Lawrence S. Melvin
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 26
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- Industrial Vision Systems and Defect Detection 27
- Manufacturing Process and Optimization 9
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- Advancements in Photolithography Techniques 66
- Integrated Circuits and Semiconductor Failure Analysis 26
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- Image Processing Techniques and Applications 6
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- Nanofabrication and Lithography Techniques 7
- Advanced Surface Polishing Techniques 6
- Co-authors
- R. JonckheereMark WeislogelQiliang YanAllyn C. HowlettJianliang LiWeimin GaoEric HendrickxCharlie Chung‐Ping Chen
- Cited by
- Surfaces, Coatings and FilmsIndustrial and Manufacturing EngineeringElectrical and Electronic Engineering
- Journals
- Microelectronic Engineering (7 papers)Japanese Journal of Applied Physics (3 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (3 papers)
- Partner nations
- United StatesBelgiumSwitzerland
In The Last Decade
Lawrence S. Melvin
69 papers receiving 300 citations
Peers
Comparison fields: 5 of 61
- Surfaces, Coatings and Films 106
- Industrial and Manufacturing Engineering 45
- Electrical and Electronic Engineering 221
- Media Technology 25
- Biomedical Engineering 75
Countries citing papers authored by Lawrence S. Melvin
This map shows the geographic impact of Lawrence S. Melvin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Lawrence S. Melvin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Lawrence S. Melvin more than expected).
Fields of papers citing papers by Lawrence S. Melvin
This network shows the impact of papers produced by Lawrence S. Melvin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Lawrence S. Melvin. The network helps show where Lawrence S. Melvin may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Lawrence S. Melvin, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 1 | |
| 2 | 2024 | 1 | |
| 3 | 2024 | 2 | |
| 4 | 2023 | 2 | |
| 5 | 2023 | 1 | |
| 6 | 2021 | 4 | |
| 7 | 2018 | 1 | |
| 8 | 2018 | 2 | |
| 9 | 2017 | 5 | |
| 10 | 2016 | 0 | |
| 11 | 2008 | 1 | |
| 12 | 2008 | 6 | |
| 13 | 2007 | 1 | |
| 14 | 2007 | 6 | |
| 15 | 2007 | 3 | |
| 16 | 2007 | 1 | |
| 17 | 2005 | 3 | |
| 18 | 2003 | 3 | |
| 19 | 2003 | 5 | |
| 20 | 1995 | 12 |
About Lawrence S. Melvin
Lawrence S. Melvin is a scholar working on Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Electrical and Electronic Engineering, having authored 82 papers that have together received 315 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (66 papers), Industrial Vision Systems and Defect Detection (27 papers), Electron and X-Ray Spectroscopy Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (26 papers), Manufacturing Process and Optimization (9 papers), Nanofabrication and Lithography Techniques (7 papers), Advanced Surface Polishing Techniques (6 papers) and Image Processing Techniques and Applications (6 papers). The work is most often cited by research in Surfaces, Coatings and Films (106 citations), Industrial and Manufacturing Engineering (45 citations) and Electrical and Electronic Engineering (221 citations). Lawrence S. Melvin has collaborated with scholars based in United States, Belgium and Switzerland. Frequent co-authors include R. Jonckheere, Mark Weislogel, Qiliang Yan, Allyn C. Howlett, Jianliang Li, Weimin Gao, Eric Hendrickx, Jianliang Li, Charlie Chung‐Ping Chen and Vicky Philipsen. Their work appears in journals such as Microelectronic Engineering, Japanese Journal of Applied Physics, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Current Pharmaceutical Design and Advanced Optical Technologies.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.