Joost Bekaert

1.4k total citations
98 papers, 1.0k citations indexed

About

Joost Bekaert is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Joost Bekaert has authored 98 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 78 papers in Electrical and Electronic Engineering, 34 papers in Surfaces, Coatings and Films and 30 papers in Biomedical Engineering. Recurrent topics in Joost Bekaert's work include Advancements in Photolithography Techniques (71 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (27 papers). Joost Bekaert is often cited by papers focused on Advancements in Photolithography Techniques (71 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (27 papers). Joost Bekaert collaborates with scholars based in Belgium, Netherlands and United States. Joost Bekaert's co-authors include V. V. Moshchalkov, Lieve Van Look, G. Borghs, M. J. Van Bael, K. Temst, S. J. Bending, Geert Vandenberghe, Roel Gronheid, Y. Bruynseraede and A. N. Grigorenko and has published in prestigious journals such as Physical Review Letters, Physical review. B, Condensed matter and Applied Physics Letters.

In The Last Decade

Joost Bekaert

89 papers receiving 973 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Joost Bekaert Belgium 17 635 332 316 279 195 98 1.0k
Karen Petrillo United States 17 1.1k 1.7× 124 0.4× 80 0.3× 372 1.3× 90 0.5× 111 1.2k
B. Nilsson Sweden 15 341 0.5× 348 1.0× 124 0.4× 165 0.6× 146 0.7× 52 652
J. Andres Torres United States 12 448 0.7× 46 0.1× 61 0.2× 214 0.8× 307 1.6× 49 786
Jo Finders Netherlands 18 1.0k 1.6× 152 0.5× 18 0.1× 318 1.1× 55 0.3× 128 1.1k
Marcus Duelk Switzerland 18 989 1.6× 424 1.3× 215 0.7× 257 0.9× 73 0.4× 75 1.2k
E. Pargon France 17 848 1.3× 281 0.8× 48 0.2× 210 0.8× 148 0.8× 86 990
Daniel Guidotti United States 18 705 1.1× 293 0.9× 30 0.1× 114 0.4× 119 0.6× 81 975
Miguel A. Gosálvez Japan 21 942 1.5× 252 0.8× 108 0.3× 838 3.0× 320 1.6× 76 1.3k
Andreas Hofmann Germany 12 662 1.0× 349 1.1× 26 0.1× 363 1.3× 47 0.2× 26 959
K.K. Ng United States 20 2.0k 3.1× 533 1.6× 447 1.4× 230 0.8× 570 2.9× 74 2.2k

Countries citing papers authored by Joost Bekaert

Since Specialization
Citations

This map shows the geographic impact of Joost Bekaert's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Joost Bekaert with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Joost Bekaert more than expected).

Fields of papers citing papers by Joost Bekaert

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Joost Bekaert. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Joost Bekaert. The network helps show where Joost Bekaert may publish in the future.

Co-authorship network of co-authors of Joost Bekaert

This figure shows the co-authorship network connecting the top 25 collaborators of Joost Bekaert. A scholar is included among the top collaborators of Joost Bekaert based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Joost Bekaert. Joost Bekaert is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Davydova, Natalia, Vincent Wiaux, Frank Timmermans, et al.. (2024). High NA EUV stitching: mask performance is a key. 9256. 36–36. 1 indexed citations
2.
Philipsen, Vicky, Andreas Frommhold, Inhwan Lee, et al.. (2024). Mask innovations on the eve of high NA EUV lithography. Japanese Journal of Applied Physics. 63(4). 40804–40804. 2 indexed citations
3.
Fukui, Nobuyuki, Kathleen Nafus, Kenichi Miyaguchi, et al.. (2024). Pushing the boundaries of random logic metal patterning with low-n EUV single exposure. 46–46.
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Bekaert, Joost, Lieve Van Look, Joern-Holger Franke, et al.. (2024). High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology. 40–40. 3 indexed citations
8.
Kerkhof, Mark van de, Alexander Klein, Emily Gallagher, et al.. (2023). EUV pellicle scanner integration for N2 nodes and beyond. 21–21. 9 indexed citations
9.
Franke, Joern-Holger, Andreas Frommhold, Natalia Davydova, et al.. (2021). Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align. 27–27. 8 indexed citations
10.
Frommhold, Andreas, et al.. (2019). Predicting stochastic defects across the process window. 10959. 6–6. 2 indexed citations
11.
Look, Lieve Van, et al.. (2018). Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300. 20–20. 15 indexed citations
12.
Kim, Ryoung-Han, Julien Ryckaert, Praveen Raghavan, et al.. (2017). Design and pitch scaling for affordable node transition and EUV insertion scenario. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10148. 101480V–101480V. 9 indexed citations
13.
Bekaert, Joost, et al.. (2016). Influence of template fill in graphoepitaxy DSA. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 97791G–97791G. 3 indexed citations
14.
Ma, Yuansheng, J. Andres Torres, James Word, et al.. (2015). Directed self-assembly graphoepitaxy template generation with immersion lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31216–31216. 5 indexed citations
15.
Li, Fahong, et al.. (2012). High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 83240R–83240R. 3 indexed citations
16.
Bekaert, Joost. (2011). Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells. Journal of Micro/Nanolithography MEMS and MOEMS. 10(1). 13008–13008. 12 indexed citations
17.
Bekaert, Joost, et al.. (2007). Combined illumination sources for hyper-NA contact hole printing. Solid State Technology. 50(11). 48–50. 1 indexed citations
18.
Bekaert, Joost, et al.. (2005). Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5992. 59921O–59921O. 1 indexed citations
19.
Bael, M. J. Van, Joost Bekaert, K. Temst, et al.. (2001). Local Observation of Field Polarity Dependent Flux Pinning by Magnetic Dipoles. Physical Review Letters. 86(1). 155–158. 106 indexed citations
20.
Bekaert, Joost, et al.. (1999). InAs/Al 0.2 Ga 0.8 Sb quantum well Hall sensors with improved temperature stability. Review of Scientific Instruments. 70(6). 2715–2718. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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