F.H. Baumann

3.7k total citations · 1 hit paper
86 papers, 2.5k citations indexed

About

F.H. Baumann is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, F.H. Baumann has authored 86 papers receiving a total of 2.5k indexed citations (citations by other indexed papers that have themselves been cited), including 61 papers in Electrical and Electronic Engineering, 24 papers in Atomic and Molecular Physics, and Optics and 22 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in F.H. Baumann's work include Semiconductor materials and devices (41 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Copper Interconnects and Reliability (21 papers). F.H. Baumann is often cited by papers focused on Semiconductor materials and devices (41 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Copper Interconnects and Reliability (21 papers). F.H. Baumann collaborates with scholars based in United States, Germany and France. F.H. Baumann's co-authors include G. Timp, T. Sorsch, K. Evans‐Lutterodt, David A. Muller, S. Moccio, A. Ourmazd, Peter Schwander, Y. Kim, W.D. Rau and W. Höppner and has published in prestigious journals such as Nature, Physical Review Letters and Physical review. B, Condensed matter.

In The Last Decade

F.H. Baumann

81 papers receiving 2.3k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

The electronic structure at the atomic scale of ultrathin gate oxides

1999 780 citations David A. Muller, T. Sorsch et al. profile →

Peers

Countries citing papers authored by F.H. Baumann

Since Specialization

Citations

This map shows the geographic impact of F.H. Baumann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F.H. Baumann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F.H. Baumann more than expected).

Fields of papers citing papers by F.H. Baumann

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by F.H. Baumann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F.H. Baumann. The network helps show where F.H. Baumann may publish in the future.

Co-authorship network of co-authors of F.H. Baumann

This figure shows the co-authorship network connecting the top 25 collaborators of F.H. Baumann. A scholar is included among the top collaborators of F.H. Baumann based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with F.H. Baumann. F.H. Baumann is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Unlocking Insights into 3D Transistor Defects: The Power of Supplementing TEM with Elemental Electron Tomography 2024 ·Proceedings - International Symposium for Testing and Failure Analysis ·Yu Zhang, (unknown), (unknown), F.H. Baumann, T. B. Mitchell	0
2	Parameters Influencing Space Charge Density in Vessels by Spraying Water 2024 ·Journal of Physics Conference Series ·F.H. Baumann, (unknown), (unknown), (unknown), Michael Beyer	0
3	Extension of CD-TEM towards EDS Tomography 2019 ·F.H. Baumann, (unknown), Ying-Gang Lu	1
4	Resistance contributions to copper interconnects 2017 ·C. Witt, F.H. Baumann, E. Huang, (unknown)	2
5	Enhanced electromigration resistance through grain size modulation in copper interconnects 2015 ·C.-C. Yang, (unknown), F.H. Baumann, E. Huang, D. Edelstein, R. Rosenberg	2
6	Practical Considerations in Quantitative Nanoscale Energy-Dispersive X-ray Spectroscopy (EDX) and Its Application in SiGe 2015 ·Microscopy and Microanalysis ·Weihao Weng, F.H. Baumann, (unknown), (unknown), Anita Madan, (unknown), (unknown)	3
7	Challenges of nickel silicidation in CMOS technologies 2014 ·Microelectronic Engineering ·(unknown), C. Lavoie, Ahmet S. Özcan, F.H. Baumann, N. Klymko, Karen Nummy, Bing Sun, Jean Jordan‐Sweet, Jian Yu, Frank Zhu, (unknown), M. Chudzik	45
8	Electromigration comparison of selective CVD cobalt capping with PVD Ta(N) and CVD cobalt liners on 22nm-groundrule dual-damascene Cu interconnects 2013 ·A. Simon, T. Bolom, Chunping Niu, F.H. Baumann, Chunhua Hu, C. Parks, Joyeeta Nag, (unknown), (unknown), C.-C. Yang, S. Nguyen, H. Shobha, T. Nogami, (unknown), Xuejun Ren, (unknown), Joseph F. AuBuchon	31
9	Moisture Uptake Impact on Damage Layer of Porous Low-k Film in 80nm-Pitched Cu Interconnects 2011 ·ECS Transactions ·(unknown), Atsushi Ogino, (unknown), H. Shobha, F.H. Baumann, Fuminori Ito, T. Spooner	5
10	Effect of TaN Stoichiometry on Barrier Oxidation and Defect Density in 32nm Cu/Ultra-Low K Interconnects 2010 ·MRS Proceedings ·A. Simon, F.H. Baumann, T. Bolom, (unknown), (unknown), Ben Kim, Patrick W. DeHaven, Robert E. Davis, (unknown), M. Angyal	1
11	Ultra-thin, 1.0-3.0 nm, gate oxides for high performance sub-100 nm technology 2002 ·T. Sorsch, Winston Timp, F.H. Baumann, K. H. A. Bogart, T. Boone, Vincent M. Donnelly, (unknown), K. Evans‐Lutterodt, (unknown), S. Moccio, J. M. Rosamilia, J. Sapjeta, (unknown), B. E. Weir, G. Timp	9
12	Ultra-thin gate oxide reliability projections 2002 ·Solid-State Electronics ·B. E. Weir, Md Ashraful Alam, P. J. Silvėrman, F.H. Baumann, D. Monroe, J. Bude, G. Timp, Abdullah Hamad, Y. Ma, (unknown), D. Hwang, T. Sorsch, A. Ghetti, G. D. Wilk	10
13	Continuum model of thin film deposition incorporating finite atomic length scales 2002 ·Journal of Applied Physics ·(unknown), F.H. Baumann, George H. Gilmer, J. Dalla Torre, (unknown), I. Petrov, Taeyoon Lee	4
14	Gate oxide reliability projection to the sub-2 nm regime 2000 ·Semiconductor Science and Technology ·B. E. Weir, Md Ashraful Alam, J. Bude, P. J. Silvėrman, A. Ghetti, F.H. Baumann, (unknown), D. Monroe, T. Sorsch, G. Timp, Y. Ma, (unknown), Abdullah Hamad, D. Hwang, Philip E. Mason	66
15	A Closer “Look” at Modern Gate Oxides 2000 ·MRS Proceedings ·F.H. Baumann, (unknown), J. L. Grazul, Avid Kamgar, (unknown), David A. Muller	8
16	The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET 2000 ·MRS Proceedings ·Sang‐Hyun Oh, J. M. Hergenrother, Don Monroe, T. Nigam, F. Klemens, A. Kornblit, W Mansfield, F.H. Baumann, H.‐J. Gossmann, (unknown), R. N. Kleiman, (unknown), Gary R. Weber, C.S. Rafferty	1
17	Severe thickness variation of sub-3 nm gate oxide due to Si surface faceting, poly-Si intrusion, and corner stress 1999 ·(unknown), F.H. Baumann, A. Ghetti, H.-H. Vuong, (unknown), Kin P. Cheung, Jennifer Colonell, (unknown), (unknown), J.F. Miner, C. S. Pai, (unknown), (unknown), J.T. Clemens	8
18	Enabling shallow trench isolation for 0.1 /spl mu/m technologies and beyond 1999 ·(unknown), (unknown), (unknown), Y. Ma, H.-H. Vuong, F.H. Baumann, M. Bude, (unknown), (unknown), (unknown), (unknown), (unknown), Kin P. Cheung, Jennifer Colonell, Lai Wang, J.F. Miner, (unknown), (unknown), J.T. Clemens	4
19	Quantitative chemical mapping: Spatial resolution 1992 ·Ultramicroscopy ·F.H. Baumann, M. Bode, Y. Kim, A. Ourmazd	11
20	Chemical lattice imaging of a Ni-based superalloy 1991 ·Philosophical Magazine Letters ·J. M. Pénisson, M. Bode, F.H. Baumann, A. Ourmazd	10

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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