Tom Wallow

450 citations

32 papers · 286 indexed · h-index 10

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices

Papers in ⓘ

Surfaces, Coatings and Films 20
- Electron and X-Ray Spectroscopy Techniques 18
- Optical Coatings and Gratings 2
Electrical and Electronic Engineering 31
- Advancements in Photolithography Techniques 31
- Integrated Circuits and Semiconductor Failure Analysis 20
- Silicon and Solar Cell Technologies 2

Co-authors: Bruno La Fontaine (10 shared papers)Patrick Naulleau (9 shared papers)Yunfei Deng (6 shared papers)Harry Levinson (4 shared papers)Christopher N. Anderson (6 shared papers)Obert R. Wood (8 shared papers)Paul Denham (6 shared papers)John J. Biafore (2 shared papers)
Journals: Microelectronic Engineering (2 papers)Journal of Photopolymer Science and Technology (2 papers)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (4 papers)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (20 papers)
Partner nations: United States South Korea Netherlands

In The Last Decade

Tom Wallow

32 papers receiving 246 citations

Peers

Countries citing papers authored by Tom Wallow

Since Specialization

Citations

This map shows the geographic impact of Tom Wallow's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tom Wallow with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tom Wallow more than expected).

Fields of papers citing papers by Tom Wallow

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tom Wallow. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tom Wallow. The network helps show where Tom Wallow may publish in the future.

Co-authors

The 25 scholars most cited alongside Tom Wallow, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Tom Wallow Line = papers co-authored together Tom Wallow links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 32 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Integration of EUV lithography in the fabrication of 22-nm node devices Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Obert R. Wood, Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno, Sudhar Raghunathan, John Arnold, Dave Horak, Martin Burkhardt, Gregory McIntyre, Yunfei Deng, Bruno La Fontaine, Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Tom Wallow, James H.-C. Chen, Matthew Colburn, Susan Fan, Bala S. Haran, Yunpeng Yin	2009	40
2	22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool Microelectronic Engineering ·Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu, Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, Brian Hoef, Russ Hudyma, Gideon Jones, Chawon Koh, Bruno La Fontaine, Andy Ma, Warren Montgomery, Dimitra Niakoula, Joo-On Park, Tom Wallow, Stefan Wurm	2009	26
3	Resist pattern prediction at EUV Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John J. Biafore, Mark D. Smith, Eelco van Setten, Tom Wallow, Patrick Naulleau, David Blankenship, Stewart A. Robertson, Yunfei Deng	2010	25
4	EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300 Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Tom Wallow, Deniz Civay, S. Wang, H. F. Hoefnagels, Coen Verspaget, Gazi Tanriseven, Anita Fumar-Pici, Steven G. Hansen, Jeffrey Schefske, Mandeep Singh, Ruben Maas, Youri van Dommelen, Joerg Mallman	2012	25
5	The transfer of photoresist LER through etch Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Adam R. Pawloski, Alden Acheta, Scott Bell, Bruno La Fontaine, Tom Wallow, Harry Levinson	2006	22
6	Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chawon Koh, Liping Ren, Jacque H. Georger, Frank Goodwin, Stefan Wurm, Bill Pierson, Joo-On Park, Tom Wallow, Todd R. Younkin, Patrick Naulleau	2009	13
7	Revolutionary and evolutionary resist design concepts for 193 nm lithography Microelectronic Engineering ·O. Nalamasu, Tom Wallow, Elsa Reichmanis, Anthony E. Novembre, Francis M. Houlihan, Gary Dabbagh, David A. Mixon, Richard S. Hutton, Allen G. Timko, O. R. Wood, Raymond A. Cirelli	1997	11
8	Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Sungmin Huh, Gideon Jones, Bruno LaFontaine, Andy Ma, Dimitra Niakoula, Joo-On Park, Tom Wallow	2008	11
9	IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance. Journal of Photopolymer Science and Technology ·Pushkara R. Varanasi, Ann M. Mewherter, Margaret C. Lawson, George M. Jordhamo, Robert D. Allen, Juliann Opitz, Hirokazu Ito, Tom Wallow, D. D. Hofer	1999	10
10	Evaluation of High and Low Activation Resists for EUV Lithography Journal of Photopolymer Science and Technology ·James W. Thackeray, Roger A. Nassar, Kathleen Spear-Alfonso, Tom Wallow, Bruno LaFontaine	2006	10
11	Double exposure using 193nm negative tone photoresist Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ryoung-Han Kim, Tom Wallow, Jongwook Kye, Harry Levinson, D. T. White	2007	9
12	Deconstructing contact hole CD printing variability in EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Deniz Civay, Tom Wallow, Necip Doganaksoy, Erik Verduijn, Gerard M. Schmid, Pawitter J. S. Mangat	2014	9
13	Lithographic metrics for the determination of intrinsic resolution limits in EUV resists Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Patrick Naulleau, Christopher N. Anderson, Bruno La Fontaine, Ryoung-Han Kim, Tom Wallow	2007	8
14	Extreme ultraviolet lithography based nanofabrication using a bilevel photoresist Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·A. Alec Talin, G. F. Cardinale, Tom Wallow, Paul M. Dentinger, Shibnath Pathak, D. Chinn, Daniel R. Folk	2004	8
15	EUV masks under exposure: practical considerations Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Emily Gallagher, Gregory McIntyre, Tom Wallow, Sudharshanan Raghunathan, Obert R. Wood, Louis Kindt, John Whang, Monica Barrett	2011	8
16	Recent results from the Berkeley 0.3-NA EUV microfield exposure tool Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Patrick Naulleau, Chris Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Bruno La Fontaine, Tom Wallow	2007	7
17	Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Patrick Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Warren Montgomery, Tom Wallow	2009	6
18	Extreme ultraviolet lithography: From research to manufacturing Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Bruno La Fontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Uzodinma Okoroanyanwu, Richard L. Sandberg, Tom Wallow, Obert R. Wood	2007	5
19	Pattern prediction in EUV resists Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John J. Biafore, Mark D. Smith, Tom Wallow, Patrick Nalleau, David Blankenship, Yunfei Deng	2009	5
20	Subresolution assist features in extreme ultraviolet lithography Journal of Micro/Nanolithography MEMS and MOEMS ·Deniz Civay, Erik Verduijn, Chris Clifford, Pawitter J. S. Mangat, Tom Wallow	2015	4

About Tom Wallow

Tom Wallow is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Hardware and Architecture, Instrumentation and Industrial and Manufacturing Engineering, having authored 32 papers that have together received 286 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers), Electron and X-Ray Spectroscopy Techniques (18 papers), Nanofabrication and Lithography Techniques (3 papers), Silicon and Solar Cell Technologies (2 papers), Industrial Vision Systems and Defect Detection (2 papers), Optical Coatings and Gratings (2 papers) and Copper Interconnects and Reliability (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (129 citations), Electrical and Electronic Engineering (255 citations), Biomedical Engineering (91 citations), Radiation (17 citations) and Industrial and Manufacturing Engineering (14 citations). Tom Wallow has collaborated with scholars based in United States, South Korea and Netherlands. Frequent co-authors include Bruno La Fontaine, Patrick Naulleau, Yunfei Deng, Harry Levinson, Christopher N. Anderson, Obert R. Wood, Paul Denham, John J. Biafore, Ryoung-Han Kim and Mark D. Smith. Their work appears in journals such as Microelectronic Engineering, Journal of Photopolymer Science and Technology, Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

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