O. Chamirian

444 total citations
20 papers, 347 citations indexed

About

O. Chamirian is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, O. Chamirian has authored 20 papers receiving a total of 347 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Atomic and Molecular Physics, and Optics, 17 papers in Electrical and Electronic Engineering and 3 papers in Materials Chemistry. Recurrent topics in O. Chamirian's work include Semiconductor materials and interfaces (20 papers), Silicon and Solar Cell Technologies (15 papers) and Semiconductor materials and devices (10 papers). O. Chamirian is often cited by papers focused on Semiconductor materials and interfaces (20 papers), Silicon and Solar Cell Technologies (15 papers) and Semiconductor materials and devices (10 papers). O. Chamirian collaborates with scholars based in Belgium, United States and Italy. O. Chamirian's co-authors include Karen Maex, A. Lauwers, J. A. Kittl, Richard Lindsay, Mark van Dal, M. de Potter, A. Akheyar, C. Vrancken, C. Demeurisse and Małgorzata Pawlak and has published in prestigious journals such as Journal of Applied Physics, Nanotechnology and Materials Science and Engineering B.

In The Last Decade

O. Chamirian

18 papers receiving 328 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
O. Chamirian Belgium	11	311	306	59	50	13	20	347
Kian-Ming Tan Singapore	11	339 1.1×	135 0.4×	81 1.4×	54 1.1×	10 0.8×	22	362
S.-L. Zhang Sweden	10	354 1.1×	324 1.1×	92 1.6×	48 1.0×	32 2.5×	11	408
M. Bădilă Romania	11	390 1.3×	217 0.7×	48 0.8×	67 1.3×	17 1.3×	59	406
Y. Ushiku Japan	7	258 0.8×	147 0.5×	44 0.7×	32 0.6×	21 1.6×	29	288
Isaac R. Storch United States	5	205 0.7×	275 0.9×	109 1.8×	105 2.1×	9 0.7×	5	339
Mark van Dal Belgium	10	256 0.8×	204 0.7×	56 0.9×	60 1.2×	9 0.7×	26	285
Deepak A. Ramappa United States	12	313 1.0×	155 0.5×	47 0.8×	23 0.5×	6 0.5×	19	335
Markus Herz Germany	7	148 0.5×	253 0.8×	36 0.6×	82 1.6×	10 0.8×	10	285
A. Naem Canada	9	272 0.9×	105 0.3×	62 1.1×	40 0.8×	7 0.5×	28	311
Mitsushi Suzuno Japan	12	299 1.0×	353 1.2×	142 2.4×	23 0.5×	15 1.2×	20	377

Countries citing papers authored by O. Chamirian

Since Specialization

Citations

This map shows the geographic impact of O. Chamirian's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by O. Chamirian with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites O. Chamirian more than expected).

Fields of papers citing papers by O. Chamirian

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by O. Chamirian. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by O. Chamirian. The network helps show where O. Chamirian may publish in the future.

Co-authorship network of co-authors of O. Chamirian

This figure shows the co-authorship network connecting the top 25 collaborators of O. Chamirian. A scholar is included among the top collaborators of O. Chamirian based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with O. Chamirian. O. Chamirian is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Volodin, Alexander, Chris Van Haesendonck, O. Chamirian, et al.. (2010). Direct observation of preferential heating near grain boundaries in patterned silicide films. Journal of Applied Physics. 108(6). 2 indexed citations

Lauwers, A., M.J.H. van Dal, Peter Verheyen, et al.. (2006). Study of silicide contacts to SiGe source/drain. Microelectronic Engineering. 83(11-12). 2268–2271. 7 indexed citations

Hove, M. Van, Youssef Travaly, Timo Sajavaara, et al.. (2005). Study of thermal stability of nickel silicide by X-ray reflectivity. Microelectronic Engineering. 82(3-4). 492–496. 5 indexed citations

Lauwers, A., J. A. Kittl, Mark van Dal, et al.. (2004). Low temperature spike anneal for Ni-silicide formation. Microelectronic Engineering. 76(1-4). 303–310. 16 indexed citations

Dal, Mark van, A. Akheyar, J. A. Kittl, et al.. (2004). Effects of Alloying on Properties of NiSi for CMOS Applications. MRS Proceedings. 810. 2 indexed citations

Chamirian, O., J. A. Kittl, Mark van Dal, et al.. (2004). Reaction of Ni and Si0.8Ge0.2: phase formation and thermal stability. Microelectronic Engineering. 76(1-4). 297–302. 11 indexed citations

Kittl, J. A., A. Lauwers, O. Chamirian, et al.. (2004). Applications of Ni-based silicides to 45 nm CMOS and Beyond. MRS Proceedings. 810. 17 indexed citations

Chamirian, O., A. Lauwers, J. A. Kittl, et al.. (2004). Ni Silicide Morphology On Small Features. MRS Proceedings. 810. 5 indexed citations

Pawlak, Małgorzata, J. A. Kittl, O. Chamirian, et al.. (2004). Investigation of Ni fully silicided gates for sub-45 nm CMOS technologies. Microelectronic Engineering. 76(1-4). 349–353. 20 indexed citations

10.

Lauwers, A., J. A. Kittl, M.J.H. van Dal, et al.. (2004). Ni based silicides for 45nm CMOS and beyond. Materials Science and Engineering B. 114-115. 29–41. 53 indexed citations

11.

Chamirian, O., J. A. Kittl, A. Lauwers, et al.. (2003). Thickness scaling issues of Ni silicide. Microelectronic Engineering. 70(2-4). 201–208. 29 indexed citations

12.

Kittl, J. A., A. Lauwers, O. Chamirian, et al.. (2003). Ni-based silicides: material issues for advanced CMOS applications. 177–182. 2 indexed citations

13.

Lauwers, A., J. A. Kittl, A. Akheyar, et al.. (2003). Silicide scaling: Co, Ni or CoNi ?. 167–176.

14.

Kittl, J. A., A. Lauwers, O. Chamirian, et al.. (2003). Silicides for 65nm CMOS and beyond.

15.

Kittl, J. A., A. Lauwers, O. Chamirian, et al.. (2003). Silicides for 65 nm CMOS and Beyond. MRS Proceedings. 765. 15 indexed citations

16.

Kittl, J. A., A. Lauwers, O. Chamirian, et al.. (2003). Ni- and Co-based silicides for advanced CMOS applications. Microelectronic Engineering. 70(2-4). 158–165. 94 indexed citations

17.

Lauwers, A., M. de Potter, O. Chamirian, et al.. (2002). Silicides for the 100-nm node and beyond: Co-silicide, Co(Ni)-silicide and Ni-silicide. Microelectronic Engineering. 64(1-4). 131–142. 47 indexed citations

18.

Chamirian, O., An Steegen, H. Bender, et al.. (2002). Study of CoSi2 formation from a Co–Ni alloy. Microelectronic Engineering. 60(1-2). 221–230. 10 indexed citations

19.

Chamirian, O., et al.. (2002). Mapping nanometre-scale temperature gradients in patterned cobalt-nickel silicide films. Nanotechnology. 13(2). 149–152. 10 indexed citations

20.

Chamirian, O., A. Lauwers, C. Demeurisse, et al.. (2002). CoSi2 formation from CoxNi1−x/Ti system. Microelectronic Engineering. 64(1-4). 173–180. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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