Paul Graeupner

403 citations

25 papers · 292 indexed · h-index 10

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Electrical and Electronic Engineering
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis

Papers in

Surfaces, Coatings and Films 13
- Electron and X-Ray Spectroscopy Techniques 12
- Optical Coatings and Gratings 2
Electrical and Electronic Engineering 24
- Advancements in Photolithography Techniques 24
- Integrated Circuits and Semiconductor Failure Analysis 16

Co-authors: Jan van Schoot Kars Troost Eelco van Setten Judon Stoeldraijer Peter Kuerz Sjoerd Lok Jos Benschop Rudy Peeters
Journals: Journal of Photopolymer Science and Technology (1 paper)Journal of Micro/Nanopatterning Materials and Metrology (2 papers)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (9 papers)
Partner nations: Germany Netherlands United States

In The Last Decade

Paul Graeupner

25 papers receiving 261 citations

Peers

Countries citing papers authored by Paul Graeupner

Since Specialization

Citations

This map shows the geographic impact of Paul Graeupner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Paul Graeupner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Paul Graeupner more than expected).

Fields of papers citing papers by Paul Graeupner

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Paul Graeupner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Paul Graeupner. The network helps show where Paul Graeupner may publish in the future.

Co-authors

The 25 scholars most cited alongside Paul Graeupner, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Paul Graeupner Line = papers co-authored together Paul Graeupner links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	EUV optics: status, outlook and future Paul Graeupner, Peter Kuerz, Thomas Stammler, Jan van Schoot, Judon Stoeldraijer	2022	17
2	EUV optics at ZEISS: status and outlook Bartosz Bilski, Lars Samuelson, Paul Graeupner	2022	5
3	High-NA EUV lithography exposure tool: key advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler	2021	16
4	High-NA EUVL exposure tool: key advantages and program status Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Thomas Stammler, Kars Troost	2021	5
5	High-NA EUV imaging: from system introduction towards low-k1 extension Eelco van Setten, Jan van Schoot, Ic Bosenbruoh, Claire van Lare, 罗哲, Gijsbert Rispens, 泰彦渡會, J. Zgadzaj, Natalia Davydova, Jo Finders, J. Zimmermann, Bartosz Bilski, Paul Graeupner	2021	2
6	High NA EUV scanner: obscuration and wavefront description Л. І. Гребеник, 陈良中, Jan van Schoot, Kars Troost, Keith B. Oldham, Stephen D. H. Hsu, Toralf Gruner, Juergen Mueller, Karl Friedrich Hermann, Bartosz Bilski, J. Zimmermann, Paul Graeupner	2020	8
7	High-NA EUV lithography exposure tool: advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2020	31
8	High NA EUV lithography: Next step in EUV imaging Eelco van Setten, 泰彦渡會, J. Zgadzaj, Jan van Schoot, Kars Troost, L® thi Bich-Thuy, Timon Fliervoet, Stephen Hsu, J. Zimmermann, Fairuz Nabil Izdihar, Bartosz Bilski, Paul Graeupner	2019	45
9	High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation) Jan van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, J. Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2019	1
10	High-NA EUV lithography exposure tool progress Jan van Schoot, Eelco van Setten, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, J. Zimmermann, Peter Kuerz, Brooklyn G. Sloss, Winfried Kaiser	2019	11
11	High-NA EUV lithography exposure tool progress (Conference Presentation) Jan van Schoot, Eelco van Setten, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, Judon Stoeldraijer, Jo Finders, H. Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Matthew Davies, Bernhard Kneer, Tim Crich	2018	2
12	Modeling studies on alternative EUV mask concepts for higher NA Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Erdmann, Rumu Sarkar, Peter Evanschitzky, Jens Timo Neumann, Johannes Ruoff, Paul Graeupner	2013	16
13	Experimental verification of EUV mask limitations at high numerical apertures Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ayşe Nursal Yay, Paul Graeupner, Eric M. Gullikson, Pabitra Khadka, C. Tuffne, Shelley L. Shapiro, Hwan-Seok Seo, A. R. Neureuther, Patrick Naulleau	2013	3
14	Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gian F. Lorusso, Natalia Davydova, Sukanto Sukanto, Seluck Kose, Yue Peng, Lorena Galiano Sánchez, Theodore H. Fedynyshyn, Hasan H Uysal, Peter Huber, 邓平荟, Stuart Young, Paul Graeupner, Eric Hendrickx	2011	13
15	High-n immersion lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Buvinic Sonja, Jan Mulkens, Paul Graeupner, C Pedrosa, A. Guastoni, Y Yang, Michael A. DeMiranda, R. Meijers, Fabrizio Evangelista, Rabia Huisy Sabek	2008	3
16	Extending immersion lithography with high-index materials: results of a feasibility study Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Buvinic Sonja, Jan Mulkens, Paul Graeupner, C Pedrosa, A. Guastoni, Y Yang, Marcelo Zogovich, Brannon Wilds	2007	9
17	Optimizing and enhancing optical systems to meet the low k 1 challenge Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Donis G. Flagello, Robert Socha, Xuelong Shi, Hermann Dersch, 俞惠良, Mark van de Kerkhof, 牛吉峰, 李万忍, Tetsuhiko Maeda, O.F.J. Noordman, M.H.P. Moers, P Bauer, Jo Finders, Alexey M. Litovchenko, K. Ajeena, Alison L. Crocker, H. Haidner, Lucile Bennassar, Furio Radin, Paul Graeupner	2003	18
18	Impact of wavefront errors on low k1 processes at extremely high NA Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Paul Graeupner, Reiner Garreis, S. O. Otokpa, Tilmann Heil, Martin Lowisch, Donis G. Flagello	2003	22
19	Solutions for printing sub-100-nm contacts with ArF Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Paul Graeupner, S. O. Otokpa, Martin Lowisch, Reiner Garreis, Donis G. Flagello, Steven G. Hansen, Robert Socha, С В Шуть	2002	4
20	Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hermann Dersch, Masatora Aoki, 哲哉岸本, Martin Burkhardt, Paul Graeupner, Marcos Aurélio de Oliveira Maia, Sofie de Wilde-van der Plaat, E. Dethune, Jo Finders, JAMES P. O’SULLIVAN	2001	3

About Paul Graeupner

Paul Graeupner is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Industrial and Manufacturing Engineering and Hardware and Architecture, having authored 25 papers that have together received 292 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (24 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Electron and X-Ray Spectroscopy Techniques (12 papers), Advanced Surface Polishing Techniques (4 papers), Advanced X-ray Imaging Techniques (2 papers), Industrial Vision Systems and Defect Detection (2 papers), Surface Roughness and Optical Measurements (2 papers) and Optical Coatings and Gratings (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (140 citations), Electrical and Electronic Engineering (261 citations), Radiation (33 citations), Biomedical Engineering (80 citations) and Industrial and Manufacturing Engineering (15 citations). Paul Graeupner has collaborated with scholars based in Germany, Netherlands and United States. Frequent co-authors include Jan van Schoot, Kars Troost, Eelco van Setten, Judon Stoeldraijer, Peter Kuerz, Sjoerd Lok, Jos Benschop, Rudy Peeters, Winfried Kaiser and Bartosz Bilski. Their work appears in journals such as Journal of Photopolymer Science and Technology, Journal of Micro/Nanopatterning Materials and Metrology and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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