Patrick Naulleau

4.2k total citations
325 papers, 3.0k citations indexed

About

Patrick Naulleau is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, Patrick Naulleau has authored 325 papers receiving a total of 3.0k indexed citations (citations by other indexed papers that have themselves been cited), including 286 papers in Electrical and Electronic Engineering, 184 papers in Surfaces, Coatings and Films and 106 papers in Radiation. Recurrent topics in Patrick Naulleau's work include Advancements in Photolithography Techniques (268 papers), Electron and X-Ray Spectroscopy Techniques (152 papers) and Integrated Circuits and Semiconductor Failure Analysis (127 papers). Patrick Naulleau is often cited by papers focused on Advancements in Photolithography Techniques (268 papers), Electron and X-Ray Spectroscopy Techniques (152 papers) and Integrated Circuits and Semiconductor Failure Analysis (127 papers). Patrick Naulleau collaborates with scholars based in United States, South Korea and Japan. Patrick Naulleau's co-authors include Kenneth A. Goldberg, Jeffrey Bokor, Gregg M. Gallatin, Eric M. Gullikson, Andrew R. Neureuther, Christopher N. Anderson, Paul Denham, David Attwood, Erik H. Anderson and Jason P. Cain and has published in prestigious journals such as Advanced Materials, The Journal of Chemical Physics and Applied Physics Letters.

In The Last Decade

Patrick Naulleau

301 papers receiving 2.7k citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Patrick Naulleau 2.2k 1.3k 807 647 401 325 3.0k
Frank Siewert 591 0.3× 179 0.1× 1.3k 1.6× 590 0.9× 380 0.9× 99 2.1k
Ralf K. Heilmann 697 0.3× 584 0.5× 350 0.4× 574 0.9× 564 1.4× 148 1.9k
Lynford L. Goddard 1.5k 0.7× 135 0.1× 266 0.3× 1.0k 1.6× 2.1k 5.3× 153 2.9k
F.H. Baumann 1.7k 0.8× 399 0.3× 79 0.1× 262 0.4× 594 1.5× 86 2.5k
Vitaliy A. Guzenko 916 0.4× 208 0.2× 758 0.9× 765 1.2× 808 2.0× 110 2.3k
Hongchang Wang 286 0.1× 128 0.1× 1.0k 1.3× 508 0.8× 358 0.9× 137 1.7k
Uwe D. Zeitner 1.1k 0.5× 545 0.4× 50 0.1× 951 1.5× 861 2.1× 184 2.0k
Peter Z. Takacs 361 0.2× 107 0.1× 399 0.5× 253 0.4× 206 0.5× 107 1.3k
Changqing Xie 443 0.2× 201 0.2× 155 0.2× 471 0.7× 509 1.3× 120 1.3k
P. Wachulak 600 0.3× 157 0.1× 726 0.9× 331 0.5× 710 1.8× 187 1.8k

Countries citing papers authored by Patrick Naulleau

Since Specialization
Citations

This map shows the geographic impact of Patrick Naulleau's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Patrick Naulleau with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Patrick Naulleau more than expected).

Fields of papers citing papers by Patrick Naulleau

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Patrick Naulleau. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Patrick Naulleau. The network helps show where Patrick Naulleau may publish in the future.

Co-authorship network of co-authors of Patrick Naulleau

This figure shows the co-authorship network connecting the top 25 collaborators of Patrick Naulleau. A scholar is included among the top collaborators of Patrick Naulleau based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Patrick Naulleau. Patrick Naulleau is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
McAfee, Terry, et al.. (2023). Study of electron-induced chemical transformations in model resists. 8. 59–59. 2 indexed citations
2.
Albrecht, T. R., et al.. (2023). Nanoscale chemical metrology on latent EUV resist images. 34–34.
3.
Wojtecki, Rudy J., Isvar A. Cordova, Noel Arellano, et al.. (2021). Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition. ACS Applied Materials & Interfaces. 13(7). 9081–9090. 19 indexed citations
4.
Naulleau, Patrick, et al.. (2020). Determination of effective attenuation length of slow electrons in polymer films. Journal of Applied Physics. 127(24). 9 indexed citations
5.
6.
Kostko, Oleg, Bo Xu, Musahid Ahmed, et al.. (2018). Fundamental understanding of chemical processes in extreme ultraviolet resist materials. The Journal of Chemical Physics. 149(15). 154305–154305. 28 indexed citations
7.
Goldberg, Kenneth A., Markus P. Benk, Antoine Wojdyla, et al.. (2014). Actinic mask imaging: recent results and future directions from the SHARP EUV microscope. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480Y–90480Y. 21 indexed citations
8.
Cummings, K. D., L. Girard, Michael Goldstein, et al.. (2013). Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5. eScholarship (California Digital Library). 1 indexed citations
9.
Cummings, K. D., L. Girard, Michael Goldstein, et al.. (2013). Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 867917–867917. 20 indexed citations
10.
Anderson, Christopher N., et al.. (2008). Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise. University of North Texas Digital Library (University of North Texas). 26.
11.
Naulleau, Patrick, Jason P. Cain, Kim Dean, & Kenneth A. Goldberg. (2006). Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure \ntool. eScholarship (California Digital Library). 5 indexed citations
12.
Naulleau, Patrick, et al.. (2005). EUV Binary Phase Gratings: Fabrication and Application toDiffractive Optics. Journal of Vacuum Science and Technology. 24(4). 2 indexed citations
13.
Cain, Jason P., Patrick Naulleau, & Costas J. Spanos. (2005). Critical dimension sensitivity to post-exposure bake temperaturevariation in EUV photoresists. University of North Texas Digital Library (University of North Texas). 4 indexed citations
14.
Naulleau, Patrick, Kenneth A. Goldberg, Erik Anderson, et al.. (2005). Characterization of the synchrotron-based 0.3-NA EUV microexposuretool at the ALS. Journal of Vacuum Science and Technology. 23(6). 1 indexed citations
15.
Naulleau, Patrick, J. Alexander Liddle, Farhad Salmassi, Erik H. Anderson, & Eric M. Gullikson. (2003). Design and fabrication of advanced EUV diffractive elements. University of North Texas Digital Library (University of North Texas). 1 indexed citations
16.
Goldberg, Kenneth A., Patrick Naulleau, Senajith Rekawa, et al.. (2003). At-wavelength interferometry of high-NA diffraction-limited EUV optics. University of North Texas Digital Library (University of North Texas). 1 indexed citations
17.
Naulleau, Patrick & Gregg M. Gallatin. (2003). Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization. Applied Optics. 42(17). 3390–3390. 43 indexed citations
18.
Naulleau, Patrick, Kenneth A. Goldberg, Erik H. Anderson, et al.. (2002). Lithographic characterization of the printability of programmed EUV substrate defects. University of North Texas Digital Library (University of North Texas). 21(4). 1 indexed citations
19.
Chang, Chang, Erik H. Anderson, Patrick Naulleau, et al.. (2001). Direct index of refraction measurement at extreme ultraviolet wavelength region with a novel interferometer. Optics Letters. 27(12). 1 indexed citations
20.
Naulleau, Patrick, Kenneth A. Goldberg, Eric M. Gullikson, & Jeffrey Bokor. (2000). At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. Applied Optics. 39(17). 2941–2941. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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