F.H. Baumann

3.7k total citations · 1 hit paper
86 papers, 2.5k citations indexed

About

F.H. Baumann is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, F.H. Baumann has authored 86 papers receiving a total of 2.5k indexed citations (citations by other indexed papers that have themselves been cited), including 61 papers in Electrical and Electronic Engineering, 24 papers in Atomic and Molecular Physics, and Optics and 22 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in F.H. Baumann's work include Semiconductor materials and devices (41 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Copper Interconnects and Reliability (21 papers). F.H. Baumann is often cited by papers focused on Semiconductor materials and devices (41 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Copper Interconnects and Reliability (21 papers). F.H. Baumann collaborates with scholars based in United States, Germany and France. F.H. Baumann's co-authors include G. Timp, T. Sorsch, K. Evans‐Lutterodt, David A. Muller, S. Moccio, A. Ourmazd, Peter Schwander, Y. Kim, W.D. Rau and W. Höppner and has published in prestigious journals such as Nature, Physical Review Letters and Physical review. B, Condensed matter.

In The Last Decade

F.H. Baumann

81 papers receiving 2.3k citations

Hit Papers

align trajectories sort by overperformance

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

The electronic structure at the atomic scale of ultrathin gate oxides

1999 780 citations T. Sorsch, S. Moccio et al. profile →

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author						Papers	Cites
F.H. Baumann	1.7k	820	594	399	367	86	2.5k
Paul F. A. Alkemade	1.1k 0.6×	970 1.2×	744 1.3×	348 0.9×	216 0.6×	84	2.2k
L. R. Harriott	1.2k 0.7×	350 0.4×	654 1.1×	354 0.9×	109 0.3×	102	1.9k
David G. Seiler	1.2k 0.7×	514 0.6×	1.2k 2.0×	178 0.4×	65 0.2×	273	2.1k
E. A. Dobisz	1.4k 0.8×	1.9k 2.3×	1.5k 2.6×	616 1.5×	107 0.3×	97	3.8k
S. A. Rishton	2.1k 1.2×	474 0.6×	1.5k 2.5×	349 0.9×	61 0.2×	76	3.1k
P. J. Silvėrman	3.0k 1.7×	1.2k 1.5×	2.6k 4.3×	480 1.2×	95 0.3×	117	4.8k
Bert Voigtländer	1.5k 0.9×	1.3k 1.5×	3.1k 5.2×	194 0.5×	123 0.3×	118	3.9k
J. M. Woodall	1.8k 1.0×	586 0.7×	2.0k 3.4×	377 0.9×	60 0.2×	98	2.8k
N. P. Economou	503 0.3×	282 0.3×	782 1.3×	189 0.5×	90 0.2×	48	1.5k
Bolin Liao	1.1k 0.6×	2.3k 2.8×	551 0.9×	91 0.2×	155 0.4×	85	3.0k

Countries citing papers authored by F.H. Baumann

Since Specialization

Citations

This map shows the geographic impact of F.H. Baumann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F.H. Baumann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F.H. Baumann more than expected).

Fields of papers citing papers by F.H. Baumann

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by F.H. Baumann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F.H. Baumann. The network helps show where F.H. Baumann may publish in the future.

Co-authorship network of co-authors of F.H. Baumann

This figure shows the co-authorship network connecting the top 25 collaborators of F.H. Baumann. A scholar is included among the top collaborators of F.H. Baumann based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with F.H. Baumann. F.H. Baumann is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Zhang, Yu, et al.. (2024). Unlocking Insights into 3D Transistor Defects: The Power of Supplementing TEM with Elemental Electron Tomography. Proceedings - International Symposium for Testing and Failure Analysis. 84918. 374–376.

Baumann, F.H., et al.. (2024). Parameters Influencing Space Charge Density in Vessels by Spraying Water. Journal of Physics Conference Series. 2702(1). 12024–12024.

Baumann, F.H., et al.. (2021). Charge-separating processes by spraying water under high pressure. Journal of Loss Prevention in the Process Industries. 72. 104527–104527. 1 indexed citations

Baumann, F.H., et al.. (2019). Extension of CD-TEM towards EDS Tomography. 1–5. 1 indexed citations

Witt, C., et al.. (2017). Resistance contributions to copper interconnects. 1–3. 2 indexed citations

Yang, C.-C., et al.. (2015). Enhanced electromigration resistance through grain size modulation in copper interconnects. 1–5. 2 indexed citations

Weng, Weihao, et al.. (2015). Practical Considerations in Quantitative Nanoscale Energy-Dispersive X-ray Spectroscopy (EDX) and Its Application in SiGe. Microscopy and Microanalysis. 21(S3). 1087–1088. 3 indexed citations

Lavoie, C., Ahmet S. Özcan, F.H. Baumann, et al.. (2014). Challenges of nickel silicidation in CMOS technologies. Microelectronic Engineering. 137. 79–87. 45 indexed citations

Baumann, F.H., et al.. (2013). Dependence of Cu electromigration resistance on selectively deposited CVD Co cap thickness. Microelectronic Engineering. 106. 214–218. 16 indexed citations

10.

Ogino, Atsushi, et al.. (2011). Moisture Uptake Impact on Damage Layer of Porous Low-k Film in 80nm-Pitched Cu Interconnects. ECS Transactions. 41(7). 405–413. 5 indexed citations

11.

Fuchs, D. T., H. B. Chan, H.R. Stuart, et al.. (2004). Monolithic integration of MEMS-based phase shifters and optical waveguides in silicon-on-insulator. Electronics Letters. 40(2). 142–143. 11 indexed citations

12.

Weir, B. E., P. J. Silvėrman, D. Monroe, et al.. (2002). Ultra-thin gate dielectrics: they break down, but do they fail?. 73–76. 120 indexed citations

13.

Sorsch, T., Winston Timp, F.H. Baumann, et al.. (2002). Ultra-thin, 1.0-3.0 nm, gate oxides for high performance sub-100 nm technology. 222–223. 9 indexed citations

14.

Weir, B. E., Md Ashraful Alam, J. Bude, et al.. (2000). Gate oxide reliability projection to the sub-2 nm regime. Semiconductor Science and Technology. 15(5). 455–461. 66 indexed citations

15.

Ma, Y., H.-H. Vuong, F.H. Baumann, et al.. (1999). Enabling shallow trench isolation for 0.1 /spl mu/m technologies and beyond. 161–162. 4 indexed citations

16.

Baumann, F.H., A. Ghetti, H.-H. Vuong, et al.. (1999). Severe thickness variation of sub-3 nm gate oxide due to Si surface faceting, poly-Si intrusion, and corner stress. 75–76. 8 indexed citations

17.

Schwander, Peter, Christian Kisielowski, M. Seibt, et al.. (1993). Mapping projected potential, interfacial roughness, and composition in general crystalline solids by quantitative transmission electron microscopy. Physical Review Letters. 71(25). 4150–4153. 71 indexed citations

18.

Baumann, F.H., M. Bode, Y. Kim, & A. Ourmazd. (1992). Quantitative chemical mapping: Spatial resolution. Ultramicroscopy. 47(1-3). 167–172. 11 indexed citations

19.

Schwedler, R., K. Wolter, A. Köhl, et al.. (1992). Interface properties of strained InGaAs/InP quantum wells grown by LP-MOVPE. Microelectronic Engineering. 19(1-4). 891–894. 4 indexed citations

20.

Pénisson, J. M., M. Bode, F.H. Baumann, & A. Ourmazd. (1991). Chemical lattice imaging of a Ni-based superalloy. Philosophical Magazine Letters. 64(5). 269–276. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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