smith

Jeffrey Smith is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Biomedical Engineering, Electronic, Optical and Magnetic Materials and Industrial and Manufacturing Engineering, having authored 15 papers that have together received 369 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), Advancements in Photolithography Techniques (6 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers), 3D IC and TSV technologies (4 papers), Advanced Surface Polishing Techniques (3 papers), Copper Interconnects and Reliability (2 papers), Integrated Circuits and Semiconductor Failure Analysis (2 papers) and Nanofabrication and Lithography Techniques (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (296 citations), Surfaces, Coatings and Films (35 citations), Materials Chemistry (210 citations), Electronic, Optical and Magnetic Materials (52 citations) and Biomedical Engineering (91 citations). Jeffrey Smith has collaborated with scholars based in United States, Japan and Belgium. Frequent co-authors include Robert D. Clark, G. J. Leusink, Steven Consiglio, Cory S. Wajda, Kandabara Tapily, Chris Bencher, Joy Cheng, Daniel P. Sanders, Steven J. Holmes and Hoa D. Truong. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, APL Materials, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and 2021 IEEE International Electron Devices Meeting (IEDM).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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