Jongwook Kye
- Hardware and Architecture top 10%
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- Advancements in Photolithography Techniques 41
- 3D IC and TSV technologies 9
- Semiconductor materials and devices 8
- Integrated Circuits and Semiconductor Failure Analysis 7
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- Optical Coatings and Gratings 8
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- Nanofabrication and Lithography Techniques 9
- Advanced Surface Polishing Techniques 7
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- Advanced Measurement and Metrology Techniques 7
- Co-authors
- Harry LevinsonYunfei DengLars W. LiebmannYuansheng MaHidekazu YoshidaG. BoucheXuelian ZhuLei Yuan
- Journals
- Japanese Journal of Applied Physics (1 paper)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Journal of Photopolymer Science and Technology (1 paper)
- Partner nations
- United StatesSouth KoreaJapan
In The Last Decade
Jongwook Kye
52 papers receiving 378 citations
Peers
Comparison fields: 5 of 34
- Hardware and Architecture 59
- Electrical and Electronic Engineering 368
- Surfaces, Coatings and Films 35
- Biomedical Engineering 130
- Media Technology 25
Countries citing papers authored by Jongwook Kye
This map shows the geographic impact of Jongwook Kye's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jongwook Kye with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jongwook Kye more than expected).
Fields of papers citing papers by Jongwook Kye
This network shows the impact of papers produced by Jongwook Kye. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jongwook Kye. The network helps show where Jongwook Kye may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Jongwook Kye, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2021 | 24 | |
| 2 | 2019 | 5 | |
| 3 | 2018 | 3 | |
| 4 | 2017 | 3 | |
| 5 | 2017 | 1 | |
| 6 | 2016 | 39 | |
| 7 | 2016 | 1 | |
| 8 | 2016 | 4 | |
| 9 | 2015 | 6 | |
| 10 | 2015 | 5 | |
| 11 | 2012 | 3 | |
| 12 | 2012 | 4 | |
| 13 | 2012 | 5 | |
| 14 | Design enablement for yield and area optimization at 20 nm and below | 2011 | 0 |
| 15 | 2011 | 9 | |
| 16 | 2010 | 10 | |
| 17 | 2010 | 16 | |
| 18 | 2007 | 18 | |
| 19 | 2005 | 3 | |
| 20 | 2001 | 1 |
About Jongwook Kye
Jongwook Kye is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Hardware and Architecture, Industrial and Manufacturing Engineering and Biomedical Engineering, having authored 56 papers that have together received 395 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (41 papers), Nanofabrication and Lithography Techniques (9 papers), 3D IC and TSV technologies (9 papers), Optical Coatings and Gratings (8 papers), Semiconductor materials and devices (8 papers), Advanced Measurement and Metrology Techniques (7 papers), Advanced Surface Polishing Techniques (7 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). The work is most often cited by research in Hardware and Architecture (59 citations), Electrical and Electronic Engineering (368 citations), Surfaces, Coatings and Films (35 citations), Biomedical Engineering (130 citations) and Media Technology (25 citations). Jongwook Kye has collaborated with scholars based in United States, South Korea and Japan. Frequent co-authors include Harry Levinson, Yunfei Deng, Lars W. Liebmann, Yuansheng Ma, Hidekazu Yoshida, G. Bouche, Xuelian Zhu, Lei Yuan, Huixiong Dai and Chris Bencher. Their work appears in journals such as Japanese Journal of Applied Physics, Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Photopolymer Science and Technology, IEEE Transactions on Electron Devices and 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits).
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.