Erin Mclellan

482 total citations
8 papers, 126 citations indexed

About

Erin Mclellan is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Erin Mclellan has authored 8 papers receiving a total of 126 indexed citations (citations by other indexed papers that have themselves been cited), including 7 papers in Electrical and Electronic Engineering, 4 papers in Surfaces, Coatings and Films and 4 papers in Biomedical Engineering. Recurrent topics in Erin Mclellan's work include Advancements in Photolithography Techniques (6 papers), Advanced Surface Polishing Techniques (3 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Erin Mclellan is often cited by papers focused on Advancements in Photolithography Techniques (6 papers), Advanced Surface Polishing Techniques (3 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). Erin Mclellan collaborates with scholars based in United States, Germany and Japan. Erin Mclellan's co-authors include Alok Vaid, Boris Sherman, Matthew Sendelbach, Igor Turovets, John A. Allgair, Narender Rana, Cornel Bozdog, Oliver D. Patterson, Karen Petrillo and Benjamin Bunday and has published in prestigious journals such as Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and MRS Proceedings.

In The Last Decade

Erin Mclellan

8 papers receiving 118 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Erin Mclellan United States 5 95 54 46 21 18 8 126
Tom Wallow United States 10 255 2.7× 91 1.7× 129 2.8× 15 0.7× 15 0.8× 32 286
Yao-Ching Ku Taiwan 3 119 1.3× 26 0.5× 15 0.3× 16 0.8× 8 0.4× 7 129
P. Gouraud France 5 115 1.2× 63 1.2× 22 0.5× 14 0.7× 25 1.4× 25 148
A.R. Papazian United States 5 97 1.0× 26 0.5× 27 0.6× 9 0.4× 34 1.9× 9 117
Gijsbert Rispens Netherlands 12 372 3.9× 100 1.9× 223 4.8× 7 0.3× 9 0.5× 41 390
E. Ferry United States 8 143 1.5× 104 1.9× 67 1.5× 4 0.2× 54 3.0× 17 207
A. Opdebeeck Belgium 4 119 1.3× 26 0.5× 8 0.2× 8 0.4× 21 1.2× 4 130
I. Kim South Korea 6 291 3.1× 35 0.6× 19 0.4× 5 0.2× 15 0.8× 10 329
Joana D. Santos Portugal 5 73 0.8× 55 1.0× 8 0.2× 3 0.1× 50 2.8× 6 126
Rich Wise United States 5 184 1.9× 25 0.5× 18 0.4× 13 0.6× 8 0.4× 16 194

Countries citing papers authored by Erin Mclellan

Since Specialization
Citations

This map shows the geographic impact of Erin Mclellan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Erin Mclellan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Erin Mclellan more than expected).

Fields of papers citing papers by Erin Mclellan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Erin Mclellan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Erin Mclellan. The network helps show where Erin Mclellan may publish in the future.

Co-authorship network of co-authors of Erin Mclellan

This figure shows the co-authorship network connecting the top 25 collaborators of Erin Mclellan. A scholar is included among the top collaborators of Erin Mclellan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Erin Mclellan. Erin Mclellan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

8 of 8 papers shown
1.
Patterson, Oliver D., et al.. (2013). In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8681. 86810D–86810D. 24 indexed citations
2.
Vaid, Alok, John A. Allgair, Erin Mclellan, et al.. (2012). Hybrid metrology solution for 1X node technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 832404–832404. 17 indexed citations
3.
McIntyre, Gregory, Daniel Corliss, Jeremy Woods, et al.. (2011). Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 797306–797306. 4 indexed citations
4.
Vaid, Alok, John A. Allgair, Matthew Sendelbach, et al.. (2011). A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797103–797103. 51 indexed citations
5.
Glodde, Martin, Sebastian Engelmann, Michael Guillorn, et al.. (2011). Systematic studies on reactive ion etch-induced deformations of organic underlayers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 797216–797216. 18 indexed citations
6.
Kim, Ryoung-Han, Erin Mclellan, John Arnold, et al.. (2010). Spacer defined double patterning for sub-72 nm pitch logic technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76400F–76400F. 2 indexed citations
7.
Petrillo, Karen, et al.. (2009). Utilization of spin-on and reactive ion etch critical dimension shrink with double patterning for 32 nm and beyond contact level interconnects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72731A–72731A. 7 indexed citations
8.
Mclellan, Erin, Linda Gunnarsson, Tomas Rindzevicius, et al.. (2006). Plasmonic and Diffractive Coupling in 2D Arrays of Nanoparticles produced by Electron Beam Lithography. MRS Proceedings. 951. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Tom Wallow Breakdown of academic impact, for papers by Yao-Ching Ku Breakdown of academic impact, for papers by P. Gouraud Breakdown of academic impact, for papers by A.R. Papazian Breakdown of academic impact, for papers by Gijsbert Rispens Breakdown of academic impact, for papers by E. Ferry Breakdown of academic impact, for papers by A. Opdebeeck Breakdown of academic impact, for papers by I. Kim Breakdown of academic impact, for papers by Joana D. Santos Breakdown of academic impact, for papers by Rich Wise
Rankless by CCL
2026