Jongwook Kye

671 total citations
56 papers, 395 citations indexed

About

Jongwook Kye is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Jongwook Kye has authored 56 papers receiving a total of 395 indexed citations (citations by other indexed papers that have themselves been cited), including 53 papers in Electrical and Electronic Engineering, 18 papers in Biomedical Engineering and 13 papers in Surfaces, Coatings and Films. Recurrent topics in Jongwook Kye's work include Advancements in Photolithography Techniques (41 papers), Nanofabrication and Lithography Techniques (9 papers) and 3D IC and TSV technologies (9 papers). Jongwook Kye is often cited by papers focused on Advancements in Photolithography Techniques (41 papers), Nanofabrication and Lithography Techniques (9 papers) and 3D IC and TSV technologies (9 papers). Jongwook Kye collaborates with scholars based in United States, South Korea and Japan. Jongwook Kye's co-authors include Harry Levinson, Yunfei Deng, Lars W. Liebmann, Yuansheng Ma, Hidekazu Yoshida, G. Bouche, Xuelian Zhu, Lei Yuan, Huixiong Dai and Chris Bencher and has published in prestigious journals such as IEEE Transactions on Electron Devices, Japanese Journal of Applied Physics and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Jongwook Kye

52 papers receiving 378 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jongwook Kye United States 11 368 130 59 35 27 56 395
Cyrus Tabery United States 11 668 1.8× 119 0.9× 32 0.5× 63 1.8× 33 1.2× 50 704
Geng Han United States 11 228 0.6× 96 0.7× 24 0.4× 91 2.6× 19 0.7× 24 288
Jason P. Cain United States 10 432 1.2× 64 0.5× 160 2.7× 81 2.3× 27 1.0× 36 492
Mircea Dusa Netherlands 14 635 1.7× 270 2.1× 77 1.3× 221 6.3× 50 1.9× 109 710
Tomoyuki Matsuyama Japan 9 237 0.6× 155 1.2× 11 0.2× 47 1.3× 57 2.1× 55 288
Gregory McIntyre United States 10 247 0.7× 79 0.6× 16 0.3× 131 3.7× 14 0.5× 39 275
Shayak Banerjee United States 12 389 1.1× 61 0.5× 44 0.7× 9 0.3× 11 0.4× 44 454
Tahone Yang Taiwan 15 521 1.4× 81 0.6× 55 0.9× 17 0.5× 13 0.5× 89 607
Germain Fenger United States 11 309 0.8× 83 0.6× 7 0.1× 75 2.1× 49 1.8× 73 352
David del Rio Spain 12 369 1.0× 62 0.5× 9 0.2× 49 1.4× 8 0.3× 61 400

Countries citing papers authored by Jongwook Kye

Since Specialization
Citations

This map shows the geographic impact of Jongwook Kye's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jongwook Kye with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jongwook Kye more than expected).

Fields of papers citing papers by Jongwook Kye

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jongwook Kye. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jongwook Kye. The network helps show where Jongwook Kye may publish in the future.

Co-authorship network of co-authors of Jongwook Kye

This figure shows the co-authorship network connecting the top 25 collaborators of Jongwook Kye. A scholar is included among the top collaborators of Jongwook Kye based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jongwook Kye. Jongwook Kye is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Song, Taejoong, Woojin Rim, Hoonki Kim, et al.. (2021). 24.3 A 3nm Gate-All-Around SRAM Featuring an Adaptive Dual-BL and an Adaptive Cell-Power Assist Circuit. 338–340. 24 indexed citations
2.
Kye, Jongwook & Soichi Owa. (2019). Optical Microlithography XXXII. 10961. 5 indexed citations
3.
Kye, Jongwook, et al.. (2018). Smart scaling technology for advanced FinFET node. 3 indexed citations
4.
Ma, Yuansheng, Jongwook Kye, Gurdaman Khaira, et al.. (2017). Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with Lamella DSA for sub-7 nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10148. 101480B–101480B. 3 indexed citations
5.
Sun, Lei, et al.. (2017). High throughput and dense sampling metrology for process control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101452D–101452D. 1 indexed citations
6.
Liebmann, Lars W., et al.. (2016). Overcoming scaling barriers through design technology CoOptimization. 1–2. 39 indexed citations
7.
8.
Ma, Yuansheng, Yan Wang, James Word, et al.. (2016). Directed self-assembly compliant flow with immersion lithography: from material to design and patterning. Journal of Micro/Nanolithography MEMS and MOEMS. 15(3). 31610–31610. 4 indexed citations
9.
Yuan, Lei, et al.. (2015). Design and process technology co-optimization with SADP BEOL in sub-10nm SRAM bitcell. 11.2.1–11.2.4. 6 indexed citations
10.
Pistor, Thomas V., et al.. (2015). Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9426. 94260T–94260T. 5 indexed citations
11.
Zhang, Hongbo, Yunfei Deng, Jongwook Kye, & Martin D. F. Wong. (2012). Impact of lithography retargeting process on low level interconnect in 20nm technology. 6154. 3–10. 3 indexed citations
12.
Yuan, Lei, et al.. (2012). Computational study of line tip printability of sub-20-nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 832229–832229. 4 indexed citations
13.
Kye, Jongwook, Yuansheng Ma, Lei Yuan, Yunfei Deng, & Harry Levinson. (2012). Lithography and design integration — New paradigm for the technology architecture development. 7973. 1–4. 5 indexed citations
14.
Brotman, Andrew W., et al.. (2011). Design enablement for yield and area optimization at 20 nm and below. Symposium on VLSI Technology. 108–109.
15.
Deng, Yunfei, Hidekazu Yoshida, Jongwook Kye, et al.. (2011). DPT restricted design rules for advanced logic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730H–79730H. 9 indexed citations
16.
Liebmann, Lars W., et al.. (2010). Taming the final frontier of optical lithography: design for sub-resolution patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7641. 764105–764105. 10 indexed citations
17.
Deng, Yunfei, Yi Zou, Kenji Yoshimoto, et al.. (2010). Considerations in source-mask optimization for logic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76401J–76401J. 16 indexed citations
18.
Kye, Jongwook, et al.. (2007). Polarization aberration analysis using Pauli-Zernike representation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65200Y–65200Y. 18 indexed citations
19.
McIntyre, Gregory, Andrew R. Neureuther, Luigi Capodieci, et al.. (2005). Screening layouts for high-numerical aperture and polarization effects using pattern matching. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2646–2652. 3 indexed citations
20.
Kye, Jongwook & Harry Levinson. (2001). Electrical linewidth measurement for next-generation lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4344. 637–637. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Cyrus Tabery Breakdown of academic impact, for papers by Geng Han Breakdown of academic impact, for papers by Jason P. Cain Breakdown of academic impact, for papers by Mircea Dusa Breakdown of academic impact, for papers by Tomoyuki Matsuyama Breakdown of academic impact, for papers by Gregory McIntyre Breakdown of academic impact, for papers by Shayak Banerjee Breakdown of academic impact, for papers by Tahone Yang Breakdown of academic impact, for papers by Germain Fenger Breakdown of academic impact, for papers by David del Rio
Rankless by CCL
2026