Patrick Naulleau
About
In The Last Decade
Patrick Naulleau
301 papers receiving 2.7k citations
Peers
Comparison fields: 5 of 81
- Electrical and Electronic Engineering 2.2k
- Surfaces, Coatings and Films 1.3k
- Radiation 807
- Biomedical Engineering 647
- Atomic and Molecular Physics, and Optics 401
Countries citing papers authored by Patrick Naulleau
This map shows the geographic impact of Patrick Naulleau's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Patrick Naulleau with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Patrick Naulleau more than expected).
Fields of papers citing papers by Patrick Naulleau
This network shows the impact of papers produced by Patrick Naulleau. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Patrick Naulleau. The network helps show where Patrick Naulleau may publish in the future.
Co-authorship network of co-authors of Patrick Naulleau
This figure shows the co-authorship network connecting the top 25 collaborators of Patrick Naulleau. A scholar is included among the top collaborators of Patrick Naulleau based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Patrick Naulleau. Patrick Naulleau is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 19 | |
| 3 | 9 | |
| 4 | 2 | |
| 5 | 28 | |
| 6 | 21 | |
| 7 | Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5 | 1 |
| 8 | 20 | |
| 9 | Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise | 0 |
| 10 | 7 | |
| 11 | Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure \ntool | 5 |
| 12 | Critical dimension sensitivity to post-exposure bake temperaturevariation in EUV photoresists | 4 |
| 13 | EUV Binary Phase Gratings: Fabrication and Application toDiffractive Optics | 2 |
| 14 | Characterization of the synchrotron-based 0.3-NA EUV microexposuretool at the ALS | 1 |
| 15 | 30 | |
| 16 | At-wavelength interferometry of high-NA diffraction-limited EUV optics | 1 |
| 17 | Design and fabrication of advanced EUV diffractive elements | 1 |
| 18 | Lithographic characterization of the printability of programmed EUV substrate defects | 1 |
| 19 | Direct index of refraction measurement at extreme ultraviolet wavelength region with a novel interferometer | 1 |
| 20 | 11 |
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.