Helen Maynard

819 total citations
26 papers, 515 citations indexed

About

Helen Maynard is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Helen Maynard has authored 26 papers receiving a total of 515 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 8 papers in Electronic, Optical and Magnetic Materials and 5 papers in Mechanics of Materials. Recurrent topics in Helen Maynard's work include Semiconductor materials and devices (16 papers), Copper Interconnects and Reliability (7 papers) and Plasma Diagnostics and Applications (7 papers). Helen Maynard is often cited by papers focused on Semiconductor materials and devices (16 papers), Copper Interconnects and Reliability (7 papers) and Plasma Diagnostics and Applications (7 papers). Helen Maynard collaborates with scholars based in United States, China and Singapore. Helen Maynard's co-authors include Jeremy P. Meyers, N. Hershkowitz, N. Layadi, James W. Taylor, Ji Cheng Ding, Gon‐Ho Kim, D. E. Ibbotson, Catherine B. Labelle, F. Klemens and Jun S. Lee and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Journal of Power Sources.

In The Last Decade

Helen Maynard

24 papers receiving 490 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Helen Maynard United States 11 462 198 130 83 80 26 515
Lars Banko Germany 11 195 0.4× 117 0.6× 195 1.5× 91 1.1× 55 0.7× 29 427
Jeong Woo Shin South Korea 16 278 0.6× 118 0.6× 381 2.9× 155 1.9× 76 0.9× 52 711
Asghar Ali India 11 316 0.7× 134 0.7× 108 0.8× 30 0.4× 83 1.0× 52 594
Keh-Moh Lin Taiwan 15 338 0.7× 72 0.4× 326 2.5× 22 0.3× 67 0.8× 41 519
Hans Joachim Möller Germany 11 395 0.9× 107 0.5× 190 1.5× 28 0.3× 106 1.3× 29 493
Siva Sivoththaman Canada 10 283 0.6× 95 0.5× 225 1.7× 19 0.2× 146 1.8× 52 477
Akimori Tabata Japan 14 417 0.9× 42 0.2× 258 2.0× 29 0.3× 44 0.6× 46 506
Ralf Thiedmann Germany 9 707 1.5× 138 0.7× 395 3.0× 16 0.2× 117 1.5× 15 898
Julio César Sagás Brazil 13 266 0.6× 83 0.4× 270 2.1× 176 2.1× 42 0.5× 53 526
Yongfeng Ni China 12 167 0.4× 44 0.2× 150 1.2× 23 0.3× 61 0.8× 17 393

Countries citing papers authored by Helen Maynard

Since Specialization
Citations

This map shows the geographic impact of Helen Maynard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Helen Maynard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Helen Maynard more than expected).

Fields of papers citing papers by Helen Maynard

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Helen Maynard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Helen Maynard. The network helps show where Helen Maynard may publish in the future.

Co-authorship network of co-authors of Helen Maynard

This figure shows the co-authorship network connecting the top 25 collaborators of Helen Maynard. A scholar is included among the top collaborators of Helen Maynard based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Helen Maynard. Helen Maynard is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Li, Haoyu, et al.. (2017). Characterization of hot N-type plasma doping (PLAD) implantation. 54–57. 1 indexed citations
2.
Lee, Jun S., et al.. (2014). Plasma doping of high aspect ratio structures. 1–4. 7 indexed citations
3.
Tang, Shan, et al.. (2014). A plasma doping process for 3D finFET source/drain extensions. 1–4. 5 indexed citations
4.
Lee, Jun, et al.. (2014). FinFET multi-Vt tuning with metal gate work function modulation by plasma doping. 1–3. 7 indexed citations
5.
Downey, Ronald G., et al.. (2014). Exploration of PLAD aluminum implants for work function adjustment. 5. 1–4.
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Maynard, Helen, et al.. (2003). Embedded organic low-κ structures for sub-0.18 μm CMOS VLSI MLM: integration and etching issues. 212–214. 1 indexed citations
10.
Meyers, Jeremy P. & Helen Maynard. (2002). Design considerations for miniaturized PEM fuel cells. Journal of Power Sources. 109(1). 76–88. 157 indexed citations
11.
Kopf, R. F., D. C. Jacobson, A. Tate, et al.. (2002). Thin-film resistor fabrication for InP technology applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(3). 871–875. 10 indexed citations
12.
Chang, C.-P., F. Klemens, Helen Maynard, et al.. (1997). Polycide gate etching using a helical resonator on an applied materials precision 5000 platform. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(3). 646–651. 2 indexed citations
13.
Maynard, Helen, et al.. (1996). Plasma Etching Endpointing by Monitoring Radio‐Frequency Power Systems with an Artificial Neural Network. Journal of The Electrochemical Society. 143(6). 2029–2035. 14 indexed citations
14.
Labelle, Catherine B., et al.. (1996). Metal stack etching using a helical resonator plasma. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(4). 2574–2581. 15 indexed citations
15.
Layadi, N., K. Guinn, Helen Maynard, et al.. (1996). Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, uniformity, profile control, and bulk plasma properties in a helical resonator plasma source. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(4). 2510–2518. 8 indexed citations
16.
Maynard, Helen & N. Hershkowitz. (1995). Thin-film interferometry of patterned surfaces. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(3). 848–857. 8 indexed citations
17.
Weidman, Timothy W., Olivier Joubert, Edwin A. Chandross, et al.. (1995). All Dry Lithography: Applications of Plasma Polymerized Methylsilane as aSingle Layer Resist and Silicon Dioxide Precursor.. Journal of Photopolymer Science and Technology. 8(4). 679–686. 6 indexed citations
18.
Meyer, J. A., et al.. (1994). Experiments with back side gas cooling using an electrostatic wafer holder in an electron cyclotron resonance etching tool. Applied Physics Letters. 64(15). 1926–1928. 17 indexed citations
19.
Hershkowitz, N. & Helen Maynard. (1993). Plasma characterization and process control diagnostics. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(4). 1172–1178. 14 indexed citations
20.
Ding, Ji Cheng, et al.. (1993). Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(4). 1283–1288. 67 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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