Gary R. Weber

872 total citations
25 papers, 459 citations indexed

About

Gary R. Weber is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Gary R. Weber has authored 25 papers receiving a total of 459 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 5 papers in Materials Chemistry and 4 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Gary R. Weber's work include Semiconductor materials and devices (8 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Advancements in Photolithography Techniques (4 papers). Gary R. Weber is often cited by papers focused on Semiconductor materials and devices (8 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Advancements in Photolithography Techniques (4 papers). Gary R. Weber collaborates with scholars based in United States, Germany and Australia. Gary R. Weber's co-authors include Richard B. Fair, Roger L. Ladda, Anthony Kales, Dennis S. Charney, Edward O. Bixler, Paula K. Schweitzer, Constantin R. Soldatos, R. C. Kistler, R.F. Kazarinov and R. Adar and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and The British Journal of Psychiatry.

In The Last Decade

Gary R. Weber

24 papers receiving 403 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Gary R. Weber United States 9 283 126 105 100 81 25 459
Martin Feldman United States 11 132 0.5× 153 1.2× 42 0.4× 50 0.5× 27 0.3× 42 459
Jin‐Hee Han South Korea 12 56 0.2× 110 0.9× 109 1.0× 41 0.4× 67 0.8× 40 365
Shiwei Cai China 16 498 1.8× 43 0.3× 89 0.8× 338 3.4× 181 2.2× 78 796
Pei-Ching Chang Taiwan 14 365 1.3× 153 1.2× 16 0.2× 119 1.2× 165 2.0× 48 754
Masahiro Yamamoto Japan 14 89 0.3× 66 0.5× 38 0.4× 85 0.8× 160 2.0× 36 692
B. J. Wakefield United Kingdom 10 262 0.9× 301 2.4× 108 1.0× 255 2.5× 75 0.9× 15 738
Duo Xu China 10 193 0.7× 33 0.3× 33 0.3× 167 1.7× 56 0.7× 47 391
Seokjun Hong South Korea 13 119 0.4× 49 0.4× 23 0.2× 127 1.3× 108 1.3× 33 432
Shota Ogawa Japan 13 184 0.7× 33 0.3× 37 0.4× 113 1.1× 46 0.6× 60 413
Yu Yin China 13 240 0.8× 11 0.1× 71 0.7× 192 1.9× 56 0.7× 39 455

Countries citing papers authored by Gary R. Weber

Since Specialization
Citations

This map shows the geographic impact of Gary R. Weber's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gary R. Weber with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gary R. Weber more than expected).

Fields of papers citing papers by Gary R. Weber

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Gary R. Weber. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gary R. Weber. The network helps show where Gary R. Weber may publish in the future.

Co-authorship network of co-authors of Gary R. Weber

This figure shows the co-authorship network connecting the top 25 collaborators of Gary R. Weber. A scholar is included among the top collaborators of Gary R. Weber based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Gary R. Weber. Gary R. Weber is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Frolov, S. V., et al.. (2004). Inplane's technology platform for subsystems on a chip. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5435. 120–120. 3 indexed citations
2.
Bude, J., A. Frommer, M.R. Pinto, & Gary R. Weber. (2002). EEPROM/flash sub 3.0 V drain-source bias hot carrier writing. 989–992. 21 indexed citations
3.
Kizilyalli, I.C., Gary R. Weber, Zhaozhong Chen, et al.. (2002). Multi-level metal CMOS manufacturing with deuterium for improved hot carrier reliability. 935–938. 3 indexed citations
4.
Blauwe, J. De, Michele L. Ostraat, Gary R. Weber, et al.. (2002). A novel, aerosol-nanocrystal floating-gate device for non-volatile memory applications. 683–686. 15 indexed citations
5.
Cirelli, Raymond A., J. Bude, F. M. Houlihan, et al.. (2000). Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography. Microelectronic Engineering. 53(1-4). 87–90. 1 indexed citations
6.
Oh, Sang‐Hyun, J. M. Hergenrother, Don Monroe, et al.. (2000). The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET. MRS Proceedings. 610. 1 indexed citations
7.
Cirelli, Raymond A., et al.. (1998). New variable-transmission illumination technique optimized with design rule criteria. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 395–395. 2 indexed citations
8.
Cirelli, Raymond A., Gary R. Weber, A. Kornblit, et al.. (1996). A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4229–4233. 16 indexed citations
9.
Manchanda, L., Gary R. Weber, L. C. Feldman, et al.. (1993). A new method to fabricate thin oxynitride/oxide gate dielectric for deep submicron devices. Microelectronic Engineering. 22(1-4). 69–72. 6 indexed citations
10.
Trimble, L. E., G. K. Celler, J. Frackoviak, & Gary R. Weber. (1992). Membrane fragility: Fact or illusion?. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3200–3203. 4 indexed citations
11.
Adar, R., C. H. Henry, R.F. Kazarinov, R. C. Kistler, & Gary R. Weber. (1992). Adiabatic 3-dB couplers, filters, and multiplexers made with silica waveguides on silicon. Journal of Lightwave Technology. 10(1). 46–50. 40 indexed citations
12.
O’Leary, Paul, et al.. (1991). Oversampling data conversion applied to data modulation. 124–129.
13.
Celler, G. K., L. E. Trimble, J. Frackoviak, et al.. (1991). Formation of monolithic masks for 0.25 μm x-ray lithography. Applied Physics Letters. 59(24). 3105–3107. 7 indexed citations
14.
Liddle, J. Alexander, H. A. Huggins, S. D. Berger, et al.. (1991). Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 3000–3004. 22 indexed citations
15.
Weber, Gary R., et al.. (1987). Interactive software for machine tool programming. Computers & Education. 11(2). 135–141. 1 indexed citations
16.
Kales, Anthony, Constantin R. Soldatos, Edward O. Bixler, et al.. (1980). Hereditary Factors in Sleepwalking and Night Terrors. The British Journal of Psychiatry. 137(2). 111–118. 146 indexed citations
17.
Weber, Gary R.. (1976). Practical applications and philosophy of optical spectroscopic probes.. Munich Personal RePEc Archive (Ludwig Maximilian University of Munich). 2. 163–98. 7 indexed citations
18.
Fair, Richard B. & Gary R. Weber. (1973). Relationship between resistivity and total arsenic concentration in heavily doped n - and p -type silicon. Journal of Applied Physics. 44(1). 280–282. 7 indexed citations
19.
Fair, Richard B. & Gary R. Weber. (1973). Effect of complex formation on diffusion of arsenic in silicon. Journal of Applied Physics. 44(1). 273–279. 114 indexed citations
20.
Weber, Gary R., et al.. (1968). SELF-DIFFUSION OF OXYGEN IN NEODYMIUM AND SAMARIUM SESQUIOXIDE.. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 31(1). 162–168. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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