Mark van Dal

450 citations

26 papers · 285 indexed · h-index 10

Atomic and Molecular Physics, and Optics top 10%
- Semiconductor materials and interfaces 18
Structural Biology
Electrical and Electronic Engineering
- Silicon and Solar Cell Technologies 15
- Semiconductor materials and devices 13
- Advancements in Semiconductor Devices and Circuit Design 4
- Advanced Semiconductor Detectors and Materials 1
Biomedical Engineering
- Advanced Surface Polishing Techniques 1
Materials Chemistry
- Silicon Nanostructures and Photoluminescence 2
Mechanical Engineering
- Aluminum Alloys Composites Properties 2

Co-authors: Karen Maex J. A. Kittl O. Chamirian A. Lauwers Richard Lindsay A. Akheyar M. de Potter Olivier Richard
Cited by: Atomic and Molecular Physics, and Optics Structural Biology Electrical and Electronic Engineering
Journals: Microelectronic Engineering (4 papers)Scientific Reports (1 paper)ACS Applied Electronic Materials (1 paper)
Partner nations: Belgium United States Taiwan

In The Last Decade

Mark van Dal

24 papers receiving 274 citations

Peers

Countries citing papers authored by Mark van Dal

Since Specialization

Citations

This map shows the geographic impact of Mark van Dal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark van Dal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark van Dal more than expected).

Fields of papers citing papers by Mark van Dal

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark van Dal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark van Dal. The network helps show where Mark van Dal may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Mark van Dal, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mark van Dal Line = papers co-authored together Mark van Dal links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Demonstration of Ferroelectric FET Memory with Oxide Semiconductor Channel to Achieve Smallest Cell Area 0.009 μm ² and High Endurance for Non-Volatile High-Bandwidth Memory Applications Chun‐Chieh Lu,Yu‐Chuan Shih,Chih‐Yu Chang,平木章夫,Ji MH,Stephen Doh-Fia,N. Japikse,York Hsiang,菅野智之,Yongxun Liu,Roula Alio,Riikka Lavonen,学斎木,G. Doornbos,G. Vellianitis,Mark van Dal,Du Aobo,Hermann Cölfen	2024	3
2	Engineering Strain and Texture in Ferroelectric Scandium-Doped Aluminium Nitride ACS Applied Electronic Materials ·S. R. C. McMitchell,A. Walke,Kaustuv Banerjee,S. Mertens,Kenji Tsukahara,Ming Mao,St. Zschocke,G. Vellianitis,Mark van Dal,Yu-Ming Lin,G. Van den bosch,Romain Delhougne,Gouri Sankar Kar	2023	16
3	Atomically flat and uniform relaxed III–V epitaxial films on silicon substrate for heterogeneous and hybrid integration Scientific Reports ·M. Holland,Mark van Dal,B. Duriez,N. Hristea,G. Vellianitis,G. Doornbos,Aryan Afzalian,Ta-Kun Chen,昭雄野澤,P. Ramvall,T. Vasen,Yee‐Chia Yeo,M. Passlack	2017	5
4	E-MRS Spring Meeting 2015 Symposium Z: Nanomaterials and processes for advanced semiconductor CMOS devices Materials Science in Semiconductor Processing ·E. Napolitani,Ray Duffy,Przybecki Zbigniew,Mark van Dal	2015	1
5	Stress simulations for optimal mobility group IV p- and nMOS FinFETs for the 14 nm node and beyond Geert Eneman,D.P. Brunco,Liesbeth Witters,Benjamin Vincent,Paola Favia,Andriy Hikavyy,A. De Keersgieter,Jérôme Mitard,Roger Loo,A. Veloso,Olivier Richard,H. Bender,Jody Sisk,Mark van Dal,Juwan Seo,Wilfried Vandervorst,Matty Caymax,Naoto Horiguchi,Nadine Collaert,Aaron Thean	2012	29
6	Experimental studies of dose retention and activation in FinFet-based structures Jay Mody,Ray Duffy,Pierre Eyben,Essi Varhia,Alain Moussa,W. Polspoel,Qi Zhi Yao,Mark van Dal,Bartek Pawlak,M. Kaiser,R.G.R. Weemaes,Wilfried Vandervorst	2009	2
7	Doping of Sub-50nm SOI Layers MRS Proceedings ·Bartek Pawlak,Ray Duffy,Mark van Dal,F. C. Voogt,R.G.R. Weemaes,F. Roozeboom,P. C. Zalm,Nick S. Bennett,N. E. B. Cowern	2008	2
8	Ni, Pt and Yb Based Fully Silicided (FUSI) Gates for Scaled CMOS Technologies ECS Transactions ·J. A. Kittl,A. Lauwers,Mark van Dal,Hongyu Yu,A. Veloso,Aurea Tamami Minagawa Toriyama,Małgorzata Pawlak,C. Demeurisse,Stefan Kubicek,M. Niwa,C. Vrancken,Рощин Виталий Юрьевич,S. Biesemans	2006	1
9	Materials Issues of Ni Fully Silicided (FUSI) Gates for CMOS Applications ECS Meeting Abstracts ·J. A. Kittl,A. Lauwers,Mark van Dal,C. Demeurisse,刘晓越,A. Veloso,Małgorzata Pawlak,John Cunniffe,T. Schram,Maria Barrdahl,D Ciullo,Stefan Kubicek,Karen Maex	2006	1
10	Modulation of the Ni FUSI workfunction by Yb doping: from midgap to n-type band-edge H.Y. Yu,Raúl Ernesto Cartagena Carvajal,M.F. Li,不二夫水野,D. L. Kwong,Mark van Dal,J. A. Kittl,A. Lauwers,E. Augendre,S. Kubicek,Chao Zhao,H. Bender,Bert Brijs,Kunteenun Nokkunthong,Grigory K. Ivakhnyuk,P. Absil,M. Jurczak,S. Biesemans	2006	3
11	Low temperature spike anneal for Ni-silicide formation Microelectronic Engineering ·A. Lauwers,J. A. Kittl,Mark van Dal,O. Chamirian,Richard Lindsay,M. de Potter,C. Demeurisse,C. Vrancken,Karen Maex,Xavier Llimona i Pagès,Yu-Xia,Victor P. Kuznetsov,E.H.A. Granneman	2004	16
12	Effects of Alloying on Properties of NiSi for CMOS Applications MRS Proceedings ·Mark van Dal,A. Akheyar,J. A. Kittl,O. Chamirian,М. Жумабаева,C. Demeurisse,A. Lauwers,Karen Maex	2004	2
13	Reaction of Ni and Si0.8Ge0.2: phase formation and thermal stability Microelectronic Engineering ·O. Chamirian,Yoshihide Miyawaki,J. A. Kittl,Mark van Dal,M. de Potter,Richard Lindsay,Karen Maex	2004	11
14	Applications of Ni-based silicides to 45 nm CMOS and Beyond MRS Proceedings ·J. A. Kittl,A. Lauwers,O. Chamirian,Małgorzata Pawlak,Mark van Dal,A. Akheyar,N.S. Desyatov,Anil Kottantharayil,Geoffrey Pourtois,Richard Lindsay,Karen Maex	2004	17
15	Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction Materials Science and Engineering B ·A. Benedetti,H. Bender,C. Torregiani,Mark van Dal,Karen Maex	2004	15
16	Ni Silicide Morphology On Small Features MRS Proceedings ·O. Chamirian,A. Lauwers,J. A. Kittl,Mark van Dal,N.S. Desyatov,C. Vrancken,Richard Lindsay,Karen Maex	2004	5
17	Thickness scaling issues of Ni silicide Microelectronic Engineering ·O. Chamirian,J. A. Kittl,A. Lauwers,Olivier Richard,Mark van Dal,Karen Maex	2003	29
18	Ni-based silicides: material issues for advanced CMOS applications J. A. Kittl,A. Lauwers,O. Chamirian,Mark van Dal,A. Akheyar,Olivier Richard,J. G. Lisoni,N.S. Desyatov,Richard Lindsay,Karen Maex	2003	2
19	Silicide scaling: Co, Ni or CoNi ? A. Lauwers,J. A. Kittl,A. Akheyar,Mark van Dal,O. Chamirian,M. de Potter,Richard Lindsay,Karen Maex	2003	0
20	Silicides for 65nm CMOS and beyond J. A. Kittl,A. Lauwers,O. Chamirian,Mark van Dal,A. Akheyar,Olivier Richard,J. G. Lisoni,Muriel de Potter de ten Broeck,Richard Lindsay,Karen Maex	2003	0

About Mark van Dal

Mark van Dal is a scholar working on Structural Biology, Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Materials Chemistry and Condensed Matter Physics, having authored 26 papers that have together received 285 indexed citations. Recurring topics across this work include Semiconductor materials and interfaces (18 papers), Silicon and Solar Cell Technologies (15 papers), Semiconductor materials and devices (13 papers), Advancements in Semiconductor Devices and Circuit Design (4 papers), Aluminum Alloys Composites Properties (2 papers), Silicon Nanostructures and Photoluminescence (2 papers), Advanced Semiconductor Detectors and Materials (1 paper) and Advanced Surface Polishing Techniques (1 paper). The work is most often cited by research in Atomic and Molecular Physics, and Optics (204 citations), Structural Biology (8 citations), Electrical and Electronic Engineering (256 citations), Biomedical Engineering (60 citations) and Materials Chemistry (56 citations). Mark van Dal has collaborated with scholars based in Belgium, United States and Taiwan. Frequent co-authors include Karen Maex, J. A. Kittl, O. Chamirian, A. Lauwers, Richard Lindsay, A. Akheyar, M. de Potter, Olivier Richard, H. Bender and C. Torregiani. Their work appears in journals such as Microelectronic Engineering, Scientific Reports, ACS Applied Electronic Materials, Materials Science and Engineering B and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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