Alessandro Vaglio Pret

508 total citations
64 papers, 408 citations indexed

About

Alessandro Vaglio Pret is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Alessandro Vaglio Pret has authored 64 papers receiving a total of 408 indexed citations (citations by other indexed papers that have themselves been cited), including 63 papers in Electrical and Electronic Engineering, 33 papers in Surfaces, Coatings and Films and 9 papers in Biomedical Engineering. Recurrent topics in Alessandro Vaglio Pret's work include Advancements in Photolithography Techniques (60 papers), Integrated Circuits and Semiconductor Failure Analysis (35 papers) and Electron and X-Ray Spectroscopy Techniques (31 papers). Alessandro Vaglio Pret is often cited by papers focused on Advancements in Photolithography Techniques (60 papers), Integrated Circuits and Semiconductor Failure Analysis (35 papers) and Electron and X-Ray Spectroscopy Techniques (31 papers). Alessandro Vaglio Pret collaborates with scholars based in Belgium, United States and Greece. Alessandro Vaglio Pret's co-authors include Roel Gronheid, John J. Biafore, Peter De Bisschop, Mark D. Smith, Stewart A. Robertson, Todd R. Younkin, Peter De Schepper, Efrain Altamirano Sánchez, Chao Fang and Gustaf Winroth and has published in prestigious journals such as Optics Express, Japanese Journal of Applied Physics and IEEE Electron Device Letters.

In The Last Decade

Alessandro Vaglio Pret

59 papers receiving 364 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Alessandro Vaglio Pret Belgium 12 389 184 98 29 24 64 408
Mark D. Smith United States 11 411 1.1× 208 1.1× 127 1.3× 23 0.8× 17 0.7× 65 429
John J. Biafore United States 13 470 1.2× 284 1.5× 139 1.4× 21 0.7× 11 0.5× 68 486
Jonathan Cobb United States 9 282 0.7× 92 0.5× 106 1.1× 54 1.9× 14 0.6× 41 312
Neal Lafferty United States 11 293 0.8× 129 0.7× 155 1.6× 20 0.7× 16 0.7× 42 368
Frieda Van Roey Belgium 12 403 1.0× 191 1.0× 159 1.6× 28 1.0× 49 2.0× 45 463
Soichi Inoue Japan 11 344 0.9× 144 0.8× 125 1.3× 16 0.6× 31 1.3× 96 412
Jan Hermans Belgium 11 273 0.7× 140 0.8× 96 1.0× 17 0.6× 9 0.4× 43 306
Koen van Ingen Schenau Netherlands 10 318 0.8× 152 0.8× 119 1.2× 16 0.6× 10 0.4× 28 339
Monique Ercken Belgium 11 311 0.8× 38 0.2× 89 0.9× 23 0.8× 24 1.0× 49 331
Ryoung-Han Kim United States 9 264 0.7× 101 0.5× 71 0.7× 6 0.2× 18 0.8× 54 284

Countries citing papers authored by Alessandro Vaglio Pret

Since Specialization
Citations

This map shows the geographic impact of Alessandro Vaglio Pret's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alessandro Vaglio Pret with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alessandro Vaglio Pret more than expected).

Fields of papers citing papers by Alessandro Vaglio Pret

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alessandro Vaglio Pret. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alessandro Vaglio Pret. The network helps show where Alessandro Vaglio Pret may publish in the future.

Co-authorship network of co-authors of Alessandro Vaglio Pret

This figure shows the co-authorship network connecting the top 25 collaborators of Alessandro Vaglio Pret. A scholar is included among the top collaborators of Alessandro Vaglio Pret based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alessandro Vaglio Pret. Alessandro Vaglio Pret is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Keil, M., et al.. (2025). High-resolution hexagonal array patterns fabricated by dipole cross-exposure in deep ultraviolet lithography. Journal of Micro/Nanopatterning Materials and Metrology. 24(1). 1 indexed citations
3.
Huard, Chad M., et al.. (2023). On the origin and evolution of hotspots in multipatterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 41(4).
4.
Huard, Chad M., et al.. (2022). Trilayer hard mark lithography and etch for BEOL manufacturing. 110–110. 4 indexed citations
5.
Agarwal, Ankur, Chad M. Huard, Alessandro Vaglio Pret, et al.. (2022). Evolution of lithography-to-etch bias in multi-patterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(6). 2 indexed citations
6.
Pret, Alessandro Vaglio, et al.. (2018). Non‐Gaussian CD distribution characterization for DRAM application in EUV lithography. 9–9. 2 indexed citations
7.
Pret, Alessandro Vaglio, et al.. (2017). Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 1014609–1014609. 22 indexed citations
8.
Winroth, Gustaf, et al.. (2014). Modeling the lithography of ion implantation resists on topography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9052. 90520Z–90520Z. 2 indexed citations
9.
Constantoudis, Vassilios, et al.. (2013). Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher. Journal of Micro/Nanolithography MEMS and MOEMS. 12(2). 23003–23003. 7 indexed citations
10.
Blomme, Pieter, Alessandro Vaglio Pret, Roel Gronheid, et al.. (2012). Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories. Microelectronics Reliability. 52(3). 525–529. 3 indexed citations
11.
Pret, Alessandro Vaglio, Roel Gronheid, Jan Engelen, et al.. (2012). Evidence of speckle in extreme-UV lithography. Optics Express. 20(23). 25970–25970. 6 indexed citations
12.
Pret, Alessandro Vaglio & Roel Gronheid. (2011). Mask line roughness contribution in EUV lithography. Microelectronic Engineering. 88(8). 2167–2170. 4 indexed citations
13.
Pret, Alessandro Vaglio, et al.. (2011). Stochastic limitations for EUV resist kinetics towards the 16nm node. 3 indexed citations
14.
Constantoudis, Vassilios, et al.. (2011). Contact edge roughness (CER) characterization and modeling: effects of dose on CER and critical dimension (CD) variation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 79710Q–79710Q. 2 indexed citations
15.
Blomme, Pieter, et al.. (2011). Bridging Lithography Processes with NAND Flash ECC Complexity. 30. 1–4. 1 indexed citations
16.
Gronheid, Roel, et al.. (2010). EUV RLS performance tradeoffs for a polymer bound PAG resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76390M–76390M. 9 indexed citations
17.
Pret, Alessandro Vaglio. (2010). Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes. Journal of Micro/Nanolithography MEMS and MOEMS. 9(4). 41203–41203. 15 indexed citations
18.
Pret, Alessandro Vaglio & Roel Gronheid. (2009). Line Width Roughness mitigation in chemically amplified resist by post-litho processes. Microelectronic Engineering. 87(5-8). 1127–1130. 12 indexed citations
19.
Nafus, Kathleen, et al.. (2009). Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 727347–727347. 12 indexed citations
20.
Gronheid, Roel, et al.. (2009). Effect of PAG Distribution on ArF and EUV Resist Performance. Journal of Photopolymer Science and Technology. 22(1). 97–104. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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