Journal of Micro/Nanolithography MEMS and MOEMS

1.4k papers and 11.6k indexed citations i.

About

The 1.4k papers published in Journal of Micro/Nanolithography MEMS and MOEMS in the last decades have received a total of 11.6k indexed citations. Papers published in Journal of Micro/Nanolithography MEMS and MOEMS usually cover Electrical and Electronic Engineering (1.1k papers), Biomedical Engineering (628 papers) and Surfaces, Coatings and Films (401 papers) specifically the topics of Advancements in Photolithography Techniques (691 papers), Integrated Circuits and Semiconductor Failure Analysis (264 papers) and Nanofabrication and Lithography Techniques (217 papers). The most active scholars publishing in Journal of Micro/Nanolithography MEMS and MOEMS are Chris A. Mack, Burn J. Lin, Yuri Granik, Min Yang, Bin Yang, Peter De Bisschop, Kin Foong Chan, Yasin Ekinci, James W. Thackeray and A. Hassanein.

In The Last Decade

Fields of papers published in Journal of Micro/Nanolithography MEMS and MOEMS

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Journal of Micro/Nanolithography MEMS and MOEMS. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Journal of Micro/Nanolithography MEMS and MOEMS.

Countries where authors publish in Journal of Micro/Nanolithography MEMS and MOEMS

Since Specialization
Citations

This map shows the geographic impact of research published in Journal of Micro/Nanolithography MEMS and MOEMS. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Journal of Micro/Nanolithography MEMS and MOEMS with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Journal of Micro/Nanolithography MEMS and MOEMS more than expected).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar’s output or impact.

Explore journals with similar magnitude of impact

Rankless by CCL
2025