Matthew Colburn

3.5k total citations
61 papers, 2.3k citations indexed

About

Matthew Colburn is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Matthew Colburn has authored 61 papers receiving a total of 2.3k indexed citations (citations by other indexed papers that have themselves been cited), including 52 papers in Electrical and Electronic Engineering, 35 papers in Biomedical Engineering and 11 papers in Surfaces, Coatings and Films. Recurrent topics in Matthew Colburn's work include Advancements in Photolithography Techniques (50 papers), Nanofabrication and Lithography Techniques (30 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Matthew Colburn is often cited by papers focused on Advancements in Photolithography Techniques (50 papers), Nanofabrication and Lithography Techniques (30 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Matthew Colburn collaborates with scholars based in United States and Japan. Matthew Colburn's co-authors include C. Grant Willson, S. V. Sreenivasan, John G. Ekerdt, Byung Jin Choi, Todd Bailey, T. C. Bailey, Mario Meissl, Shilpa Damle, M. D. Stewart and J. Y. Cheng and has published in prestigious journals such as ACS Nano, IBM Journal of Research and Development and Microelectronic Engineering.

In The Last Decade

Matthew Colburn

58 papers receiving 2.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Matthew Colburn United States	19	1.5k	1.5k	735	518	305	61	2.3k
Yoshihiko Hirai Japan	25	2.0k 1.3×	1.6k 1.1×	326 0.4×	785 1.5×	329 1.1×	241	2.6k
Dan Kercher United States	11	617 0.4×	488 0.3×	1.2k 1.7×	563 1.1×	323 1.1×	19	2.0k
Jane M. Shaw United States	17	792 0.5×	1.1k 0.8×	220 0.3×	235 0.5×	245 0.8×	50	1.6k
Christopher A. Bower United States	24	920 0.6×	1.5k 1.0×	1.1k 1.5×	462 0.9×	48 0.2×	86	2.5k
Urs Duerig Switzerland	23	753 0.5×	660 0.5×	756 1.0×	998 1.9×	68 0.2×	51	1.8k
Hideo Namatsu Japan	25	915 0.6×	1.5k 1.0×	313 0.4×	635 1.2×	272 0.9×	83	1.9k
Eui‐Hyeok Yang United States	29	1.1k 0.7×	1.3k 0.9×	1.4k 2.0×	361 0.7×	123 0.4×	134	2.6k
Wenxiong Lin China	20	463 0.3×	867 0.6×	567 0.8×	486 0.9×	45 0.1×	84	1.7k
Hiroshi Hiroshima Japan	25	1.6k 1.0×	1.6k 1.1×	189 0.3×	484 0.9×	246 0.8×	163	2.0k
N. LaBianca United States	13	996 0.7×	1.2k 0.8×	189 0.3×	327 0.6×	104 0.3×	15	2.0k

Countries citing papers authored by Matthew Colburn

Since Specialization

Citations

This map shows the geographic impact of Matthew Colburn's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Matthew Colburn with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Matthew Colburn more than expected).

Fields of papers citing papers by Matthew Colburn

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Matthew Colburn. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Matthew Colburn. The network helps show where Matthew Colburn may publish in the future.

Co-authorship network of co-authors of Matthew Colburn

This figure shows the co-authorship network connecting the top 25 collaborators of Matthew Colburn. A scholar is included among the top collaborators of Matthew Colburn based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Matthew Colburn. Matthew Colburn is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Chi, Cheng, Chi‐Chun Liu, Luciana Meli, et al.. (2016). DSA via hole shrink for advanced node applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9777. 97770L–97770L. 6 indexed citations

Xu, Yongan, Ramya Viswanathan, Sean Burns, et al.. (2016). Lithographic qualification of high-transmission mask blank for 10nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978006–978006. 1 indexed citations

Goldfarb, Darı́o L., et al.. (2016). Thermomechanical behavior of EUV pellicle under dynamic exposure conditions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977621–977621. 19 indexed citations

Tsai, Hsinyu, Hiroyuki Miyazoe, Joy Cheng, et al.. (2015). Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 942314–942314. 3 indexed citations

Matsui, Yoshinori, et al.. (2013). Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer Blend. Journal of Photopolymer Science and Technology. 26(1). 59–63. 3 indexed citations

Holmes, Steven J., John Arnold, Rex Chen, et al.. (2010). Process characterization of pitch-split resist materials for application at 16nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76392X–76392X.

Koay, Chiew-Seng, et al.. (2010). Automated optimized overlay sampling for high-order processing in double patterning lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7638. 76381R–76381R. 4 indexed citations

Sanders, Daniel P., Joy Cheng, Charles Rettner, et al.. (2010). Integration of Directed Self-Assembly with 193 nm Lithography. Journal of Photopolymer Science and Technology. 23(1). 11–18. 22 indexed citations

Wood, Obert R., Chiew-Seng Koay, Karen Petrillo, et al.. (2009). Integration of EUV lithography in the fabrication of 22-nm node devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727104–727104. 40 indexed citations

10.

Melville, David, et al.. (2009). Source optimization for three-dimensional image designs through film stacks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72743D–72743D. 1 indexed citations

11.

Shedd, Timothy A., et al.. (2008). Static and Dynamic Wetting Characteristics of Nano-patterned Surfaces. Journal of Adhesion Science and Technology. 22(15). 1931–1948. 9 indexed citations

12.

Varanasi, Pushkara R., Linda K. Sundberg, Chris Robinson, et al.. (2007). Building an immersion topcoat from the ground up: materials perspective. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 651907–651907. 4 indexed citations

13.

Black, Charles T., Ricardo Ruiz, Greg Breyta, et al.. (2007). Polymer self assembly in semiconductor microelectronics. IBM Journal of Research and Development. 51(5). 605–633. 345 indexed citations

14.

Colburn, Matthew, Byung Jin Choi, S. V. Sreenivasan, Roger T. Bonnecaze, & C. Grant Willson. (2004). Ramifications of lubrication theory on imprint lithography. Microelectronic Engineering. 75(3). 321–329. 50 indexed citations

15.

Colburn, Matthew. (2001). Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithograph. Texas ScholarWorks (Texas Digital Library). 6 indexed citations

16.

Colburn, Matthew, Annette Grot, Byung Jin Choi, et al.. (2001). Patterning nonflat substrates with a low pressure, room temperature, imprint lithography process. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2162–2172. 47 indexed citations

17.

Bailey, Travis S., Byung Jin Choi, Matthew Colburn, et al.. (2000). Step and Flash Imprint Lithography: A Technology Review. 11(4). 54–67. 1 indexed citations

18.

Choi, Byung Jin, Stephen Johnson, S. V. Sreenivasan, et al.. (2000). Partially Constrained Compliant Stages for High Resolution Imprint Lithography. 861–870. 3 indexed citations

19.

Colburn, Matthew, Stephen C. Johnson, M. D. Stewart, et al.. (1999). Step and flash imprint lithography: a new approach to high-resolution patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 379–379. 428 indexed citations

20.

Ruchhoeft, Paul, Matthew Colburn, Byung Jin Choi, et al.. (1999). Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2965–2969. 118 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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