Tom Wallow

450 total citations
32 papers, 286 citations indexed

About

Tom Wallow is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Tom Wallow has authored 32 papers receiving a total of 286 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 20 papers in Surfaces, Coatings and Films and 6 papers in Biomedical Engineering. Recurrent topics in Tom Wallow's work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Tom Wallow is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Tom Wallow collaborates with scholars based in United States, South Korea and Netherlands. Tom Wallow's co-authors include Bruno La Fontaine, Patrick Naulleau, Yunfei Deng, Harry Levinson, Obert R. Wood, Christopher N. Anderson, John J. Biafore, Ryoung-Han Kim, Paul Denham and Kenneth A. Goldberg and has published in prestigious journals such as Microelectronic Engineering, Journal of Micro/Nanolithography MEMS and MOEMS and Journal of Photopolymer Science and Technology.

In The Last Decade

Tom Wallow

32 papers receiving 246 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Tom Wallow United States 10 255 129 91 17 16 32 286
Adam R. Pawloski United States 12 376 1.5× 199 1.5× 133 1.5× 23 1.4× 17 1.1× 30 432
Warren Montgomery United States 10 409 1.6× 187 1.4× 186 2.0× 14 0.8× 15 0.9× 34 463
John J. Biafore United States 13 470 1.8× 284 2.2× 139 1.5× 11 0.6× 10 0.6× 68 486
Gijsbert Rispens Netherlands 12 372 1.5× 223 1.7× 100 1.1× 42 2.5× 9 0.6× 41 390
Hideo Hada Japan 12 490 1.9× 223 1.7× 204 2.2× 25 1.5× 21 1.3× 50 515
Peng Xie China 10 230 0.9× 44 0.3× 60 0.7× 3 0.2× 12 0.8× 34 444
L. Pain France 8 143 0.6× 55 0.4× 74 0.8× 6 0.4× 6 0.4× 31 178
Ryoichi Hirano Japan 12 333 1.3× 235 1.8× 39 0.4× 19 1.1× 58 342
Atsuro Nakano Japan 13 678 2.7× 381 3.0× 272 3.0× 4 0.2× 7 0.4× 13 687
Erin Mclellan United States 5 95 0.4× 46 0.4× 54 0.6× 1 0.1× 2 0.1× 8 126

Countries citing papers authored by Tom Wallow

Since Specialization
Citations

This map shows the geographic impact of Tom Wallow's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tom Wallow with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tom Wallow more than expected).

Fields of papers citing papers by Tom Wallow

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tom Wallow. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tom Wallow. The network helps show where Tom Wallow may publish in the future.

Co-authorship network of co-authors of Tom Wallow

This figure shows the co-authorship network connecting the top 25 collaborators of Tom Wallow. A scholar is included among the top collaborators of Tom Wallow based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tom Wallow. Tom Wallow is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Delorme, Maxence, et al.. (2022). Curvilinear EUV mask: development of innovative mask metrology. 9985. 37–37. 1 indexed citations
2.
Dillon, Brian, et al.. (2020). Free form data reduction for MPC. 20–20. 2 indexed citations
3.
Mangat, Pawitter J. S., et al.. (2015). Subresolution assist features in extreme ultraviolet lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 14(2). 23501–23501. 4 indexed citations
4.
Sun, Lei, Eric M. Gullikson, Pawitter J. S. Mangat, et al.. (2013). Application of phase shift focus monitor in EUVL process control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86790T–86790T. 3 indexed citations
5.
Li, Jie, et al.. (2013). Evaluating scatterometry 3D capabilities for EUV. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8681. 86810S–86810S. 4 indexed citations
6.
Gallagher, Emily, et al.. (2011). EUV masks under exposure: practical considerations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 79690W–79690W. 8 indexed citations
7.
Okoroanyanwu, Uzodinma, et al.. (2010). Analysis and characterization of contamination in EUV reticles. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76361Y–76361Y. 1 indexed citations
8.
Biafore, John J., Mark D. Smith, Eelco van Setten, et al.. (2010). Resist pattern prediction at EUV. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360R–76360R. 25 indexed citations
9.
Naulleau, Patrick, Christopher N. Anderson, Paul Denham, et al.. (2009). 22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool. Microelectronic Engineering. 86(4-6). 448–455. 26 indexed citations
10.
Wood, Obert R., Chiew-Seng Koay, Karen Petrillo, et al.. (2009). Integration of EUV lithography in the fabrication of 22-nm node devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727104–727104. 40 indexed citations
11.
Naulleau, Patrick, Christopher N. Anderson, Paul Denham, et al.. (2009). Pushing extreme ultraviolet lithography development beyond 22 nm half pitch. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(6). 2911–2915. 6 indexed citations
12.
Georger, Jacque H., Frank Goodwin, Stefan Wurm, et al.. (2009). Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727124–727124. 13 indexed citations
13.
Fontaine, Bruno La, Yunfei Deng, Ryoung-Han Kim, et al.. (2007). Extreme ultraviolet lithography: From research to manufacturing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2089–2093. 5 indexed citations
14.
Naulleau, Patrick, Christopher N. Anderson, Bruno La Fontaine, Ryoung-Han Kim, & Tom Wallow. (2007). Lithographic metrics for the determination of intrinsic resolution limits in EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65172N–65172N. 8 indexed citations
15.
Naulleau, Patrick, Chris Anderson, Kim Dean, et al.. (2007). Recent results from the Berkeley 0.3-NA EUV microfield exposure tool. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65170V–65170V. 7 indexed citations
16.
Naulleau, Patrick, Christopher N. Anderson, Kim Dean, et al.. (2007). Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2132–2135. 1 indexed citations
17.
Pawloski, Adam R., et al.. (2006). The transfer of photoresist LER through etch. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615318–615318. 22 indexed citations
18.
Talin, A. Alec, G. F. Cardinale, Tom Wallow, et al.. (2004). Extreme ultraviolet lithography based nanofabrication using a bilevel photoresist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(2). 781–784. 8 indexed citations
19.
Varanasi, Pushkara R., George M. Jordhamo, Robert D. Allen, et al.. (1999). IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance.. Journal of Photopolymer Science and Technology. 12(3). 493–500. 10 indexed citations
20.
Nalamasu, O., Tom Wallow, Elsa Reichmanis, et al.. (1997). Revolutionary and evolutionary resist design concepts for 193 nm lithography. Microelectronic Engineering. 35(1-4). 133–136. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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