Bassem Hamieh

1.3k total citations
8 papers, 32 citations indexed

About

Bassem Hamieh is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Bassem Hamieh has authored 8 papers receiving a total of 32 indexed citations (citations by other indexed papers that have themselves been cited), including 6 papers in Electrical and Electronic Engineering, 4 papers in Surfaces, Coatings and Films and 3 papers in Biomedical Engineering. Recurrent topics in Bassem Hamieh's work include Advancements in Photolithography Techniques (6 papers), Advanced Surface Polishing Techniques (3 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Bassem Hamieh is often cited by papers focused on Advancements in Photolithography Techniques (6 papers), Advanced Surface Polishing Techniques (3 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Bassem Hamieh collaborates with scholars based in United States and Belgium. Bassem Hamieh's co-authors include John Arnold, Nicole Saulnier, Lei Sun, Nelson Felix, Matthew Colburn, Yongan Xu, Yann Mignot, Wenhui Wang, Catherine B. Labelle and Jeffrey C. Shearer and has published in prestigious journals such as Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

In The Last Decade

Bassem Hamieh

6 papers receiving 30 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Bassem Hamieh United States 3 30 16 10 3 2 8 32
Colita Parker United States 4 27 0.9× 6 0.4× 17 1.7× 2 0.7× 3 1.5× 9 28
Raja Muthinti United States 5 51 1.7× 7 0.4× 20 2.0× 3 1.0× 2 1.0× 8 57
G. Weichert Germany 4 16 0.5× 9 0.6× 6 0.6× 3 1.0× 5 23
C. Santos Spain 5 36 1.2× 6 0.4× 5 0.5× 7 2.3× 1 0.5× 9 41
Michael Aquilino United States 3 16 0.5× 3 0.2× 4 0.4× 4 1.3× 3 1.5× 4 27
Hankyeol Lee South Korea 3 14 0.5× 3 0.2× 7 0.7× 3 1.5× 5 30
S. Y. Zinn South Korea 3 18 0.6× 7 0.4× 4 0.4× 1 0.3× 8 24
Pierre-Olivier Sassoulas France 4 17 0.6× 3 0.2× 18 1.8× 1 0.3× 4 2.0× 8 26
F. Mariani Italy 5 13 0.4× 3 0.2× 26 2.6× 8 32
M. Weirich Germany 2 8 0.3× 21 1.3× 7 0.7× 11 3.7× 3 35

Countries citing papers authored by Bassem Hamieh

Since Specialization
Citations

This map shows the geographic impact of Bassem Hamieh's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bassem Hamieh with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bassem Hamieh more than expected).

Fields of papers citing papers by Bassem Hamieh

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Bassem Hamieh. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bassem Hamieh. The network helps show where Bassem Hamieh may publish in the future.

Co-authorship network of co-authors of Bassem Hamieh

This figure shows the co-authorship network connecting the top 25 collaborators of Bassem Hamieh. A scholar is included among the top collaborators of Bassem Hamieh based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Bassem Hamieh. Bassem Hamieh is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

8 of 8 papers shown
1.
Wang, Shibing, Yixiao Zhang, Yuansheng Ma, et al.. (2024). Layout simulation for directed self-assembly with chemo-epitaxy methodology. 30–30.
2.
Silva, Anuja De, Karen Petrillo, Luciana Meli, et al.. (2017). Single-expose patterning development for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431G–101431G. 7 indexed citations
3.
Koay, Chiew-Seng, Bassem Hamieh, Nelson Felix, & John G. Gaudiello. (2017). Reaching for the true overlay in advanced nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101450B–101450B.
4.
Koay, Chiew-Seng, et al.. (2016). Assessments of image-based and scatterometry-based overlay targets. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9778. 97781K–97781K. 1 indexed citations
5.
Lee, Chang‐Woo, Peng Wang, Yann Mignot, et al.. (2015). Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280A–94280A. 2 indexed citations
6.
Saulnier, Nicole, Yongan Xu, Wenhui Wang, et al.. (2015). EUV processing and characterization for BEOL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94220T–94220T. 15 indexed citations
7.
Rastogi, Vinayak, Andrew J. Metz, Catherine B. Labelle, et al.. (2015). Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280F–94280F. 6 indexed citations
8.
Hamieh, Bassem, et al.. (2013). Enabling reverse tone imaging for via levels using attenuated phase shift mask and source optimization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8683. 86830J–86830J. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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