Bernhard Kneer

412 total citations
15 papers, 286 citations indexed

About

Bernhard Kneer is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Bernhard Kneer has authored 15 papers receiving a total of 286 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 10 papers in Surfaces, Coatings and Films and 6 papers in Biomedical Engineering. Recurrent topics in Bernhard Kneer's work include Advancements in Photolithography Techniques (15 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). Bernhard Kneer is often cited by papers focused on Advancements in Photolithography Techniques (15 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). Bernhard Kneer collaborates with scholars based in Germany and Netherlands. Bernhard Kneer's co-authors include Winfried Kaiser, Jan van Schoot, Jens Timo Neumann, Kars Troost, Eelco van Setten, Gijsbert Rispens, Koen van Ingen Schenau, Paul Gräupner, Jos Benschop and Judon Stoeldraijer and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and SPIE Newsroom.

In The Last Decade

Bernhard Kneer

15 papers receiving 255 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Bernhard Kneer Germany	10	255	137	85	58	16	15	286
Jan Hermans Belgium	11	273 1.1×	140 1.0×	96 1.1×	22 0.4×	17 1.1×	43	306
Koen van Ingen Schenau Netherlands	10	318 1.2×	152 1.1×	119 1.4×	45 0.8×	16 1.0×	28	339
Paul Graeupner Germany	10	261 1.0×	140 1.0×	80 0.9×	33 0.6×	30 1.9×	25	292
Ryoung-Han Kim United States	9	264 1.0×	101 0.7×	71 0.8×	16 0.3×	6 0.4×	54	284
Judon Stoeldraijer Germany	13	378 1.5×	183 1.3×	131 1.5×	50 0.9×	63 3.9×	24	452
Natalia Davydova Netherlands	11	276 1.1×	202 1.5×	32 0.4×	54 0.9×	18 1.1×	47	319
Osamu Suga Japan	12	443 1.7×	266 1.9×	88 1.0×	67 1.2×	20 1.3×	70	463
Jonathan Cobb United States	9	282 1.1×	92 0.7×	106 1.2×	21 0.4×	54 3.4×	41	312
Pedro Vynck Belgium	10	216 0.8×	21 0.2×	113 1.3×	30 0.5×	39 2.4×	38	290
Johannes Ruoff Germany	11	256 1.0×	264 1.9×	143 1.7×	28 0.5×	127 7.9×	21	361

Countries citing papers authored by Bernhard Kneer

Since Specialization

Citations

This map shows the geographic impact of Bernhard Kneer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bernhard Kneer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bernhard Kneer more than expected).

Fields of papers citing papers by Bernhard Kneer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Bernhard Kneer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bernhard Kneer. The network helps show where Bernhard Kneer may publish in the future.

Co-authorship network of co-authors of Bernhard Kneer

This figure shows the co-authorship network connecting the top 25 collaborators of Bernhard Kneer. A scholar is included among the top collaborators of Bernhard Kneer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Bernhard Kneer. Bernhard Kneer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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15 of 15 papers shown

Schoot, Jan van, Kars Troost, Sjoerd Lok, et al.. (2018). The future of EUV lithography: continuing Moore's Law into the next decade. 23–23. 9 indexed citations

Schoot, Jan van, Eelco van Setten, Kars Troost, et al.. (2018). High-NA EUV lithography exposure tool progress (Conference Presentation). 33–33. 2 indexed citations

Schoot, Jan van, Kars Troost, Judon Stoeldraijer, et al.. (2017). The future of EUV lithography: enabling Moore's Law in the next decade. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430G–101430G. 48 indexed citations

Schoot, Jan van, Eelco van Setten, Gijsbert Rispens, et al.. (2017). High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond. Journal of Micro/Nanolithography MEMS and MOEMS. 16(4). 1–1. 44 indexed citations

Schoot, Jan van, Kars Troost, Sjoerd Lok, et al.. (2017). High-NA EUV lithography enabling Moore’s law in the next decade. 30–30. 15 indexed citations

Setten, Eelco van, et al.. (2017). Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography. 32–32. 20 indexed citations

Schoot, Jan van, et al.. (2016). Improving the resolution of extreme-UV lithography scanners. SPIE Newsroom. 1 indexed citations

Schoot, Jan van, Koen van Ingen Schenau, Kars Troost, et al.. (2016). EUV high-NA scanner and mask optimization for sub-8nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97761I–97761I. 11 indexed citations

Neumann, Jens Timo, et al.. (2015). Imaging performance of EUV lithography optics configuration for sub-9nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94221H–94221H. 20 indexed citations

10.

Kneer, Bernhard, et al.. (2015). EUV lithography optics for sub-9nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94221G–94221G. 54 indexed citations

11.

Schoot, Jan van, Koen van Ingen Schenau, Kars Troost, et al.. (2015). EUV High-NA scanner and mask optimization for sub 8 nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9635. 963503–963503. 17 indexed citations

12.

Kneer, Bernhard, et al.. (2015). Anamorphic high-NA EUV lithography optics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9661. 96610T–96610T. 22 indexed citations

13.

Lai, Kafai, Alan E. Rosenbluth, Geng Han, et al.. (2007). Modeling polarization for hyper-NA lithography tools and masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65200D–65200D. 11 indexed citations

14.

Kneer, Bernhard, et al.. (2006). Catadioptric lens design: the breakthrough to hyper-NA optics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 615420–615420. 5 indexed citations

15.

Kerkhof, Mark van de, et al.. (2006). Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61541W–61541W. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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