Scott Halle

905 total citations
59 papers, 521 citations indexed

About

Scott Halle is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Scott Halle has authored 59 papers receiving a total of 521 indexed citations (citations by other indexed papers that have themselves been cited), including 51 papers in Electrical and Electronic Engineering, 24 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. Recurrent topics in Scott Halle's work include Advancements in Photolithography Techniques (44 papers), Integrated Circuits and Semiconductor Failure Analysis (22 papers) and Electron and X-Ray Spectroscopy Techniques (21 papers). Scott Halle is often cited by papers focused on Advancements in Photolithography Techniques (44 papers), Integrated Circuits and Semiconductor Failure Analysis (22 papers) and Electron and X-Ray Spectroscopy Techniques (21 papers). Scott Halle collaborates with scholars based in United States, Japan and Netherlands. Scott Halle's co-authors include Robert W. Field, James L. Kinsey, Patrick H. Vaccaro, F. Temps, Richard M. Osgood, P. D. Brewer, David Cahen, Yongqin Chen, David M. Jonas and Zachary M. C. Baum and has published in prestigious journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of the Optical Society of America B.

In The Last Decade

Scott Halle

56 papers receiving 479 citations

Peers

Countries citing papers authored by Scott Halle

Since Specialization

Citations

This map shows the geographic impact of Scott Halle's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Scott Halle with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Scott Halle more than expected).

Fields of papers citing papers by Scott Halle

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Scott Halle. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Scott Halle. The network helps show where Scott Halle may publish in the future.

Co-authorship network of co-authors of Scott Halle

This figure shows the co-authorship network connecting the top 25 collaborators of Scott Halle. A scholar is included among the top collaborators of Scott Halle based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Scott Halle. Scott Halle is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Accelerating high-NA EUV lithography insertion for interconnect scaling and beyond: Performance, cost, and future prospects 2025 ·(unknown), Indira Seshadri, (unknown), (unknown), (unknown), (unknown), (unknown), Stuart Sieg, Darı́o L. Goldfarb, (unknown), (unknown), Shing Yip Lee, Yann Mignot, Scott Halle	0
2	Low-n absorber EUV masks: mask manufacturing assessment through process characterization and optimization with early look at EUV Low-NA and High-NA imaging performance 2024 ·(unknown), (unknown), (unknown), (unknown), Michael Green, Martin Burkhardt, (unknown), Scott Halle, (unknown), (unknown), (unknown), (unknown)	1
3	Bayesian dropout approximation in deep learning neural networks: analysis of self-aligned quadruple patterning 2020 ·Scott Halle, (unknown), Allen H. Gabor, Derren Dunn, Mark S. Shephard	3
4	Study of alternate hardmasks for extreme ultraviolet patterning 2016 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Anuja De Silva, Indira Seshadri, Abraham Arceo, Karen Petrillo, Luciana Meli, (unknown), Yiping Yao, Michael Belyansky, Scott Halle, Nelson Felix	12
5	E-beam inspection of EUV mask defects: To etch or not to etch? 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam, (unknown), (unknown), Scott Halle, Fei Wang, Daniel Corliss, Wei Fang, (unknown)	7
6	Dose-focus monitor technique using CD-SEM and application to local variation analysis 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Timothy A. Brunner, Scott Halle, (unknown), Takeshi Kato, Atsuko Yamaguchi	1
7	Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gregory McIntyre, Daniel Corliss, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Jeremy Woods, Chris Robinson, (unknown), Richard Johnson, Scott Halle, Ryoung-Han Kim, Erin Mclellan, Hirokazu Katō, (unknown), (unknown), (unknown)	4
8	Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Scott Halle, Daniel Moore, (unknown), (unknown), (unknown), (unknown), (unknown), Atsuko Yamaguchi, Kazuyoshi Torii	3
9	Double exposure double etch for dense SRAM: a designer's dream 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Allen H. Gabor, Scott Halle, (unknown), (unknown), (unknown), Helen Wang, (unknown)	1
10	ACLV driven double-patterning decomposition with extensively added printing assist features (PrAFs) 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Carlos Fonseca, Scott Halle, Scott Mansfield	3
11	Meeting critical gate linewidth control needs at the 65 nm node 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arpan P. Mahorowala, Scott Halle, Allen H. Gabor, William Chu, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Ishtiaq Ahsan, (unknown), (unknown), (unknown), Jeffrey J. Zimmerman, (unknown)	2
12	Effect of the effective resist diffusion length to the photolithography at 65- and 45-nm nodes: a study with simple and accurate analytical equations 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Qiang Wu, Scott Halle, (unknown)	6
13	A novel graded antireflective coating with built-in hardmask properties enabling 65nm and below CMOS device patterning 2004 ·Katherina Babich, (unknown), Arpan P. Mahorowala, Scott Halle, (unknown), Douglas R. Pfeiffer, (unknown), (unknown), Ao Xia, Marie Angelopoulos	1
14	Hardmask technology for sub-100 nm lithographic imaging 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Katherina Babich, Arpan P. Mahorowala, David R. Medeiros, Dirk Pfeiffer, Karen Petrillo, Marie Angelopoulos, A. Grill, V. Patel, Scott Halle, Timothy A. Brunner, Rena M. Conti, Scott D. Allen, Richard Wise	20
15	Scaling rules of phase error control for the manufacturing of alternating phase-shifting masks for 193-nm photolithography and beyond 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Qiang Wu, Scott Halle, (unknown), (unknown), M. Hibbs	1
16	<title>Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing</title> 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arpan P. Mahorowala, Katherina Babich, Karen Petrillo, John P. Simons, Marie Angelopoulos, V. Patel, A. Grill, Scott Halle, Rena M. Conti, (unknown), Richard Wise, Linda Chen, Alan C. Thomas, (unknown), (unknown)	2
17	Optical Stark shifts of Raman gain spectra in polydiacetylene 1994 ·Journal of the Optical Society of America B ·Scott Halle, M. Yoshizawa, Hiro Matsuda, Shinsuke Okada, H. Nakanishi, (unknown)	4
18	Stimulated-emission pumping studies of acetylene X˜Σ1g+ in the 11 400–15 700-cm^−1 region: the onset of mixing 1990 ·Journal of the Optical Society of America B ·Yongqin Chen, Scott Halle, David M. Jonas, James L. Kinsey, Robert W. Field	38
19	Vibrationally excited formaldehyde. The relationship between vibrational structure and collisional properties 1988 ·Journal of the Chemical Society Faraday Transactions 2 Molecular and Chemical Physics ·F. Temps, Scott Halle, Patrick H. Vaccaro, Robert W. Field, James L. Kinsey	39
20	Polarization-detected transient gain studies of relaxation processes in v4=1 A 1A2 formaldehyde-h2 1988 ·The Journal of Chemical Physics ·Patrick H. Vaccaro, F. Temps, Scott Halle, James L. Kinsey, Robert W. Field	30

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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