Nelson Felix

2.6k total citations
113 papers, 1.1k citations indexed

About

Nelson Felix is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Nelson Felix has authored 113 papers receiving a total of 1.1k indexed citations (citations by other indexed papers that have themselves been cited), including 98 papers in Electrical and Electronic Engineering, 41 papers in Biomedical Engineering and 31 papers in Surfaces, Coatings and Films. Recurrent topics in Nelson Felix's work include Advancements in Photolithography Techniques (85 papers), Integrated Circuits and Semiconductor Failure Analysis (40 papers) and Electron and X-Ray Spectroscopy Techniques (26 papers). Nelson Felix is often cited by papers focused on Advancements in Photolithography Techniques (85 papers), Integrated Circuits and Semiconductor Failure Analysis (40 papers) and Electron and X-Ray Spectroscopy Techniques (26 papers). Nelson Felix collaborates with scholars based in United States, Japan and Australia. Nelson Felix's co-authors include Christopher K. Ober, Anuja De Silva, Seung Wook Chang, Da Yang, Hai Deng, Heidi B. Cao, Kousuke Tsuchiya, Jun Yan Dai, Ramakrishnan Ayothi and Daniel Bratton and has published in prestigious journals such as Advanced Materials, Chemistry of Materials and Advanced Functional Materials.

In The Last Decade

Nelson Felix

100 papers receiving 1.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Nelson Felix United States 17 818 525 268 266 145 113 1.1k
He Gao United States 14 312 0.4× 368 0.7× 380 1.4× 218 0.8× 171 1.2× 29 785
Masaru Sasago Japan 15 670 0.8× 473 0.9× 120 0.4× 106 0.4× 97 0.7× 137 912
Wayne M. Moreau United States 11 459 0.6× 354 0.7× 151 0.6× 138 0.5× 104 0.7× 38 793
Gregory S. Doerk United States 21 321 0.4× 307 0.6× 771 2.9× 114 0.4× 259 1.8× 47 1.1k
M. Sanchez United States 16 636 0.8× 306 0.6× 222 0.8× 236 0.9× 49 0.3× 30 946
Berend‐Jan de Gans Netherlands 13 776 0.9× 656 1.2× 199 0.7× 88 0.3× 118 0.8× 14 1.2k
Jeffrey D. Gelorme United States 10 853 1.0× 511 1.0× 191 0.7× 60 0.2× 88 0.6× 25 1.2k
Kimmo Mustonen Austria 21 560 0.7× 380 0.7× 928 3.5× 64 0.2× 73 0.5× 59 1.4k
Toshiro Itani Japan 25 2.5k 3.0× 1.3k 2.4× 93 0.3× 1.0k 3.8× 113 0.8× 280 2.7k

Countries citing papers authored by Nelson Felix

Since Specialization
Citations

This map shows the geographic impact of Nelson Felix's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Nelson Felix with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Nelson Felix more than expected).

Fields of papers citing papers by Nelson Felix

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Nelson Felix. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Nelson Felix. The network helps show where Nelson Felix may publish in the future.

Co-authorship network of co-authors of Nelson Felix

This figure shows the co-authorship network connecting the top 25 collaborators of Nelson Felix. A scholar is included among the top collaborators of Nelson Felix based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Nelson Felix. Nelson Felix is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Burkhardt, Martin, Nikhil Jain, Gen Tsutsui, et al.. (2024). EUV patterned gate variation reduction in next generation transistor architectures. 8–8.
3.
4.
5.
Pancharatnam, S., et al.. (2023). Epi Source-Drain Damage Mitigation During Channel Release of Stacked Nanosheet Gate-All-Around Transistors. ECS Transactions. 112(1). 45–52. 2 indexed citations
6.
Nogami, T., Oleg Gluschenkov, Son T. Nguyen, et al.. (2022). Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects. 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits). 423–424. 6 indexed citations
7.
Engelmann, Sebastian, Rich Wise, Roel Gronheid, & Nelson Felix. (2019). Special Section Guest Editorial: Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications. Journal of Micro/Nanolithography MEMS and MOEMS. 18(1). 1–1.
8.
Shibata, Naoki, et al.. (2019). The defect mitigation on EUV stack by track based technology. 50–50. 1 indexed citations
9.
Liu, Chi‐Chun, Yann Mignot, Ruilong Xie, et al.. (2018). Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond. Nature Electronics. 1(10). 562–569. 110 indexed citations
10.
Silva, Anuja De, Karen Petrillo, Luciana Meli, et al.. (2017). Single-expose patterning development for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431G–101431G. 7 indexed citations
11.
Silva, Anuja De, Indira Seshadri, Abraham Arceo, et al.. (2017). Development of TiO2 containing hardmasks through PEALD deposition. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 1014615–1014615. 1 indexed citations
12.
Seshadri, Indira, Anuja De Silva, Luciana Meli, et al.. (2017). Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431D–101431D. 3 indexed citations
13.
Silva, Anuja De, Indira Seshadri, Abraham Arceo, et al.. (2016). Study of alternate hardmasks for extreme ultraviolet patterning. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 34(6). 12 indexed citations
14.
Felix, Nelson, Youngjin Cho, Margarita Chatzichristidi, et al.. (2012). Synthesis and Characterization of High-Throughput Nanofabricated Poly(4-Hydroxy Styrene) Membranes for In Vitro Models of Barrier Tissue. Tissue Engineering Part C Methods. 18(9). 667–676. 9 indexed citations
15.
VanderHart, David L., Vivek M. Prabhu, Anuja De Silva, Nelson Felix, & Christopher K. Ober. (2009). Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator. Journal of Materials Chemistry. 19(18). 2683–2683. 11 indexed citations
16.
Felix, Nelson & Christopher K. Ober. (2008). Acid-Labile, Chain-Scission Polymer Systems Used as Positive-Tone Photoresists Developable in Supercritical CO2. Chemistry of Materials. 20(9). 2932–2936. 11 indexed citations
17.
Silva, Anuja De, Nelson Felix, & Christopher K. Ober. (2008). Molecular Glass Resists as High‐Resolution Patterning Materials. Advanced Materials. 20(17). 3355–3361. 91 indexed citations
18.
Ayothi, Ramakrishnan, Seung Wook Chang, Nelson Felix, et al.. (2006). New PFOS Free Photoresist Systems for EUV Lithography. Journal of Photopolymer Science and Technology. 19(4). 515–520. 10 indexed citations
19.
Felix, Nelson, et al.. (2006). Supercritical CO 2 for high resolution photoresist development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61534B–61534B. 2 indexed citations
20.
Bratton, Daniel, Ramakrishnan Ayothi, Nelson Felix, et al.. (2006). Molecular glass resists for next generation lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531D–61531D. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by He Gao Breakdown of academic impact, for papers by Masaru Sasago Breakdown of academic impact, for papers by Wayne M. Moreau Breakdown of academic impact, for papers by Gregory S. Doerk Breakdown of academic impact, for papers by M. Sanchez Breakdown of academic impact, for papers by Berend‐Jan de Gans Breakdown of academic impact, for papers by Jeffrey D. Gelorme Breakdown of academic impact, for papers by Kimmo Mustonen Breakdown of academic impact, for papers by Toshiro Itani
Rankless by CCL
2026