Thomas I. Wallow

1.7k total citations
63 papers, 1.4k citations indexed

About

Thomas I. Wallow is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Thomas I. Wallow has authored 63 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 20 papers in Surfaces, Coatings and Films and 19 papers in Biomedical Engineering. Recurrent topics in Thomas I. Wallow's work include Advancements in Photolithography Techniques (51 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Thomas I. Wallow is often cited by papers focused on Advancements in Photolithography Techniques (51 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Thomas I. Wallow collaborates with scholars based in United States, Canada and Netherlands. Thomas I. Wallow's co-authors include Bruce M. Novak, Felix E. Goodson, Harry Levinson, Elsa Reichmanis, Omkaram Nalamasu, Robert L. Brainard, Yayi Wei, Karen Petrillo, Yuansheng Ma and F. M. Houlihan and has published in prestigious journals such as Journal of the American Chemical Society, Macromolecules and The Journal of Organic Chemistry.

In The Last Decade

Thomas I. Wallow

61 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Thomas I. Wallow United States	15	648	642	324	178	164	63	1.4k
Larry D. Boardman United States	10	207 0.3×	494 0.8×	83 0.3×	60 0.3×	142 0.9×	13	774
Jiwei Wu China	20	403 0.6×	205 0.3×	88 0.3×	43 0.2×	190 1.2×	74	1.0k
Sebastian Lamping Germany	13	292 0.5×	135 0.2×	141 0.4×	113 0.6×	164 1.0×	21	593
Tianjun Yu China	22	160 0.2×	535 0.8×	228 0.7×	41 0.2×	601 3.7×	76	1.2k
Christina B. Jasieczek United States	10	887 1.4×	96 0.1×	135 0.4×	146 0.8×	190 1.2×	10	1.1k
Matem Erdoğan Türkiye	17	253 0.4×	321 0.5×	239 0.7×	19 0.1×	272 1.7×	76	901
Florian Feist Germany	18	471 0.7×	184 0.3×	184 0.6×	28 0.2×	379 2.3×	43	890
Darren L. Pearson United States	11	496 0.8×	966 1.5×	217 0.7×	26 0.1×	614 3.7×	15	1.5k
Arto Maaninen Finland	15	180 0.3×	500 0.8×	201 0.6×	22 0.1×	110 0.7×	34	780
R. Rülkens Germany	15	330 0.5×	235 0.4×	63 0.2×	60 0.3×	245 1.5×	21	745

Countries citing papers authored by Thomas I. Wallow

Since Specialization

Citations

This map shows the geographic impact of Thomas I. Wallow's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas I. Wallow with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas I. Wallow more than expected).

Fields of papers citing papers by Thomas I. Wallow

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas I. Wallow. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas I. Wallow. The network helps show where Thomas I. Wallow may publish in the future.

Co-authorship network of co-authors of Thomas I. Wallow

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas I. Wallow. A scholar is included among the top collaborators of Thomas I. Wallow based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas I. Wallow. Thomas I. Wallow is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Rio, David del, Sook Lee, Thomas I. Wallow, et al.. (2017). Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431E–101431E. 1 indexed citations

Liu, Peng, Qian Zhao, Qiang Zhang, et al.. (2016). A physical resist shrinkage model for full-chip lithography simulations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 97790Y–97790Y. 5 indexed citations

Yuan, Lei, et al.. (2012). Computational study of line tip printability of sub-20-nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 832229–832229. 4 indexed citations

Wallow, Thomas I.. (2009). Cure-induced photoresist distortions in double patterning. Journal of Micro/Nanolithography MEMS and MOEMS. 8(1). 11010–11010. 7 indexed citations

Davalos, Rafael V., Thomas I. Wallow, Alfredo Morales, et al.. (2007). Performance impact of dynamic surface coatings on polymeric insulator-based dielectrophoretic particle separators. Analytical and Bioanalytical Chemistry. 390(3). 847–855. 45 indexed citations

Wallow, Thomas I., Alfredo Morales, Blake A. Simmons, et al.. (2007). Low-distortion, high-strength bonding of thermoplastic microfluidic devices employing case-II diffusion-mediated permeant activation. Lab on a Chip. 7(12). 1825–1825. 47 indexed citations

Petrillo, Karen, Yayi Wei, Robert L. Brainard, et al.. (2007). Are extreme ultraviolet resists ready for the 32nm node?. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2490–2495. 5 indexed citations

Wallow, Thomas I., et al.. (2007). Progress in EUV photoresist technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6533. 653317–653317. 8 indexed citations

Wallow, Thomas I., et al.. (2007). Characterization of photo-acid redeposition in 193-nm photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65190T–65190T. 6 indexed citations

10.

Thackeray, James W., Robert L. Brainard, Darı́o L. Goldfarb, et al.. (2007). Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 651719–651719. 22 indexed citations

11.

Morales, Alfredo, Blake A. Simmons, Thomas I. Wallow, et al.. (2006). Injection molded microfluidic devices for biological sample separation and detection. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6109. 610901–610901. 2 indexed citations

12.

Wallow, Thomas I., et al.. (2006). Post-etch LER performance of novel surface conditioner solutions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61533Y–61533Y. 8 indexed citations

13.

Sooriyakumaran, Ratnam, Carl E. Larson, Phillip J. Brock, et al.. (2004). 193-nm negative resist based on acid-catalyzed elimination of polar molecules. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 71–71.

14.

Wallow, Thomas I., et al.. (2002). Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 299–299. 8 indexed citations

15.

Kajita, Toru, Yukio Nishimura, Masafumi Yamamoto, et al.. (2001). 193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 712–712. 6 indexed citations

16.

Itô, Hiroshi, Robert D. Allen, Thomas I. Wallow, et al.. (2000). Dissolution/swelling behavior of cycloolefin polymers in aqueous base. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 2–2. 11 indexed citations

17.

Allen, Robert D., Hiroshi Itô, Thomas I. Wallow, et al.. (1999). Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance.. Journal of Photopolymer Science and Technology. 12(3). 501–507. 3 indexed citations

18.

Allen, Robert D., Thomas I. Wallow, Donald C. Hofer, et al.. (1998). Design of an etch-resistant cyclic olefin photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 463–463. 3 indexed citations

19.

Goodson, Felix E., Thomas I. Wallow, & Bruce M. Novak. (1997). Mechanistic Studies on the Aryl−Aryl Interchange Reaction of ArPdL₂I (L = Triarylphosphine) Complexes. Journal of the American Chemical Society. 119(51). 12441–12453. 257 indexed citations

20.

Wallow, Thomas I., Felix E. Goodson, & Bruce M. Novak. (1996). New Methods for the Synthesis of ArPdL₂I (L = Tertiary Phosphine) Complexes. Organometallics. 15(17). 3708–3716. 33 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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