Erik R. Hosler

448 total citations
22 papers, 206 citations indexed

About

Erik R. Hosler is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Erik R. Hosler has authored 22 papers receiving a total of 206 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 9 papers in Biomedical Engineering and 8 papers in Surfaces, Coatings and Films. Recurrent topics in Erik R. Hosler's work include Advancements in Photolithography Techniques (10 papers), Optical Coatings and Gratings (7 papers) and Surface Roughness and Optical Measurements (6 papers). Erik R. Hosler is often cited by papers focused on Advancements in Photolithography Techniques (10 papers), Optical Coatings and Gratings (7 papers) and Surface Roughness and Optical Measurements (6 papers). Erik R. Hosler collaborates with scholars based in United States, Netherlands and Italy. Erik R. Hosler's co-authors include Stephen R. Leone, Obert R. Wood, Alain C. Diebold, Vimal Kamineni, William A. Barletta, Richard A. Farrell, Pawitter J. S. Mangat, Scott Sayres, David J. Pritchard and Gerard M. Schmid and has published in prestigious journals such as Physical Review A, The Journal of Physical Chemistry A and Journal of Physics B Atomic Molecular and Optical Physics.

In The Last Decade

Erik R. Hosler

20 papers receiving 190 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Erik R. Hosler United States 8 99 64 63 62 35 22 206
Wayne Morris United States 11 202 2.0× 16 0.3× 88 1.4× 17 0.3× 79 2.3× 20 522
Y.M. Houng United States 12 366 3.7× 215 3.4× 37 0.6× 27 0.4× 10 0.3× 27 409
R.E. Scotti United States 11 463 4.7× 239 3.7× 42 0.7× 27 0.4× 32 0.9× 28 496
Jean-Michel Hartmann France 12 380 3.8× 258 4.0× 84 1.3× 20 0.3× 9 0.3× 31 424
R. Pathak United States 11 276 2.8× 204 3.2× 18 0.3× 25 0.4× 10 0.3× 46 344
Niu Jin United States 12 295 3.0× 159 2.5× 104 1.7× 8 0.1× 4 0.1× 30 348
J.‐L. Coutaz France 11 186 1.9× 155 2.4× 98 1.6× 78 1.3× 26 0.7× 22 280
Pierre Bénech France 8 265 2.7× 191 3.0× 88 1.4× 40 0.6× 20 0.6× 24 329
E. P. G. Smith United States 12 321 3.2× 201 3.1× 35 0.6× 8 0.1× 4 0.1× 23 340
O. Lyngnes United States 9 127 1.3× 313 4.9× 82 1.3× 22 0.4× 24 0.7× 20 375

Countries citing papers authored by Erik R. Hosler

Since Specialization
Citations

This map shows the geographic impact of Erik R. Hosler's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Erik R. Hosler with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Erik R. Hosler more than expected).

Fields of papers citing papers by Erik R. Hosler

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Erik R. Hosler. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Erik R. Hosler. The network helps show where Erik R. Hosler may publish in the future.

Co-authorship network of co-authors of Erik R. Hosler

This figure shows the co-authorship network connecting the top 25 collaborators of Erik R. Hosler. A scholar is included among the top collaborators of Erik R. Hosler based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Erik R. Hosler. Erik R. Hosler is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
2.
Neisser, Mark, Harry Levinson, Stefan Wurm, et al.. (2021). Lithography. 1–11. 5 indexed citations
3.
Hosler, Erik R.. (2017). Next-generation EUV lithography productivity (Conference Presentation). 33–33. 1 indexed citations
4.
Hosler, Erik R., Obert R. Wood, & William A. Barletta. (2017). Free-electron laser emission architecture impact on extreme ultraviolet lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 16(4). 1–1. 3 indexed citations
5.
Chen, Xuemei, Allen H. Gabor, Pavan Kumar Samudrala, et al.. (2017). Mix-and-match considerations for EUV insertion in N7 HVM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430F–101430F. 2 indexed citations
6.
Hosler, Erik R., Obert R. Wood, & William A. Barletta. (2017). Free-electron laser emission architecture impact on EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431M–101431M. 3 indexed citations
7.
Hosler, Erik R., et al.. (2016). Extending extreme-UV lithography technology. SPIE Newsroom. 4 indexed citations
8.
Mohanty, Nihar, Richard A. Farrell, Jeffrey Smith, et al.. (2016). LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9782. 97820Q–97820Q. 3 indexed citations
9.
Hosler, Erik R., et al.. (2016). Optical critical dimension metrology for directed self-assembly assisted contact hole shrink. Journal of Micro/Nanolithography MEMS and MOEMS. 15(1). 14004–14004. 19 indexed citations
10.
Hosler, Erik R., et al.. (2016). EUV and optical lithographic pattern shift at the 5nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977616–977616. 6 indexed citations
11.
Hosler, Erik R., et al.. (2015). EUV telecentricity and shadowing errors impact on process margins. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94220Z–94220Z. 10 indexed citations
12.
Hosler, Erik R., et al.. (2015). Considerations for a free-electron laser-based extreme-ultraviolet lithography program. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94220D–94220D. 22 indexed citations
13.
Hosler, Erik R., et al.. (2015). Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9424. 94242P–94242P. 1 indexed citations
14.
Hosler, Erik R., et al.. (2015). Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31208–31208. 19 indexed citations
15.
Kamineni, Vimal, et al.. (2014). Metrology for directed self-assembly block lithography using optical scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9050. 90500N–90500N. 10 indexed citations
16.
Farrell, Richard A., Erik R. Hosler, Gerard M. Schmid, et al.. (2014). Manufacturability considerations for DSA. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 90510Z–90510Z. 14 indexed citations
17.
Sayres, Scott, Erik R. Hosler, & Stephen R. Leone. (2014). Exposing the Role of Electron Correlation in Strong-Field Double Ionization: X-ray Transient Absorption of Orbital Alignment in Xe+ and Xe2+. The Journal of Physical Chemistry A. 118(37). 8614–8624. 5 indexed citations
18.
Mohanty, Nihar, Christopher B. Cole, Vinayak Rastogi, et al.. (2014). Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 90540R–90540R. 6 indexed citations
19.
Hosler, Erik R. & Stephen R. Leone. (2013). Characterization of vibrational wave packets by core-level high-harmonic transient absorption spectroscopy. Physical Review A. 88(2). 49 indexed citations
20.
Osipov, T., L. Fang, B. Murphy, et al.. (2013). Sequential multiple ionization and fragmentation of SF6induced by an intense free electron laser pulse. Journal of Physics B Atomic Molecular and Optical Physics. 46(16). 164032–164032. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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